Fedorchenko, V., Byrka, O., Chebotarev, V., Garkusha, I., & Tereshin, V. (2005). Characteristics of the plasma created by ECR plasma source for thin films deposition. Вопросы атомной науки и техники.
Chicago Style (17th ed.) CitationFedorchenko, V.D, O.V Byrka, V.V Chebotarev, I.E Garkusha, and V.I Tereshin. "Characteristics of the Plasma Created by ECR Plasma Source for Thin Films Deposition." Вопросы атомной науки и техники 2005.
MLA (8th ed.) CitationFedorchenko, V.D, et al. "Characteristics of the Plasma Created by ECR Plasma Source for Thin Films Deposition." Вопросы атомной науки и техники, 2005.
Warning: These citations may not always be 100% accurate.