The formation of near anode double layer in highcurrent plasma diode of low pressure

A plasma electron source on the basis of a pulse plasma diode of low pressure with an extended interelectrode gap has been experimentally investigated. The basis of a plasma electron source serves a gas discharge of a new type - selfmaintained beam-plasma discharge, which distinctive feature is the...

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Published in:Вопросы атомной науки и техники
Date:2002
Main Authors: Tseluyko, A.F., Zinov’ev, D.V., Borisko, V.N., Tseluyko, V.A., Drobishevskaya, A.A.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2002
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Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/79277
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:The formation of near anode double layer in highcurrent plasma diode of low pressure / A.F. Tseluyko, D.V. Zinov’ev, V.N. Borisko, V.A. Tseluyko, A.A. Drobishevskaya // Вопросы атомной науки и техники. — 2002. — № 5. — С. 127-129. — Бібліогр.: 6 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-79277
record_format dspace
spelling Tseluyko, A.F.
Zinov’ev, D.V.
Borisko, V.N.
Tseluyko, V.A.
Drobishevskaya, A.A.
2015-03-30T09:17:16Z
2015-03-30T09:17:16Z
2002
The formation of near anode double layer in highcurrent plasma diode of low pressure / A.F. Tseluyko, D.V. Zinov’ev, V.N. Borisko, V.A. Tseluyko, A.A. Drobishevskaya // Вопросы атомной науки и техники. — 2002. — № 5. — С. 127-129. — Бібліогр.: 6 назв. — англ.
1562-6016
PACS: 52.40.Hf
https://nasplib.isofts.kiev.ua/handle/123456789/79277
A plasma electron source on the basis of a pulse plasma diode of low pressure with an extended interelectrode gap has been experimentally investigated. The basis of a plasma electron source serves a gas discharge of a new type - selfmaintained beam-plasma discharge, which distinctive feature is the forming of a double electrical layer of a space charge in a discharge gap and generation of an intensive electron beam. The exterior parameters were determined, at which formation of a double layer and the acceleration of an electron beam in such discharge occurs immediately at working area of the anode. The plasma electron source is calculated on generation of an electron beam with the energy 〖10〗^4…〖10〗^5 eV at the current 2…3 kA, current density 200…300 A/cm 2 , pulse length 1…10 μs and efficiency of conversion of an exterior electric field energy into an electron beam energy up to 80%.
en
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
Вопросы атомной науки и техники
Low temperature plasma and plasma technologies
The formation of near anode double layer in highcurrent plasma diode of low pressure
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title The formation of near anode double layer in highcurrent plasma diode of low pressure
spellingShingle The formation of near anode double layer in highcurrent plasma diode of low pressure
Tseluyko, A.F.
Zinov’ev, D.V.
Borisko, V.N.
Tseluyko, V.A.
Drobishevskaya, A.A.
Low temperature plasma and plasma technologies
title_short The formation of near anode double layer in highcurrent plasma diode of low pressure
title_full The formation of near anode double layer in highcurrent plasma diode of low pressure
title_fullStr The formation of near anode double layer in highcurrent plasma diode of low pressure
title_full_unstemmed The formation of near anode double layer in highcurrent plasma diode of low pressure
title_sort formation of near anode double layer in highcurrent plasma diode of low pressure
author Tseluyko, A.F.
Zinov’ev, D.V.
Borisko, V.N.
Tseluyko, V.A.
Drobishevskaya, A.A.
author_facet Tseluyko, A.F.
Zinov’ev, D.V.
Borisko, V.N.
Tseluyko, V.A.
Drobishevskaya, A.A.
topic Low temperature plasma and plasma technologies
topic_facet Low temperature plasma and plasma technologies
publishDate 2002
language English
container_title Вопросы атомной науки и техники
publisher Національний науковий центр «Харківський фізико-технічний інститут» НАН України
format Article
description A plasma electron source on the basis of a pulse plasma diode of low pressure with an extended interelectrode gap has been experimentally investigated. The basis of a plasma electron source serves a gas discharge of a new type - selfmaintained beam-plasma discharge, which distinctive feature is the forming of a double electrical layer of a space charge in a discharge gap and generation of an intensive electron beam. The exterior parameters were determined, at which formation of a double layer and the acceleration of an electron beam in such discharge occurs immediately at working area of the anode. The plasma electron source is calculated on generation of an electron beam with the energy 〖10〗^4…〖10〗^5 eV at the current 2…3 kA, current density 200…300 A/cm 2 , pulse length 1…10 μs and efficiency of conversion of an exterior electric field energy into an electron beam energy up to 80%.
issn 1562-6016
url https://nasplib.isofts.kiev.ua/handle/123456789/79277
citation_txt The formation of near anode double layer in highcurrent plasma diode of low pressure / A.F. Tseluyko, D.V. Zinov’ev, V.N. Borisko, V.A. Tseluyko, A.A. Drobishevskaya // Вопросы атомной науки и техники. — 2002. — № 5. — С. 127-129. — Бібліогр.: 6 назв. — англ.
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first_indexed 2025-11-30T10:31:54Z
last_indexed 2025-11-30T10:31:54Z
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