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ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate

Electrical and optical properties of ZnO:Al films deposited on unheated glass substrate by non-reactive RF magnetron sputtering of target ZnO:Al₂O₃ (98/2 wt.%) were studied. It was shown that Zno:Al films with the thickness of 0.75 µm deposited at the magnetron power 130 W and 4 µbar argon pressure...

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Bibliographic Details
Published in:Вопросы атомной науки и техники
Date:2000
Main Authors: Boyko, B.Т., Khrypunov, G.S., Yurchenko, G.V.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2000
Subjects:
Пленочные материалы и покрытия
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/78239
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate / B.Т. Boyko, G.S. Khrypunov, G.V. Yurchenko // Вопросы атомной науки и техники. — 2000. — № 5. — С. 91-93. — Бібліогр.: 10 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine

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