Structural, optical, and electrical properties of ZnO: al prepared by CVD
In this paper we will prepared thin films from transparent conductive oxide(TCO) ZnO pure, and doped for various concentration of aluminum (4,8%) using technique chemical vapor deposition (CVD) at different substrates temperatures (400, 450, 500 °C) on glass substrates. The films were characterized...
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| Veröffentlicht in: | Физическая инженерия поверхности |
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| Datum: | 2011 |
| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
Науковий фізико-технологічний центр МОН та НАН України
2011
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/76893 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Structural, optical, and electrical properties of ZnO: al prepared by CVD / A.D. Pogrebnyak, N.Y. Jamil, A.K.M. Muhammed // Физическая инженерия поверхности. — 2011. — Т. 9, № 3. — С. 244–249. — Бібліогр.: 5 назв. — англ. |
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