ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate
Electrical and optical properties of ZnO:Al films deposited on unheated glass substrate by non-reactive RF magnetron sputtering of target ZnO:Al₂O₃ (98/2 wt.%) were studied. It was shown that Zno:Al films with the thickness of 0.75 µm deposited at the magnetron power 130 W and 4 µbar argon pressure...
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| Veröffentlicht in: | Вопросы атомной науки и техники |
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| Datum: | 2000 |
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| Sprache: | English |
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2000
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate / B.Т. Boyko, G.S. Khrypunov, G.V. Yurchenko // Вопросы атомной науки и техники. — 2000. — № 5. — С. 91-93. — Бібліогр.: 10 назв. — англ. |
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Boyko, B.Т. Khrypunov, G.S. Yurchenko, G.V. 2015-03-13T06:42:36Z 2015-03-13T06:42:36Z 2000 ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate / B.Т. Boyko, G.S. Khrypunov, G.V. Yurchenko // Вопросы атомной науки и техники. — 2000. — № 5. — С. 91-93. — Бібліогр.: 10 назв. — англ. 1562-6016 https://nasplib.isofts.kiev.ua/handle/123456789/78239 537. 221:537.221 Electrical and optical properties of ZnO:Al films deposited on unheated glass substrate by non-reactive RF magnetron sputtering of target ZnO:Al₂O₃ (98/2 wt.%) were studied. It was shown that Zno:Al films with the thickness of 0.75 µm deposited at the magnetron power 130 W and 4 µbar argon pressure with adding of 4·10⁻³ µbar oxygen pressure during the first minute of condensation has the following electrical and optical characteristics: surface, resistance 6 Ω/ and transmittance in visible spectral range about 88%. The ZnO:Al films with such optical and electrical parameters are suitable for substrate configuration highly efficiency thin film solar cells on CuInSe₂ base. This work has been supported by the INTAS-96-0206 Project of European Commission and 7IP 050129 Project of Swiss National Science Foundation. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Пленочные материалы и покрытия ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate Article published earlier |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| title |
ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate |
| spellingShingle |
ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate Boyko, B.Т. Khrypunov, G.S. Yurchenko, G.V. Пленочные материалы и покрытия |
| title_short |
ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate |
| title_full |
ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate |
| title_fullStr |
ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate |
| title_full_unstemmed |
ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate |
| title_sort |
zno:al wide zone “windows” deposited by magnetron sputtering on unheated substrate |
| author |
Boyko, B.Т. Khrypunov, G.S. Yurchenko, G.V. |
| author_facet |
Boyko, B.Т. Khrypunov, G.S. Yurchenko, G.V. |
| topic |
Пленочные материалы и покрытия |
| topic_facet |
Пленочные материалы и покрытия |
| publishDate |
2000 |
| language |
English |
| container_title |
Вопросы атомной науки и техники |
| publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| format |
Article |
| description |
Electrical and optical properties of ZnO:Al films deposited on unheated glass substrate by non-reactive RF magnetron sputtering of target ZnO:Al₂O₃ (98/2 wt.%) were studied. It was shown that Zno:Al films with the thickness of 0.75 µm deposited at the magnetron power 130 W and 4 µbar argon pressure with adding of 4·10⁻³ µbar oxygen pressure during the first minute of condensation has the following electrical and optical characteristics: surface, resistance 6 Ω/ and transmittance in visible spectral range about 88%. The ZnO:Al films with such optical and electrical parameters are suitable for substrate configuration highly efficiency thin film solar cells on CuInSe₂ base.
|
| issn |
1562-6016 |
| url |
https://nasplib.isofts.kiev.ua/handle/123456789/78239 |
| citation_txt |
ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate / B.Т. Boyko, G.S. Khrypunov, G.V. Yurchenko // Вопросы атомной науки и техники. — 2000. — № 5. — С. 91-93. — Бібліогр.: 10 назв. — англ. |
| work_keys_str_mv |
AT boykobt znoalwidezonewindowsdepositedbymagnetronsputteringonunheatedsubstrate AT khrypunovgs znoalwidezonewindowsdepositedbymagnetronsputteringonunheatedsubstrate AT yurchenkogv znoalwidezonewindowsdepositedbymagnetronsputteringonunheatedsubstrate |
| first_indexed |
2025-12-07T16:17:47Z |
| last_indexed |
2025-12-07T16:17:47Z |
| _version_ |
1850866943596167168 |