The modified 200 keV pulsed electron beam source for the VEPP-5 injection complex
The modified pulsed electron beam source on voltage 200 kV and current 10 A with half-height pulse duration 2.5 ns and repetition rate 50 Hz is described. The source gun has been performed on the base of impregnated cathode with 20 mm diameter. The cathode pulse voltage is formed by storage capaci...
Збережено в:
| Дата: | 2006 |
|---|---|
| Автори: | , , , , , , , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2006
|
| Назва видання: | Вопросы атомной науки и техники |
| Теми: | |
| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/79734 |
| Теги: |
Додати тег
Немає тегів, Будьте першим, хто поставить тег для цього запису!
|
| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | The modified 200 keV pulsed electron beam source for the VEPP-5 injection complex / A.V. Akimov, V.E. Akimov, P.A. Bak, I.V. Kazarezov, A.A. Korepanov, Ya.V. Kulenko, T.V. Ribitskaia, G.I. Kuznetsov, A.A. Pachkov, M.A. Tiunov // Вопросы атомной науки и техники. — 2006. — № 3. — С. 84-86. — Бібліогр.: 3 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | The modified pulsed electron beam source on voltage 200 kV and current 10 A with half-height pulse duration
2.5 ns and repetition rate 50 Hz is described. The source gun has been performed on the base of impregnated cathode
with 20 mm diameter. The cathode pulse voltage is formed by storage capacitance discharge through IGBT
switch and pulse transformer. The gun control unit located at the high voltage potential produces cathode heat voltage
and control grid voltage. The source test results are presented. |
|---|