Application of high energy plasma for smart thermal processing
Nano-science & technology is one of the most important 4 scientific fields regarding the technological policy in Japan. Material processing is now progressing towards more precise and controllable smart stage. Regarding thermal processing, an important key should be the applied heat source. And...
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| Опубліковано в: : | Вопросы атомной науки и техники |
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| Дата: | 2005 |
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| Формат: | Стаття |
| Мова: | Англійська |
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2005
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Application of high energy plasma for smart thermal processing / A. Kobayashi // Вопросы атомной науки и техники. — 2005. — № 1. — С. 161-165. — Бібліогр.: 12 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1859655793698144256 |
|---|---|
| author | Kobayashi, A. |
| author_facet | Kobayashi, A. |
| citation_txt | Application of high energy plasma for smart thermal processing / A. Kobayashi // Вопросы атомной науки и техники. — 2005. — № 1. — С. 161-165. — Бібліогр.: 12 назв. — англ. |
| collection | DSpace DC |
| container_title | Вопросы атомной науки и техники |
| description | Nano-science & technology is one of the most important 4 scientific fields regarding the technological policy in Japan. Material processing is now progressing towards more precise and controllable smart stage. Regarding thermal processing, an important key should be the applied heat source. And plasma is fundamentally the most superior heat source, because of high temperature, high energy density, easy controllable, etc. Therefore more precious plasma system has been expected for smart thermal processing. The gastunnel type plasma system developed by the author has high energy density and also high efficiency. The concept and the feature of this plasma system are explained and the applications to the various thermal processing are described in this paper. One typical application is plasma spraying of ceramics such as Al 2O3 and ZrO2. The characteristics of these ceramic coatings were superior to the conventional ones. The ZrO2 composite coating has the possibility of the development of high functionally graded TBC (thermal barrier coating). Another application of gastunnel type plasma issurface modification of metals. For example the TiN films were formed in a very short time of 5 s. Finally the development of new type of smart plasma system and application of high-energy plasma to the environmental problems are also discussed.
Нано- наука і технологія є одним з чотирьох найбільш важливих напрямків технологічної політики в Японії. Зараз технологія обробки матеріалів виходить на стадію використання більш точних і контрольованих високоякісних методів. З погляду термічної обробки, ключовим елементом повинне бути джерело тепла. Плазма споконвічно є найбільш зручним таким джерелом завдяки своїй високій температурі, високій щільності енергії, легкої керованості і т.п. Тому передбачається використання більш досконалих плазмових систем для високоякісної термічної обробки. Розроблений автором плазмовий пристрій на основі газового розряду тунельного типу характеризується великою щільністю енергії і високою ефективністю. У представленій роботі описана концепція цього пристрою, його особливості і застосування для різних видів термічної обробки. Типовим застосуванням є плазмове розпилення таких керамічних матеріалів, як Al2O3 і Zr2. Завдяки своїм властивостям ці керамічні покриття мають великі переваги в порівнянні зі звичайними покриттями. На основі композитного покриття з Zr2 можна створити багатофункціональне високоякісне покриття, що створює термічний бар'єр. Ще одним застосуванням плазмового пристрою на основі газового розряду тунельного типу є модифікація поверхні металів. Наприклад, плівки TiN формувалися за дуже короткий час - 5 с. На закінчення обговорюються також розробки нових типів високоточних плазмових пристроїв і використання высокоэнергетичної плазми в задачах, зв'язаних з охороною навколишнього середовища.
Нано- наука и технология являются одним из четырёх наиболее важных направлений технологической политики в Японии. Сейчас технология обработки материалов выходит на стадию использования более точных и контролируемых высококачественных методов. С точки зрения термической обработки, ключевым элементом должен быть источник тепла. Плазма изначально является наиболее удобным таким источником благодаря своей высокой температуре, высокой плотности энергии, лёгкой управляемости и т. п. Поэтому предполагается использование более совершенных плазменных систем для высококачественной термической обработки. Разработанное автором плазменное устройство на основе газового разряда туннельного типа характеризуется большой плотностью энергии и высокой эффективностью. В представленной работе описаны концепция этого устройства, его особенности и применение для разных видов термической обработки. Типичным применением является плазменное распыление таких керамических материалов, как Al2O3 и ZrO2. По своим свойствам эти керамические покрытия обладают большими преимуществами по сравнению с обычными покрытиями. На основе композитного покрытия с ZrO2 можно создать многофункциональное высококачественное покрытие, создающее термический барьер. Ещё одним применением плазменного устройства на основе газового разряда туннельного типа является модификация поверхности металлов. Например, плёнки TiN формировались за очень короткое время - 5 с. В заключение обсуждаются также разработки новых типов высокоточных плазменных устройств и использование высокоэнергетической плазмы в задачах, связанных с охраной окружающей среды.
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| first_indexed | 2025-12-07T13:39:17Z |
| format | Article |
| fulltext |
APPLICATION OF HIGH ENERGY PLASMA FOR
SMART THERMAL PROCESSING
Akira Kobayashi
Joining & Welding Res. Inst. Osaka University,
11-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan, e-mail: kobayasi@jwri.osaka-u.ac.jp
Nano-science & technology is one of the most important 4 scientific fields regarding the technological policy in Japan.
Material processing is now progressing towards more precise and controllable smart stage. Regarding thermal processing, an
important key should be the applied heat source. And plasma is fundamentally the most superior heat source, because of high
temperature, high energy density, easy controllable, etc. Therefore more precious plasma system has been expected for smart
thermal processing. The gas tunnel type plasma system developed by the author has high energy density and also high efficiency.
The concept and the feature of this plasma system are explained and the applications to the various thermal processing are
described in this paper. One typical application is plasma spraying of ceramics such as Al2O3 and ZrO2. The characteristics of
these ceramic coatings were superior to the conventional ones. The ZrO2 composite coating has the possibility of the
development of high functionally graded TBC (thermal barrier coating). Another application of gas tunnel type plasma is surface
modification of metals. For example the TiN films were formed in a very short time of 5 s. Finally the development of new type
of smart plasma system and application of high-energy plasma to the environmental problems are also discussed.
PACS: 52.77.-j
1. INTRODUCTION
In order to apply Nano-science & technology to
Material Science, the material processing should be
developed towards more precise and controllable smart
stage. Regarding an applicable heat source, plasma is one
of the most superior heat sources, because of high
temperature, high energy density, easy controllable, etc.
Therefore more precious plasma system has been
expected in order to establish a smart thermal processing.
The gas tunnel type plasma system developed by the
author has high energy density and also high efficiency
[1-3]. The outline of this plasma system and the
applications to the various thermal processing are
described briefly in the following chapters. One of
typical applications is plasma spraying of ceramics such
as Al2O3 and ZrO2 [4]. The characteristics of these
ceramic coatings by the gas tunnel type plasma spraying
were superior to that by the conventional plasma jet.
The ceramic coatings produced by the plasma
spraying are effective as thermal barrier coatings (TBC)
for high temperature protection of metallic structures
because of having high temperature resistance. For
example, the zirconia (ZrO2) coating is used as TBC in
hot sections of gas turbine engines and/or diesel engine
and in high temperature parts of detonation furnace. It
allows the high temperature operation and results to
increasing the efficiency of the engine and the durability
of the critical components.
While the large porosity and the high melting point is
advantage of ZrO2 coating, the porosity has disadvantage for
the adoption under the critical conditions such as high
temperature and high corrosion environment. The resistance
for thermal shock and high temperature corrosion are
important properties in the high performance TBC. New
type plasma spray methods are expected for using the
excellent characteristics of ceramics such as corrosion
resistance, thermal resistance, and wear resistance [5] by
reducing the porosity and increasing the coating density.
Now, a high hardness ceramic coating could be obtained
by means of the gas tunnel type plasma spraying, which were
investigated in the previous study in detail [6,7,8,9]. The
Vickers hardness of the zirconia (ZrO2) coating was increased
with decreasing spraying distance, and a higher Vickers
hardness could be obtained at a shorter spraying distance. At
L=30 mm, when P=33 kW, the Vickers hardness of ZrO2
coating was about Hv=1200 [10]. This corresponds to the
hardness of sintered ZrO2. Usually, the Vickers hardness of
this sprayed coating became 20-30% higher than that of
conventional plasma spraying.
ZrO2 coating formed has a high hardness layer at the
surface side, which shows the graded functionality of
hardness [11,12]. With the increase in the traverse number
of plasma spraying, the hardness distribution was much
smoother, corresponding to the result that the coating
became denser. For TBC, the spalling of the coating is also
very important problem as well as the coating quality.
Another application of gas tunnel type plasma is surface
modification of titanium. As the results, TiN films of 10µm
thickness were formed in a very short time of several seconds.
In this paper, the performance of high hardness ZrO2
composite coating was investigated and the merit as TBC
(thermal barrier coating) was clarified. The effect of alumina
mixing on the Vickers hardness of the ZrO2 composite coating
was also clarified in order to develop high functionally graded
TBC. Moreover the adhesive characteristics of such high
hardness zirconia-alumina (ZrO2-Al2O3) composite coatings
were investigated as well as its mechanical properties.
Especially, the influence on the thickness of the zirconia
composite coating was discussed.
Finally, other application of high-energy plasma to
thermal processing and the environmental problems etc,
and. the development of new type of smart plasma system
are also discussed.
2. GAS TUNNEL TYPE PLASMA SYSTEM
The schematic of gas tunnel type plasma torch developed
by the author is shown in Fig. 1. The working gas makes a
strong vortex flow in the chamber, and forms low pressure
gas tunnel along the torch center axis. This makes plasma
production easier, and the strong vortex constricts and
stabilizes the plasma jet. The feature of gas tunnel type
plasma is shown in Table 1 as compared to the conventional
ones. The gas tunnel type plasma system has high energy
Problems of Atomic Science and Technology. 2005. № 1. Series: Plasma Physics (10). P. 161- 165 161
mailto:kobayasi@jwri.osaka-u.ac.jp
Fig.1. Schematic of the gas tunnel type plasma
spraying torch
density and also high efficiency. [1,2,3]
One example of application of the gas tunnel type
plasma is the thermal spraying. Figure 1 shows the gas
tunnel type plasma spraying torch. The experimental
method to produce the high hardness ceramic coatings by
means of the gas tunnel type plasma spraying have been
described in the previous papers [4,6,7,8,9].
Table 1. Comparison between gas tunnel type plasma jet
and conventional ones
Gas tunnel type
plasma jet
Conventional
ones
Temperature
Energy density
Heat efficiency
15000 K
105 W/cm2
80%
10000 K
104 W/cm2
50%
The spraying powder is fed inside plasma flame in
axial direction from center electrode of plasma gun. So,
the spraying powder was molten enough in the plasma,
and the plasma spraying for high melting point ceramics
is available. The coating is formed on the substrate
traversed at the spraying distance: L. In this case, the gas
divertor nozzle diameter was d=20 mm.
This plasma system has many possibilities for the
industrial applications to the various thermal processing,
such as plasma spraying, surface modification. The
typical applications are:
1) Plasma spraying of ceramics (Al2O3 and ZrO2 etc.)
2) Surface modification of Ti materials (Nitridation)
3) Other Applications such as nano-science, functional
materials processing technology
4) Application to environmental problems, others.
Moreover, the development of new type of smart plasma
system is planned in order to apply to thermal processing of
materials and the environmental problems and so on.
3. GAS TUNNEL TYPE PLASMA SPRAYING
3.1. CHARACTERISTICS of GAS TUNNEL TYPE
PLASMA SPRAYING
The gas tunnel type plasma spraying can make high
quality ceramic coating compared to other plasma
spraying method. Table 2 shows the quality (hardness,
porosity, etc.) of the Al2O3 coating by gas tunnel type
plasma spraying [6,7]. The hardness was like sintered
alumina: Hv=1,200 and high density, porosity was half of
the value of the conventional ones. Even when the
working gas is argon and low input of 20 kW, we can
obtain enough high Vickers hardness of Hv=800.
Table 2. Comparison between gas tunnel type plasma
spraying and conventional type for Al2O3 coating.
(Input ＝45kW, Distance = 65-100mm)
Vickers hardness
Porosity
Gas tunnel type
plasma spraying
Conventional
ones
1200
10%
800
20%
Thus it can be easy to produce the high hardness ceramic
coatings by means of the gas tunnel type plasma spraying.
3.2. EXPERIMENTAL PROCEDURE
The gas tunnel type plasma spraying torch used was
shown in Fig. 1. The experimental method to produce the
ceramic coatings by means of the gas tunnel type plasma
spraying is as follows. After igniting plasma gun, the
main vortex plasma jet is produced in the low pressure
gas tunnel. The spraying powder is fed from center inlet
of plasma gun. The coating was formed on the substrate
traversed at the spraying distance of L.
The experimental conditions for the plasma spraying
are shown in Table 3. The power input to the plasma
torch was about P=25 kW, and the power input to the
pilot plasma torch, which was supplied by the power
supply PS-1, was turned off after starting of the gas tunnel
type plasma jet. The spraying distance was short distance
of L= 40 mm.
Table 3. Experimental conditions
Powder:
Traverse number: N
Power input, P (kW):
Working gas
flow rate, Q (l/min): 180
Powder feed gas, Q feed (l/min):
Spraying distance, L (mm):
Traverse speed, v (cm/min):
Powder feed rate: w (g/min):
Gas divertor nozzle dia., d (mm)
ZrO2 + Al2O3 Mixture
1~30
25~28
10
40
25~1000
20~35
20
The working gas was Ar gas, and the flow rate for gas
tunnel type plasma spraying torch was Q=180 l/min, and
gas flow rate of carrier gas was 10 l/min. The powder
feed rate of zirconia/alumina mixed powder was
w=20~35g /min. The traverse speed of the substrate was
changed the value from v=25 to 1000 cm/min. Also the
traverse number was changed 1-30 times. The thickness
of the coating was 50∼250μm. Also, high speed traverse
of v=1000cm/min, 30 times.
The chemical composition and the particle size of
Zirconia (ZrO2) and/or alumina (Al2O3)powder used in
this study was respectively shown in Table 4. This ZrO2
powder was commercially prepared type of K-90 (PSZ of
162
8% Y2O3), and Al2O3 powder was the type of K-16T. The
substrate was SUS304 stainless steel (3x50x50), which
was sand-blasted before using.
The Vickers hardness Hv50, Hv100 of the sprayed coatings
was measured at the non-pore region in those cross sections
under the condition that the load weight was 50g, 100 g and
its load time was 15sec 25 s. The Vickers hardness: Hv100
was calculated as a mean value of 10 point measurements.
The distribution of the Vickers hardness in the cross section
of the coating was measured at each distance from the
coating surface in the thickness direction. The
microstructure of the cross section of zirconia composite
coating was observed by an optical microscope.
Table 4. Chemical composition and size of zirconia and
alumina powder used (20~80% Al2O3 Mixture)
Composition (wt%) Size (µm)
ZrO2
ZrO2 Y2O3 Al2O3 SiO2 Fe2O3
90.78 8.15 0.38 0.20 0.11 10-44
Al2O3
Al2O3 Na2O SiO2 Fe2O3
99.8 0.146 0.01 0.01
10-35
The adhesive strength between the ZrO2 composite
coating and the substrate was measured by using the tension
tester original designed. The test piece for adhesive strength
was 10mm square and the coating surface side and substrate
side was respectively attached to each holder by polymer
type glue. The load for the tester could be changed 0∼200kg.
The kgf/cm2 was used as a unit for the adhesive strength of
the composite coating. The adhesive strength of the ZrO2
composite coatings was mainly measured in the case of
different coating thickness.
4. RESULTS AND DISCUSSION
4.1 EFFECT of ALUMINA MIXING RATIO on THE
VICKERS HARDNESS of ZIRCONIA COMPOSITE
COATING
Regarding the Vickers hardness on the cross section of
ZrO2 composite coating produced by the gas tunnel type
plasma spraying at the same spraying time, the coating
thickness was the same and the maximum Vickers
hardness of ZrO2 composite coating was also same. But
the graded functionality became much better with
increase in the traverse number.
Figure 2 shows the dependence of Vickers hardness of
ZrO2 composite coatings, on the Al2O3 mixing ratio
R(wt%). In this case, the coating thickness was
approximately 200 µm at P=25 kW, L=40 mm, when the
traverse number was two times.
The Vickers hardness of ZrO2 composite coating was
increased as the increase in the Al2O3-mixing ratio. The
coating hardness corresponds to the high hardness of
Al2O3 particles. Namely, the Vickers hardness of Al2O3
coating was Hv50=1440.
The hardness distribution of the ZrO2composite coating
has remarkable graded functionality in the case of large Al2O3
mixing ratio. Because, the part near the substrate did not
change so much, but the Vickers hardness near the coating
surface became much higher. This leads to the development of
a high functionally TBC.
4.2 EFFECT of HIGH SPEED TRAVERSE on
COATING QUALITY
For an increase in the traverse number, the surface
temperature of the coating during spraying became higher.
Therefore it would be expected that coating density would
be increased when the traverse number increases.
Figure 3 is the cross section of composite coating
produced by high speed traverse at P = 25 kW, L = 40
mm. Traverse times was 30 times. This speed:
1000cm/min was 10 times higher than normal speed
traverse like Fig.2. The thickness was about 150µm. It
consisted of 2 different layers, white and gray layers were
deposited alternatively. The analysis by EPMA revealed
that white is zirconia (ZrO2) and gray is alumina (Al2O3).
White ZrO2 layer was a flat sprat of uniform thickness,
and embedded parallel in the Al2O3 matrix of low melting
temperature. The black parts in the coating are pores, and
are distributed in the whole coating. The surface side has
fewer pores compared to the coating near the substrate.
The structure is denser towards the surface of the coating.
Figure 4 shows the distribution of Vickers hardness:
Hv50 of the zirconia/alumina composite coating shown in
Fig.3 (coating thickness: about 150μm). Here, the left side
axis is the surface of the coating. The distribution of this
composite coating has a highest value in the coating at the
surface side: The maximum hardness was near to Hv50 =
163
Vi
ck
er
s
h
ar
dn
es
s,
H
v 50
Fig.2. Dependence of Vickers hardness of zirconia
composite coating on the alumina mixing rate.
2 times traverse at L=40mm when P=25kW
�
Fig. 3. Microhotograph of cross section of zirconia
composite coating. The traverse number was 30 time
traverse. Sprayed at L=40mm when P=25 kW
Fig.6. High energy plasma system for the
recombination of carbon dioxide
Fig.4. Distribution of Vickers hardness of zirconia
composite coating sprayed by 30 times traverse at
P=25kW, L=40 mm
Fig.5. Microhotograph of cross section of TiN film. Ti
substrate irradiated at L=70mm when P=20 kW
1300 at the distance from the coating surface of l=40 µm,
and decreased linearly like towards the substrate side.
Regarding the effect of traverse number, the uniformity
of pores was improved and the deviation of hardness
distribution was decreased. Therefore, the high speed and
high number traverse improved the grade functionality of
coating hardness. It shows the possibility of high
performance TBC by the high speed traverse processing.
4.3 INFLUENCE of PLASMA THERMAL PROCESS
on THE COATING
The maximum Vickers hardness of ZrO2 composite
coating was almost the same when the coating thickness
was the same. But the graded functionality became much
better, and the distribution of Vickers hardness was much
smoother as the traverse number was increased. This
means that the structure at the surface of the coating was
denser by the thermal process of the high energy plasma.
Regarding the microphotograph of ZrO2/Al2O3 coating
produced by the gas tunnel spraying on the fixed substrate
for 3s spraying time, the coating thickness was about 250
µm, and white and gray layers were deposited
alternatively as the same as Fig.3.
The graded functionality of the structure is
remarkable, and small pores are distributed disparately in
the whole coating while large pores existed near the
substrate. The surface side has fewer pores and dense,
compared to the coating near the substrate. This was
caused by the thermal process of the high energy plasma
from the surface side of the coating.
In this case, the Vickers hardness was linearly
decreased in the thickness direction towards the substrate
side. The dense microstructure led to the suppression of
the deviation of the hardness distribution.
4.4 ADHESIVE STRENGTH of ZrO2 COMPOSITE
COATING
The adhesive strength of the ZrO2 composite coatings
was decreased when the thickness was large. In the case
of small coating thickness (100µm), the adhesive strength
was large: more than 140 kgf/cm2 for the coating
thickness below 100μm. While, the value was F = 100∼
120 kgf/cm2 when the thickness was more than 200μm.
Therefore the thick coating was much easier to break than
thin coating, but the adherence was improved when the
traverse number was large.
5. OTHER APPLICATION OF SMART
PRAZMA SYSTEM
Other application of gas tunnel type plasma is surface
modification of metals such as nitridation, carbonization,
etc. For example the TiN films were formed in a very
short time of 5 s by the irradiation of N2 plasma jet as
shown in Fig.5. The thickness of TiN film was 10 µm
and the film is high quality (homogeneous and high
density). The Vickers hardness was about 1700 on the
cross section of the film.
Now, the temperature increase of weather is global
problem for the environmental reservation. Especially
CO2 is one of the resource gases of worse effect. By using
the high energy plasma, the recombination and
transformation to resources was a good solution for the
problem. Fig. 6 shows the system for CO2 treatment
(recombination and transformation to resources).
The working gas containing CO2 is resolved by the
plasma and transformed to CO, C, CH4, C2H2, CH3OH,
etc. and produced to the resources as carbon materials and
fuels. This method has a great advantage for the treatment
of CO2 gas and also has a possibility for producing new
materials such as nano carbon, nano tube, etc.
For the further wide application of plasma system, the
development of new type of smart plasma system: confront
electrode type plasma jet are conducting in my lab.
CONCLUSIONS
The following results were obtained during the
application of the gas tunnel type plasma system developed.
164
1) The gas tunnel type plasma system has high energy
density and also high efficiency as compared to the
conventional ones, and can be applied to the various
thermal processing.
2) One typical application is plasma spraying of ceramics
such as Al2O3 and ZrO2. And the characteristics of
these ceramic coatings were superior to the
conventional ones
3) The ZrO2 composite coating has graded functionality
on the hardness and the porosity, and has a possibility
of the development of high functionally graded TBC
(thermal barrier coating).
4) Another application of gas tunnel type plasma is
surface modification of metals. TiN films were formed
in a very short time of 5 s.
5) The development of new type of smart plasma system,
and application of high-energy plasma to the
environmental problems are now undergoing.
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Alumina Coatings by Gas Tunnel Type Plasma
Spraying.// J. High Temp. Soc. (13), 1987, pp.116-124 (in
Japanese).
8. A. Kobayashi, S. Kurihara, Y. Habara, and Y. Arata //
J. Weld. Soc. Jpn. (8), 1990, pp.457-463.
9. A. Kobayashi. Property of an Alumina Coating
Sprayed with a Gas Tunnel Plasma Spraying.//Proc. of
ITSC, 1992, pp.57-62.
10. A. Kobayashi. Formation of High Hardness Zirconia
Coatings by Gas Tunnel Type Plasma Spraying // Surface
and Coating Technology (90). 1990, pp.197-202.
11. A. Kobayashi and T. Kitamura. High Hardness
Zirconia Coating by Means of Gas Tunnel Type Plasma
Spraying // J. of IAPS (5), 1997, pp.62-68 (in Japanese).
12. A. Kobayashi, T. Kitamura // VACUUM (59).2000,
N1, pp.194-202.
ПРИМЕНЕНИЕ ВЫСОКОЭНЕРГЕТИЧЕСКОЙ ПЛАЗМЫ
ДЛЯ ВЫСОКОКАЧЕСТВЕННОЙ ТЕРМИЧЕСКОЙ ОБРАБОТКИ
А. Кобаяши
Нано- наука и технология являются одним из четырёх наиболее важных направлений
технологической политики в Японии. Сейчас технология обработки материалов выходит на стадию
использования более точных и контролируемых высококачественных методов. С точки зрения
термической обработки, ключевым элементом должен быть источник тепла. Плазма изначально
является наиболее удобным таким источником благодаря своей высокой температуре, высокой
плотности энергии, лёгкой управляемости и т. п. Поэтому предполагается использование более
совершенных плазменных систем для высококачественной термической обработки. Разработанное
автором плазменное устройство на основе газового разряда туннельного типа характеризуется
большой плотностью энергии и высокой эффективностью. В представленной работе описаны
концепция этого устройства, его особенности и применение для разных видов термической
обработки. Типичным применением является плазменное распыление таких керамических
материалов, как Al2O3 и ZrO2. По своим свойствам эти керамические покрытия обладают большими
преимуществами по сравнению с обычными покрытиями. На основе композитного покрытия с ZrO2
можно создать многофункциональное высококачественное покрытие, создающее термический
барьер. Ещё одним применением плазменного устройства на основе газового разряда туннельного
типа является модификация поверхности металлов. Например, плёнки TiN формировались за
очень короткое время - 5 с. В заключение обсуждаются также разработки новых типов
высокоточных плазменных устройств и использование высокоэнергетической плазмы в задачах,
связанных с охраной окружающей среды.
ЗАСТОСУВАННЯ ВЫСОКОЭНЕРГЕТИЧНОЇ ПЛАЗМИ
ДЛЯ ВИСОКОЯКІСНОЇ ТЕРМІЧНОЇ ОБРОБКИ
А. Кобаяши
Нано- наука і технологія є одним з чотирьох найбільш важливих напрямків технологічної політики
в Японії. Зараз технологія обробки матеріалів виходить на стадію використання більш точних і
контрольованих високоякісних методів. З погляду термічної обробки, ключовим елементом
повинне бути джерело тепла. Плазма споконвічно є найбільш зручним таким джерелом завдяки
своїй високій температурі, високій щільності енергії, легкої керованості і т.п. Тому передбачається
165
використання більш досконалих плазмових систем для високоякісної термічної обробки.
Розроблений автором плазмовий пристрій на основі газового розряду тунельного типу
характеризується великою щільністю енергії і високою ефективністю. У представленій роботі
описана концепція цього пристрою, його особливості і застосування для різних видів термічної
обробки. Типовим застосуванням є плазмове розпилення таких керамічних матеріалів, як Al2O3 і
Zr2. Завдяки своїм властивостям ці керамічні покриття мають великі переваги в порівнянні зі
звичайними покриттями. На основі композитного покриття з Zr2 можна створити
багатофункціональне високоякісне покриття, що створює термічний бар'єр. Ще одним
застосуванням плазмового пристрою на основі газового розряду тунельного типу є модифікація
поверхні металів. Наприклад, плівки TiN формувалися за дуже короткий час - 5 с. На закінчення
обговорюються також розробки нових типів високоточних плазмових пристроїв і використання
высокоэнергетичної плазми в задачах, зв'язаних з охороною навколишнього середовища.
166
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| id | nasplib_isofts_kiev_ua-123456789-78951 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-12-07T13:39:17Z |
| publishDate | 2005 |
| publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| record_format | dspace |
| spelling | Kobayashi, A. 2015-03-24T08:44:26Z 2015-03-24T08:44:26Z 2005 Application of high energy plasma for smart thermal processing / A. Kobayashi // Вопросы атомной науки и техники. — 2005. — № 1. — С. 161-165. — Бібліогр.: 12 назв. — англ. 1562-6016 PACS: 52.77.-j https://nasplib.isofts.kiev.ua/handle/123456789/78951 Nano-science & technology is one of the most important 4 scientific fields regarding the technological policy in Japan. Material processing is now progressing towards more precise and controllable smart stage. Regarding thermal processing, an important key should be the applied heat source. And plasma is fundamentally the most superior heat source, because of high temperature, high energy density, easy controllable, etc. Therefore more precious plasma system has been expected for smart thermal processing. The gastunnel type plasma system developed by the author has high energy density and also high efficiency. The concept and the feature of this plasma system are explained and the applications to the various thermal processing are described in this paper. One typical application is plasma spraying of ceramics such as Al 2O3 and ZrO2. The characteristics of these ceramic coatings were superior to the conventional ones. The ZrO2 composite coating has the possibility of the development of high functionally graded TBC (thermal barrier coating). Another application of gastunnel type plasma issurface modification of metals. For example the TiN films were formed in a very short time of 5 s. Finally the development of new type of smart plasma system and application of high-energy plasma to the environmental problems are also discussed. Нано- наука і технологія є одним з чотирьох найбільш важливих напрямків технологічної політики в Японії. Зараз технологія обробки матеріалів виходить на стадію використання більш точних і контрольованих високоякісних методів. З погляду термічної обробки, ключовим елементом повинне бути джерело тепла. Плазма споконвічно є найбільш зручним таким джерелом завдяки своїй високій температурі, високій щільності енергії, легкої керованості і т.п. Тому передбачається використання більш досконалих плазмових систем для високоякісної термічної обробки. Розроблений автором плазмовий пристрій на основі газового розряду тунельного типу характеризується великою щільністю енергії і високою ефективністю. У представленій роботі описана концепція цього пристрою, його особливості і застосування для різних видів термічної обробки. Типовим застосуванням є плазмове розпилення таких керамічних матеріалів, як Al2O3 і Zr2. Завдяки своїм властивостям ці керамічні покриття мають великі переваги в порівнянні зі звичайними покриттями. На основі композитного покриття з Zr2 можна створити багатофункціональне високоякісне покриття, що створює термічний бар'єр. Ще одним застосуванням плазмового пристрою на основі газового розряду тунельного типу є модифікація поверхні металів. Наприклад, плівки TiN формувалися за дуже короткий час - 5 с. На закінчення обговорюються також розробки нових типів високоточних плазмових пристроїв і використання высокоэнергетичної плазми в задачах, зв'язаних з охороною навколишнього середовища. Нано- наука и технология являются одним из четырёх наиболее важных направлений технологической политики в Японии. Сейчас технология обработки материалов выходит на стадию использования более точных и контролируемых высококачественных методов. С точки зрения термической обработки, ключевым элементом должен быть источник тепла. Плазма изначально является наиболее удобным таким источником благодаря своей высокой температуре, высокой плотности энергии, лёгкой управляемости и т. п. Поэтому предполагается использование более совершенных плазменных систем для высококачественной термической обработки. Разработанное автором плазменное устройство на основе газового разряда туннельного типа характеризуется большой плотностью энергии и высокой эффективностью. В представленной работе описаны концепция этого устройства, его особенности и применение для разных видов термической обработки. Типичным применением является плазменное распыление таких керамических материалов, как Al2O3 и ZrO2. По своим свойствам эти керамические покрытия обладают большими преимуществами по сравнению с обычными покрытиями. На основе композитного покрытия с ZrO2 можно создать многофункциональное высококачественное покрытие, создающее термический барьер. Ещё одним применением плазменного устройства на основе газового разряда туннельного типа является модификация поверхности металлов. Например, плёнки TiN формировались за очень короткое время - 5 с. В заключение обсуждаются также разработки новых типов высокоточных плазменных устройств и использование высокоэнергетической плазмы в задачах, связанных с охраной окружающей среды. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Low temperature plasma and plasma technologies Application of high energy plasma for smart thermal processing Застосування високоенергетичної плазми для високоякісної термічної обробки Применение высокоэнергетической плазмы для высококачественной термической обработки Article published earlier |
| spellingShingle | Application of high energy plasma for smart thermal processing Kobayashi, A. Low temperature plasma and plasma technologies |
| title | Application of high energy plasma for smart thermal processing |
| title_alt | Застосування високоенергетичної плазми для високоякісної термічної обробки Применение высокоэнергетической плазмы для высококачественной термической обработки |
| title_full | Application of high energy plasma for smart thermal processing |
| title_fullStr | Application of high energy plasma for smart thermal processing |
| title_full_unstemmed | Application of high energy plasma for smart thermal processing |
| title_short | Application of high energy plasma for smart thermal processing |
| title_sort | application of high energy plasma for smart thermal processing |
| topic | Low temperature plasma and plasma technologies |
| topic_facet | Low temperature plasma and plasma technologies |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/78951 |
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