The flow density of atoms sputtered from a cathode of cylinder magnetron
The results of calculations of atom flows, sputtered from a cathode of special cylindrical magnetron sputtering system, presented. The atoms flow in cylinder magnetron will be larger with respect to planar magnetron due to the axial symmetry of the system. It is shown that deposition rate weakly dep...
Saved in:
| Published in: | Вопросы атомной науки и техники |
|---|---|
| Date: | 2005 |
| Main Authors: | Panchenko, O.A., Goncharov, A.A., Demchishin, A.V., Kostin, E.G., Pavlov, S.N., Stetsenko, B.V. |
| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2005
|
| Subjects: | |
| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/79777 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | The flow density of atoms sputtered from a cathode of cylinder magnetron / O.A. Panchenko, A.A. Goncharov, A.V. Demchishin, E.G. Kostin, S.N. Pavlov, B.V. Stetsenko // Вопросы атомной науки и техники. — 2005. — № 2. — С. 170-172. — Бібліогр.: 9 назв. — англ. |
Institution
Digital Library of Periodicals of National Academy of Sciences of UkraineSimilar Items
Features of high-current pulsed regimes in regimes in magnetron sputtering systems
by: Bizyukov, A.A., et al.
Published: (2005)
by: Bizyukov, A.A., et al.
Published: (2005)
Solid ion source based on hollow-cylindrical magnetron sputtering discharge
by: Azarenkov, N.A., et al.
Published: (2003)
by: Azarenkov, N.A., et al.
Published: (2003)
Synthesis of thin-film Ta₂O₅ coatings by reactive magnetron sputtering
by: Yakovin, S., et al.
Published: (2016)
by: Yakovin, S., et al.
Published: (2016)
Control of ionization processes in magnetron sputtering system by changing magnetic field configuration
by: Chunadra, А.G., et al.
Published: (2021)
by: Chunadra, А.G., et al.
Published: (2021)
The antimicrobial activity of magnetron sputtered Ag doped aluminum oxide coatings in vitro
by: Safonov, V., et al.
Published: (2019)
by: Safonov, V., et al.
Published: (2019)
Digital processing of optical emission spectra of magnetron sputtering plasma system
by: Afanasіeva, I.A., et al.
Published: (2019)
by: Afanasіeva, I.A., et al.
Published: (2019)
Cylindrical magnetron based on the plasmaoptical principles
by: Dobrovol's'kii, A.M., et al.
Published: (2007)
by: Dobrovol's'kii, A.M., et al.
Published: (2007)
Plasma devices for ion beam and plasma deposition applications
by: Goncharov, A., et al.
Published: (2005)
by: Goncharov, A., et al.
Published: (2005)
Development of additional magnetron discharge in the drift region of an ion source with closed electron drift
by: Bordenjuk, I.V., et al.
Published: (2008)
by: Bordenjuk, I.V., et al.
Published: (2008)
Technological accelerator with closed electron drift for surface treatment
by: Goncharov, A.A., et al.
Published: (2000)
by: Goncharov, A.A., et al.
Published: (2000)
Evaporation of micro-droplets in cathode arc plasma coating under formed electron beam
by: Goncharov, A.A., et al.
Published: (2022)
by: Goncharov, A.A., et al.
Published: (2022)
Modernized technological accelerator with anode layer for ion cleaning
by: Dobrovol`s`kii, A.N., et al.
Published: (2002)
by: Dobrovol`s`kii, A.N., et al.
Published: (2002)
Morphology and sputtering of tungsten nitrides coatings exposed to deuterium plasma
by: Tolstolutskaya, G.D., et al.
Published: (2023)
by: Tolstolutskaya, G.D., et al.
Published: (2023)
Oxygen activation effect on reactive magnetron synthesis of alumina coatings
by: Walkowicz, J., et al.
Published: (2007)
by: Walkowicz, J., et al.
Published: (2007)
Oxygen activation effect on reactive magnetron synthesis of alumina coatings
by: Walkowicz, J., et al.
Published: (2007)
by: Walkowicz, J., et al.
Published: (2007)
Vacuum-arc plasma source with steered cathode spot
by: Aksyonov, D.S., et al.
Published: (2008)
by: Aksyonov, D.S., et al.
Published: (2008)
Optical and mass spectra from reactive plasma at magnetron deposition of tantalum oxynitride
by: Dudin, S., et al.
Published: (2021)
by: Dudin, S., et al.
Published: (2021)
Glow discharge with a hollow cathode in carbon dioxide
by: Lisovskiy, V.A., et al.
Published: (2022)
by: Lisovskiy, V.A., et al.
Published: (2022)
Using of electron cyclotron resonance discharge in ion beam sputtering systems for space charge compensation
by: Bizyukov, A.A., et al.
Published: (2019)
by: Bizyukov, A.A., et al.
Published: (2019)
Magnetron discharge intensification for effective deposition of coatings from difficult spray metals
by: Chunadra, А.G., et al.
Published: (2020)
by: Chunadra, А.G., et al.
Published: (2020)
Thin niobium superconducting film prepared by modified cylindrical magnetron
by: Langner, J., et al.
Published: (2000)
by: Langner, J., et al.
Published: (2000)
Magnetic field influence on the shape of eroding surface of graphite cathodes
by: Aksenov, I.I., et al.
Published: (2002)
by: Aksenov, I.I., et al.
Published: (2002)
Redistribution of sputtered material in a plane ion-plasma system with an abnormal glow discharge
by: Kuzmichev, A.I., et al.
Published: (2020)
by: Kuzmichev, A.I., et al.
Published: (2020)
Investigation of reflecting discharge with the sectioned metal-hydride hollow cathode
by: Borisko, V.N., et al.
Published: (2005)
by: Borisko, V.N., et al.
Published: (2005)
Peculiarities of self-sustained discharge in closed electron drift accelerator based on permanent magnets
by: Pavlov, S.N., et al.
Published: (2002)
by: Pavlov, S.N., et al.
Published: (2002)
The HF field pattern in the magnetized plasma cylinder of finfte lenght
by: Grekov, D.L., et al.
Published: (2003)
by: Grekov, D.L., et al.
Published: (2003)
Low-pressure uniform plasma generator based on hollow cathode for ion plasma technologies
by: Khomich, V.A., et al.
Published: (2022)
by: Khomich, V.A., et al.
Published: (2022)
Complex mathematical model and calculation method for high emission gas discharge hollow cathodes
by: Nesterenko, S.Yu., et al.
Published: (2005)
by: Nesterenko, S.Yu., et al.
Published: (2005)
Current compensation of hydrogen ion beam extracted from PIG with metal-hydride cathode
by: Borisko, V.N., et al.
Published: (2007)
by: Borisko, V.N., et al.
Published: (2007)
Method of increasing the longitudnal current of Н⁻ ions from pig with a metal-hydride cathode
by: Sereda, I.N., et al.
Published: (2019)
by: Sereda, I.N., et al.
Published: (2019)
Influence of metal hydride hollow cathode on Penning ion source operation
by: Sereda, I., et al.
Published: (2021)
by: Sereda, I., et al.
Published: (2021)
Influence of gas mixture with various mass numbers of gases on operation pressure range of plasma electron source with hollow cathode
by: Borisko, V.N., et al.
Published: (2002)
by: Borisko, V.N., et al.
Published: (2002)
An attempt for increasing the efficiency of penning source of Н ⁻ ions with a metal hydride cathode
by: Sereda, I., et al.
Published: (2020)
by: Sereda, I., et al.
Published: (2020)
Modulation of negatively charged particle flux from penning discharge with metal hydride cathode
by: Sereda, I., et al.
Published: (2023)
by: Sereda, I., et al.
Published: (2023)
Microwave resonator probe diagnoctics of plasma density fluctuations
by: Kostrov, A.V., et al.
Published: (2007)
by: Kostrov, A.V., et al.
Published: (2007)
Synthesis of TiO₂ different phase by DC magnetron sputtering
by: Dobrovolskiy, A., et al.
Published: (2014)
by: Dobrovolskiy, A., et al.
Published: (2014)
Experimental studies of the interaction of ion- and plasma-streams with carbon-based targets placed near a cathode of plasma-focus facility
by: Gribkov, V.A., et al.
Published: (2005)
by: Gribkov, V.A., et al.
Published: (2005)
Plasma density measurement of RF ion source
by: Voznyy, V.I., et al.
Published: (2005)
by: Voznyy, V.I., et al.
Published: (2005)
Mechanisms affecting the speed and direction of vacuum arc cathode spots movement in a magnetic field
by: Vasyliev, V.V., et al.
Published: (2023)
by: Vasyliev, V.V., et al.
Published: (2023)
The influence of nitrogen admixture on concentration of an electronic–excited helium atoms in atmospheric pressure glow discharge
by: Arkhipenko, V.I., et al.
Published: (2005)
by: Arkhipenko, V.I., et al.
Published: (2005)
Similar Items
-
Features of high-current pulsed regimes in regimes in magnetron sputtering systems
by: Bizyukov, A.A., et al.
Published: (2005) -
Solid ion source based on hollow-cylindrical magnetron sputtering discharge
by: Azarenkov, N.A., et al.
Published: (2003) -
Synthesis of thin-film Ta₂O₅ coatings by reactive magnetron sputtering
by: Yakovin, S., et al.
Published: (2016) -
Control of ionization processes in magnetron sputtering system by changing magnetic field configuration
by: Chunadra, А.G., et al.
Published: (2021) -
The antimicrobial activity of magnetron sputtered Ag doped aluminum oxide coatings in vitro
by: Safonov, V., et al.
Published: (2019)