ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate
Electrical and optical properties of ZnO:Al films deposited on unheated glass substrate by non-reactive RF magnetron sputtering of target ZnO:Al₂O₃ (98/2 wt.%) were studied. It was shown that Zno:Al films with the thickness of 0.75 µm deposited at the magnetron power 130 W and 4 µbar argon pressure...
Збережено в:
| Опубліковано в: : | Вопросы атомной науки и техники |
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| Дата: | 2000 |
| Автори: | , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2000
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| Теми: | |
| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/78239 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate / B.Т. Boyko, G.S. Khrypunov, G.V. Yurchenko // Вопросы атомной науки и техники. — 2000. — № 5. — С. 91-93. — Бібліогр.: 10 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | Electrical and optical properties of ZnO:Al films deposited on unheated glass substrate by non-reactive RF magnetron sputtering of target ZnO:Al₂O₃ (98/2 wt.%) were studied. It was shown that Zno:Al films with the thickness of 0.75 µm deposited at the magnetron power 130 W and 4 µbar argon pressure with adding of 4·10⁻³ µbar oxygen pressure during the first minute of condensation has the following electrical and optical characteristics: surface, resistance 6 Ω/ and transmittance in visible spectral range about 88%. The ZnO:Al films with such optical and electrical parameters are suitable for substrate configuration highly efficiency thin film solar cells on CuInSe₂ base.
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| ISSN: | 1562-6016 |