The modified 200 keV pulsed electron beam source for the VEPP-5 injection complex
The modified pulsed electron beam source on voltage 200 kV and current 10 A with half-height pulse duration 2.5 ns and repetition rate 50 Hz is described. The source gun has been performed on the base of impregnated cathode with 20 mm diameter. The cathode pulse voltage is formed by storage capaci...
Saved in:
| Date: | 2006 |
|---|---|
| Main Authors: | , , , , , , , , , |
| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2006
|
| Series: | Вопросы атомной науки и техники |
| Subjects: | |
| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/79734 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | The modified 200 keV pulsed electron beam source for the VEPP-5 injection complex / A.V. Akimov, V.E. Akimov, P.A. Bak, I.V. Kazarezov, A.A. Korepanov, Ya.V. Kulenko, T.V. Ribitskaia, G.I. Kuznetsov, A.A. Pachkov, M.A. Tiunov // Вопросы атомной науки и техники. — 2006. — № 3. — С. 84-86. — Бібліогр.: 3 назв. — англ. |
Institution
Digital Library of Periodicals of National Academy of Sciences of Ukraine| id |
nasplib_isofts_kiev_ua-123456789-79734 |
|---|---|
| record_format |
dspace |
| spelling |
nasplib_isofts_kiev_ua-123456789-797342025-02-23T18:07:28Z The modified 200 keV pulsed electron beam source for the VEPP-5 injection complex Модифицированный 200 кэВ импульсный источник электронного пучка для форинжектора комплекса ВЭПП-5 Модифіковане 200 кеВ імпульсне джерело електронного пучка для форінжектора комплексу ВЕПП-5 Akimov, A.V. Akimov, V.E. Bak, P.A. Kazarezov, I.V. Korepanov, A.A. Kulenko, Ya.V. Ribitskaia, T.V. Kuznetsov, G.I. Pachkov, A.A. Tiunov, M.A. Ускорители заряженных частиц The modified pulsed electron beam source on voltage 200 kV and current 10 A with half-height pulse duration 2.5 ns and repetition rate 50 Hz is described. The source gun has been performed on the base of impregnated cathode with 20 mm diameter. The cathode pulse voltage is formed by storage capacitance discharge through IGBT switch and pulse transformer. The gun control unit located at the high voltage potential produces cathode heat voltage and control grid voltage. The source test results are presented. Описан модифицированный источник электронного пучка на напряжение 200 кВ, импульсный ток до 10 А, длительность импульса на полувысоте 2,5 нс при частоте следования 50 Гц. Источник выполнен на базе импрегнированного катода диаметром 20 мм. Импульсное напряжение на катоде пушки формируется путем разряда накопительной емкости через IGBT-ключ и импульсный трансформатор. Блок управления пушкой, расположенный под высоким потенциалом, формирует напряжение накала и сеточное напряжение. Приведены результаты испытаний источника. Описано модифіковане джерело електронного пучка на напругу 200 кВ, імпульсний струм до 10 А, тривалість імпульсу на напіввисоті 2,5 нс при частоті проходження 50 Гц. Джерело виконане на базі імпрегнуваного катоду діаметром 20 мм. Імпульсна напруга на катоді гармати формується шляхом розряду накопичувальної ємності через ІGBT-ключ і імпульсний трансформатор. Блок керування гарматою, розташований під високим потенціалом, формує напругу накалу і сіткову напругу. Наведено результати випробувань джерела. 2006 Article The modified 200 keV pulsed electron beam source for the VEPP-5 injection complex / A.V. Akimov, V.E. Akimov, P.A. Bak, I.V. Kazarezov, A.A. Korepanov, Ya.V. Kulenko, T.V. Ribitskaia, G.I. Kuznetsov, A.A. Pachkov, M.A. Tiunov // Вопросы атомной науки и техники. — 2006. — № 3. — С. 84-86. — Бібліогр.: 3 назв. — англ. 1562-6016 PACS: 27.17.+w https://nasplib.isofts.kiev.ua/handle/123456789/79734 en Вопросы атомной науки и техники application/pdf Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| language |
English |
| topic |
Ускорители заряженных частиц Ускорители заряженных частиц |
| spellingShingle |
Ускорители заряженных частиц Ускорители заряженных частиц Akimov, A.V. Akimov, V.E. Bak, P.A. Kazarezov, I.V. Korepanov, A.A. Kulenko, Ya.V. Ribitskaia, T.V. Kuznetsov, G.I. Pachkov, A.A. Tiunov, M.A. The modified 200 keV pulsed electron beam source for the VEPP-5 injection complex Вопросы атомной науки и техники |
| description |
The modified pulsed electron beam source on voltage 200 kV and current 10 A with half-height pulse duration
2.5 ns and repetition rate 50 Hz is described. The source gun has been performed on the base of impregnated cathode
with 20 mm diameter. The cathode pulse voltage is formed by storage capacitance discharge through IGBT
switch and pulse transformer. The gun control unit located at the high voltage potential produces cathode heat voltage
and control grid voltage. The source test results are presented. |
| format |
Article |
| author |
Akimov, A.V. Akimov, V.E. Bak, P.A. Kazarezov, I.V. Korepanov, A.A. Kulenko, Ya.V. Ribitskaia, T.V. Kuznetsov, G.I. Pachkov, A.A. Tiunov, M.A. |
| author_facet |
Akimov, A.V. Akimov, V.E. Bak, P.A. Kazarezov, I.V. Korepanov, A.A. Kulenko, Ya.V. Ribitskaia, T.V. Kuznetsov, G.I. Pachkov, A.A. Tiunov, M.A. |
| author_sort |
Akimov, A.V. |
| title |
The modified 200 keV pulsed electron beam source for the VEPP-5 injection complex |
| title_short |
The modified 200 keV pulsed electron beam source for the VEPP-5 injection complex |
| title_full |
The modified 200 keV pulsed electron beam source for the VEPP-5 injection complex |
| title_fullStr |
The modified 200 keV pulsed electron beam source for the VEPP-5 injection complex |
| title_full_unstemmed |
The modified 200 keV pulsed electron beam source for the VEPP-5 injection complex |
| title_sort |
modified 200 kev pulsed electron beam source for the vepp-5 injection complex |
| publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| publishDate |
2006 |
| topic_facet |
Ускорители заряженных частиц |
| url |
https://nasplib.isofts.kiev.ua/handle/123456789/79734 |
| citation_txt |
The modified 200 keV pulsed electron beam source for the VEPP-5 injection complex / A.V. Akimov, V.E. Akimov, P.A. Bak, I.V. Kazarezov, A.A. Korepanov, Ya.V. Kulenko,
T.V. Ribitskaia, G.I. Kuznetsov, A.A. Pachkov, M.A. Tiunov // Вопросы атомной науки и техники. — 2006. — № 3. — С. 84-86. — Бібліогр.: 3 назв. — англ. |
| series |
Вопросы атомной науки и техники |
| work_keys_str_mv |
AT akimovav themodified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT akimovve themodified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT bakpa themodified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT kazarezoviv themodified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT korepanovaa themodified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT kulenkoyav themodified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT ribitskaiatv themodified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT kuznetsovgi themodified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT pachkovaa themodified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT tiunovma themodified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT akimovav modificirovannyj200kévimpulʹsnyjistočnikélektronnogopučkadlâforinžektorakompleksavépp5 AT akimovve modificirovannyj200kévimpulʹsnyjistočnikélektronnogopučkadlâforinžektorakompleksavépp5 AT bakpa modificirovannyj200kévimpulʹsnyjistočnikélektronnogopučkadlâforinžektorakompleksavépp5 AT kazarezoviv modificirovannyj200kévimpulʹsnyjistočnikélektronnogopučkadlâforinžektorakompleksavépp5 AT korepanovaa modificirovannyj200kévimpulʹsnyjistočnikélektronnogopučkadlâforinžektorakompleksavépp5 AT kulenkoyav modificirovannyj200kévimpulʹsnyjistočnikélektronnogopučkadlâforinžektorakompleksavépp5 AT ribitskaiatv modificirovannyj200kévimpulʹsnyjistočnikélektronnogopučkadlâforinžektorakompleksavépp5 AT kuznetsovgi modificirovannyj200kévimpulʹsnyjistočnikélektronnogopučkadlâforinžektorakompleksavépp5 AT pachkovaa modificirovannyj200kévimpulʹsnyjistočnikélektronnogopučkadlâforinžektorakompleksavépp5 AT tiunovma modificirovannyj200kévimpulʹsnyjistočnikélektronnogopučkadlâforinžektorakompleksavépp5 AT akimovav modifíkovane200kevímpulʹsnedžereloelektronnogopučkadlâforínžektorakompleksuvepp5 AT akimovve modifíkovane200kevímpulʹsnedžereloelektronnogopučkadlâforínžektorakompleksuvepp5 AT bakpa modifíkovane200kevímpulʹsnedžereloelektronnogopučkadlâforínžektorakompleksuvepp5 AT kazarezoviv modifíkovane200kevímpulʹsnedžereloelektronnogopučkadlâforínžektorakompleksuvepp5 AT korepanovaa modifíkovane200kevímpulʹsnedžereloelektronnogopučkadlâforínžektorakompleksuvepp5 AT kulenkoyav modifíkovane200kevímpulʹsnedžereloelektronnogopučkadlâforínžektorakompleksuvepp5 AT ribitskaiatv modifíkovane200kevímpulʹsnedžereloelektronnogopučkadlâforínžektorakompleksuvepp5 AT kuznetsovgi modifíkovane200kevímpulʹsnedžereloelektronnogopučkadlâforínžektorakompleksuvepp5 AT pachkovaa modifíkovane200kevímpulʹsnedžereloelektronnogopučkadlâforínžektorakompleksuvepp5 AT tiunovma modifíkovane200kevímpulʹsnedžereloelektronnogopučkadlâforínžektorakompleksuvepp5 AT akimovav modified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT akimovve modified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT bakpa modified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT kazarezoviv modified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT korepanovaa modified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT kulenkoyav modified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT ribitskaiatv modified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT kuznetsovgi modified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT pachkovaa modified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex AT tiunovma modified200kevpulsedelectronbeamsourceforthevepp5injectioncomplex |
| first_indexed |
2025-11-24T08:19:11Z |
| last_indexed |
2025-11-24T08:19:11Z |
| _version_ |
1849659072874283008 |
| fulltext |
THE MODIFIED 200 keV PULSED ELECTRON BEAM SOURCE
FOR THE VEPP-5 INJECTION COMPLEX
A.V. Akimov, V.E. Akimov, P.A. Bak, I.V. Kazarezov, A.A. Korepanov, Ya.V. Kulenko,
T.V. Ribitskaia, G.I. Kuznetsov, A.A. Pachkov, M.A. Tiunov
The Budker Institute of Nuclear Physics, Novosibirsk, Russia
The modified pulsed electron beam source on voltage 200 kV and current 10 A with half-height pulse duration
2.5 ns and repetition rate 50 Hz is described. The source gun has been performed on the base of impregnated cath-
ode with 20 mm diameter. The cathode pulse voltage is formed by storage capacitance discharge through IGBT
switch and pulse transformer. The gun control unit located at the high voltage potential produces cathode heat volt-
age and control grid voltage. The source test results are presented.
PACS: 27.17.+w
1. INTRODUCTION
In the Budker Institute of Nuclear Physics SB RAS a
construction of the VEPP-5 injection complex is
continued. Electron bunches for preinjector are formed
by an electron gun operating at a stable mode of
200 kV, 2 A current amplitude [1]. The 12.5 mm in
diameter oxide cathode-grid unit from GS-34B valve is
used as electrons emitter. This cathode does not provide
a required current and also is not durable enough. To
provide the complex project parameters the electron gun
with parameters listed below was designed:
electron energy……………………..200 keV;
bunch current amplitude…………...10 A;
pulse duration (at half height)……...2…3 ns;
pulse repetition rate………………..50 Hz;
beam emittance less than……..0.01 π cm rad;
the cathode life-time…………..more than 104 hours.
The results of electron source (electron gun with
control unit, high voltage modulator, electron-optic line)
tests and also its parameters measurement results are
presented.
2. ELECTRON SOURCE DESIGN
The electron source design is shown in Fig.1. The
accelerating tube (11) along with the gun control unit
(GCU) (12) installed on it, the pulse transformer (PT)
(3) and the modulator parts (the IGBT module (1) and
the primary storage unit (13)) are placed in the common
SF6 filled tank (2) under pressure 0.17 MPa.
Fig. 2. 200 kV gun and pulse modulator design.
1 – IGBT module, 2 – SF6 filled tank, 3 – PT, 4 – capacitive divider, 5 – cathode-grid unit with focusing electrode,
6 – electrodes, 7 – ion pump, 8 – magnetic lenses, 9 – beam current resistive monitors, 10 – collector, 11 – gate,
12 – accelerating tube, 13 – gun control unit, 14 – primary circuit capacitive storage unit
Fig.1. 200 kV and pulse modulator design.
1 – IGBT module; 2 – SF6 filled tank; 3 – PT; 4 – capacitive divider; 5 – cathode-grid unit with focusing
electrode; 6 – electrodes; 7 – ion pump; 8 – magnetic lenses; 9 – beam current resistive monitors; 10 – collector;
11 – gate; 12 – accelerating tube; 13 – gun control unit; 14 – primary circuit capacitive unit
In a design like this all modulator pulse elements are
shielded by a metal tank, therefore, an electromagnetic
striking is reduced to minimum [2]. A high-voltage
pulse former is based on the resonant charge of sec-
ondary capacitance through the step up pulse trans-
former and subsequent discharge to the primary storage
capacitance back.
The pulse former circuit is presented in Fig.2. At the
expense of small overall dimensions of the high voltage
elements (accelerating tube, gun control unit) and modi-
fied electron-optical scheme it is succeeded to reduce
the electron source total capacitance more than 2 times
(down to ~50 pF) as compared with old variant of the
gun [1]. Therefore, negative consequences of high volt-
age discharges were strongly decreased.
____________________________________________________________
PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY. 2006. № 3.
Series: Nuclear Physics Investigations (47), p.84-86.
84
Fig.2. The pulse former circuit
An electron-optical system of the gun is described in
[3]. A cathode-grid unit with a focusing electrode is
manufactured on the flange as one spear unit (5)
(Fig.1). To decrease the breakdown influence on the
GCU reliability the scheme with ''grounded'' grid is uti-
lized. A dispenser spherical cathode unit 20 mm in di-
ameter produced in “Thorium”, Moscow, is used as an
electron emitter. The cathode allows 4–5 disassemblies
of the gun and exposure on the air without its emission
degradation. The control grid has spherical radius
100 mm, cell size 0.4×0.4 mm, width of crosspieces
0.06 mm and is made of 100 mkm molybdenum. The
distance between grid and cathode is equal to 0.5 mm
and is decreased down to 0.4 mm when the unit is heat-
ed. The measured grid transparency is 0.685. The accel-
erating tube consists of 6 welded alumino-oxide ceramic
22HS rings with outer and inner diameters 150 mm and
135 mm, respectively. The accelerating electrodes,
which along with the focusing electrode and anode are
forming the electron-optical system, are fixed into the
tube electrode recesses.
The beam transportation and its matching to the lin-
ear accelerator input are performed by means of two
magnetic lenses (7,9). Nanosecond resistive wall current
monitors (8) allow measuring an amplitude and a shape
of the current pulses with required precision. The vacu-
um gate (10) installed between the gun and the linear
accelerator permits one to fix on the preinjector the op-
erational gun previously prepared and tested on the sep-
arated facility.
The primary storage capacitance is charged from
special charging unit which allowed stabilization of out-
put voltage with precision better than ±0.25%.
The specially designed compact gun pulser gener-
ates voltage pulses of up to 290 V amplitude and pulse
duration at halfheight ~3 ns. To disable current and to
regulate extraction voltage the unit forms constant bias
voltage on the cathode in the range 10…200 V. The
same unit supplies the cathode filament. Pulse former
triggering is realized using plastic optic fiber cables.
The double secondary winding of the PT is used to sup-
ply the GCU.
3. TEST RESULTS
At present time the electron source operation is
tested on a test bench. A collector is used as a beam
receiver. In such design the source worked for several
dozens of hours in nominal mode (200 kV, 50 Hz). The
shape of beam current at the first current monitor at the
electrons energy 200 keV is shown in Fig.3.
Fig.3. The shape of beam current at the first monitor
REFERENCES
1. V.E. Akimov, I.V. Kazarezov, A.A. Korepanov et
al. 200 keV electron beam pulse source for the
complex VEPP-5 preinjector // Problems of Atomic
Science and Technology. Series: Nuclear Physics
Investigations. 2001, №3(38), p.111-112.
2. V.E. Akimov, I.V. Kazarezov, A.A. Korepanov.
200 keV pulse modulator for power supply of
VEPP-5 injection complex electron gun //
Problems of Atomic Science and Technology.
Series: Nuclear Physics Investigations. 2004,
№2(43), p.67-68.
3. V.E. Akimov, I.V. Kazarezov, G.I. Kuznetsov,
____________________________________________________________
PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY. 2006. № 3.
Series: Nuclear Physics Investigations (47), p.84-86.
85
M.A. Tiunov. Electron-optical system of 200 kV
gun for the VEPP-5 preinjector // Problems of
Atomic Science and Technology. Series: Nuclear
Physics Investigations. 2004, №1(42), p.128-130.
МОДИФИЦИРОВАННЫЙ 200 кэВ ИМПУЛЬСНЫЙ ИСТОЧНИК ЭЛЕКТРОННОГО ПУЧКА ДЛЯ
ФОРИНЖЕКТОРА КОМПЛЕКСА ВЭПП-5
А.В. Акимов, В.Е. Акимов, П.А. Бак, И.В. Казарезов, А.А. Корепанов, Я.В. Куленко, Т.В. Рыбицкая,
Г.И. Кузнецов, А.А. Пачков, М.А. Тиунов
Описан модифицированный источник электронного пучка на напряжение 200 кВ, импульсный ток до
10 А, длительность импульса на полувысоте 2,5 нс при частоте следования 50 Гц. Источник выполнен на
базе импрегнированного катода диаметром 20 мм. Импульсное напряжение на катоде пушки формируется
путем разряда накопительной емкости через IGBT-ключ и импульсный трансформатор. Блок управления
пушкой, расположенный под высоким потенциалом, формирует напряжение накала и сеточное напряжение.
Приведены результаты испытаний источника.
МОДИФІКОВАНЕ 200 кеВ ІМПУЛЬСНЕ ДЖЕРЕЛО ЕЛЕКТРОННОГО ПУЧКА
ДЛЯ ФОРІНЖЕКТОРА КОМПЛЕКСУ ВЕПП-5
А.В. Акимов, В.Є. Акімов, П.А. Бак, І.В. Казарезов, А.А. Корепанов, Я.В. Куленко, Т.В. Рибицька,
Г.І. Кузнецов, А.А. Пачков, М.А. Тіунов
Описано модифіковане джерело електронного пучка на напругу 200 кВ, імпульсний струм до 10 А,
тривалість імпульсу на напіввисоті 2,5 нс при частоті проходження 50 Гц. Джерело виконане на базі
імпрегнуваного катоду діаметром 20 мм. Імпульсна напруга на катоді гармати формується шляхом розряду
накопичувальної ємності через ІGBT-ключ і імпульсний трансформатор. Блок керування гарматою,
розташований під високим потенціалом, формує напругу накалу і сіткову напругу. Наведено результати
випробувань джерела.
86
REFERENCES
|