Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode
The algorithm of numerical simulation of electrons sources in base of the high-voltage glow discharge with the anode plasma, taking into account change of the form and the location of a surface of anode plasma, that renders essential influence on formation of an ion stream, which at hit on the cold...
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| Опубліковано в: : | Вопросы атомной науки и техники |
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| Дата: | 2002 |
| Автори: | , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2002
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| Теми: | |
| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/79283 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode / A.F. Stekolnikov, V.A. Gruzdev, O.N. Petrovich // Вопросы атомной науки и техники. — 2002. — № 5. — С. 113-114. — Бібліогр.: 2 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862747482735247360 |
|---|---|
| author | Stekolnikov, A.F. Gruzdev, V.A. Petrovich, O.N. |
| author_facet | Stekolnikov, A.F. Gruzdev, V.A. Petrovich, O.N. |
| citation_txt | Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode / A.F. Stekolnikov, V.A. Gruzdev, O.N. Petrovich // Вопросы атомной науки и техники. — 2002. — № 5. — С. 113-114. — Бібліогр.: 2 назв. — англ. |
| collection | DSpace DC |
| container_title | Вопросы атомной науки и техники |
| description | The algorithm of numerical simulation of electrons sources in base of the high-voltage glow discharge with the anode plasma, taking into account change of the form and the location of a surface of anode plasma, that renders essential influence on formation of an ion stream, which at hit on the cold cathode as a result of secondary ion - electronic emission forms an electron beam, is offered. As against other algorithms the offered physics-mathematical model takes into account influence on distribution of potential not only an ion space charge, but also a space charge of beam electrons, distribution of potential in turn defines as a trajectory the beam electrons and a stream of ions, and position of plasma edge which movement is considered during formation of a beam according to Stefan's condition.
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| first_indexed | 2025-12-07T20:50:48Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-79283 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-12-07T20:50:48Z |
| publishDate | 2002 |
| publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| record_format | dspace |
| spelling | Stekolnikov, A.F. Gruzdev, V.A. Petrovich, O.N. 2015-03-30T09:26:43Z 2015-03-30T09:26:43Z 2002 Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode / A.F. Stekolnikov, V.A. Gruzdev, O.N. Petrovich // Вопросы атомной науки и техники. — 2002. — № 5. — С. 113-114. — Бібліогр.: 2 назв. — англ. 1562-6016 PACS: 52.65.-y https://nasplib.isofts.kiev.ua/handle/123456789/79283 The algorithm of numerical simulation of electrons sources in base of the high-voltage glow discharge with the anode plasma, taking into account change of the form and the location of a surface of anode plasma, that renders essential influence on formation of an ion stream, which at hit on the cold cathode as a result of secondary ion - electronic emission forms an electron beam, is offered. As against other algorithms the offered physics-mathematical model takes into account influence on distribution of potential not only an ion space charge, but also a space charge of beam electrons, distribution of potential in turn defines as a trajectory the beam electrons and a stream of ions, and position of plasma edge which movement is considered during formation of a beam according to Stefan's condition. This work has been supported financially by the FFR (grant Т02М-090). en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Plasma electronics Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode Article published earlier |
| spellingShingle | Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode Stekolnikov, A.F. Gruzdev, V.A. Petrovich, O.N. Plasma electronics |
| title | Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode |
| title_full | Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode |
| title_fullStr | Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode |
| title_full_unstemmed | Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode |
| title_short | Simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode |
| title_sort | simulation of formation of an intensive electron beam in bipolar electron-optical system with the plasma anode |
| topic | Plasma electronics |
| topic_facet | Plasma electronics |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/79283 |
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