Deposition of nanocrystalline silicon films into low frequency induction RF discharge

• Published in: Вопросы атомной науки и техники
• Date: 2014
• Main Authors: Deryzemlia, A.M., Kryshtal, P.G., Malykhin, D.G., Radchenko, V.I., Shirokov, B.M.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2014
• Subjects: Физика и технология конструкционных материалов
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/79911
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Deposition of nanocrystalline silicon films into low frequency induction RF discharge / A.M. Deryzemlia, P.G. Kryshtal, D.G. Malykhin, V.I. Radchenko, B.M. Shirokov // Вопросы атомной науки и техники. — 2014. — № 1. — С. 147-150. — Бібліогр.: 14 назв. — англ.

Results of experiments on obtaining nanocrystalline silicon films with the method of stimulated plasma-enhanced chemical vapor deposition (PECVD) into low frequency induction RF discharge (880 kHz) allowed in silicon tetrachloride diluted with hydrogen are presented. High rate value, as 2.41 nm/s, o...