Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode

• Published in: Вопросы атомной науки и техники
• Date: 2002
• ISSN: 1562-6016
• Main Authors: Stekolnikov, A.F., Gruzdev, V.A., Petrovich, O.N.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2002
• Subjects: Plasma electronics
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/79283
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode / A.F. Stekolnikov, V.A. Gruzdev, O.N. Petrovich // Вопросы атомной науки и техники. — 2002. — № 5. — С. 113-114. — Бібліогр.: 2 назв. — англ.

The algorithm of numerical simulation of electrons sources in base of the high-voltage glow discharge with the anode plasma, taking into account change of the form and the location of a surface of anode plasma, that renders essential influence on formation of an ion stream, which at hit on the cold cathode as a result of secondary ion - electronic emission forms an electron beam, is offered. As against other algorithms the offered physics-mathematical model takes into account influence on distribution of potential not only an ion space charge, but also a space charge of beam electrons, distribution of potential in turn defines as a trajectory the beam electrons and a stream of ions, and position of plasma edge which movement is considered during formation of a beam according to Stefan's condition.