The formation of near anode double layer in highcurrent plasma diode of low pressure

• Published in: Вопросы атомной науки и техники
• Date: 2002
• Main Authors: Tseluyko, A.F., Zinov’ev, D.V., Borisko, V.N., Tseluyko, V.A., Drobishevskaya, A.A.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2002
• Subjects: Low temperature plasma and plasma technologies
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/79277
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: The formation of near anode double layer in highcurrent plasma diode of low pressure / A.F. Tseluyko, D.V. Zinov’ev, V.N. Borisko, V.A. Tseluyko, A.A. Drobishevskaya // Вопросы атомной науки и техники. — 2002. — № 5. — С. 127-129. — Бібліогр.: 6 назв. — англ.

A plasma electron source on the basis of a pulse plasma diode of low pressure with an extended interelectrode gap has been experimentally investigated. The basis of a plasma electron source serves a gas discharge of a new type - selfmaintained beam-plasma discharge, which distinctive feature is the...