High-productive source of the cathodic vacuum-arc plasma with the rectilinear filter
The design and performance of high productive cathodic vacuum arc plasma source with rectilinear “magnetic
 island” filter, which is suitable for industrial applications, are briefly described. The device is characterized by
 achievable output ion current up to 4 A at an arc current...
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2013-10-23
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| Zitieren: | High-productive source of the cathodic vacuum-arc plasma with the rectilinear filter / V.V. Vasylyev, A.A. Luchaninov, V.E. Strel’nitskij // Вопросы атомной науки и техники. — 2014. — № 1. — С. 97-100. — Бібліогр.: 8 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1860242952913158144 |
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| author | Vasylyev, V.V. Luchaninov, A.A. Strel’nitskij, V.E. |
| author_facet | Vasylyev, V.V. Luchaninov, A.A. Strel’nitskij, V.E. |
| citation_txt | High-productive source of the cathodic vacuum-arc plasma with the rectilinear filter / V.V. Vasylyev, A.A. Luchaninov, V.E. Strel’nitskij // Вопросы атомной науки и техники. — 2014. — № 1. — С. 97-100. — Бібліогр.: 8 назв. — англ. |
| collection | DSpace DC |
| container_title | Вопросы атомной науки и техники |
| description | The design and performance of high productive cathodic vacuum arc plasma source with rectilinear “magnetic
island” filter, which is suitable for industrial applications, are briefly described. The device is characterized by
achievable output ion current up to 4 A at an arc current of 100 A, Ti coating deposition rate at a distance of
150 mm from the outlet is 20 micron/hour within the circle of 180 mm diameter. In terms of productivity and quality
of plasma purification from particulates the developed plasma source is superior to world analogues by 1.5...2 times.
Приведено краткое описание конструкции и характеристик высокопроизводительного, пригодного для
промышленного применения, вакуумно-дугового источника плазмы с прямолинейным фильтром типа
«магнитный остров». Достижимый выходной ионный ток источника – 4 А при токе дуги 100 А. Скорость
осаждения Ti-покрытия на расстоянии 150 мм…20 мкм/ч в пределах круга диаметром 180 мм. По
производительности и качеству очистки от макрочастиц разработанное устройство превосходит мировые
аналоги в 1,5…2 раза.
Наведено скорочений опис конструкції та характеристики високопродуктивного, придатного для
промислового застосування, вакуумно-дугового джерела плазми з прямолінійним фільтром типу «магнітний
острів». Досяжний вихідний іонний струм джерела – 4 А при струмі дуги 100 А. Швидкість осадження
Ti-покриття на відстані 150 мм…20 мкм/год у межах кола з діаметром 180 мм. За продуктивністю та якістю
очищення від макрочасток розроблений пристрій перевершує світові аналоги в 1,5…2 рази.
|
| first_indexed | 2025-12-07T18:32:19Z |
| format | Article |
| fulltext |
ISSN 1562-6016. ВАНТ. 2014. №1(89) 97
HIGH-PRODUCTIVE SOURCE OF THE CATHODIC VACUUM-ARC
PLASMA WITH THE RECTILINEAR FILTER
V.V. Vasylyev, A.A. Luchaninov, V.E. Strel’nitskij
National Science Centеr “Kharkov Institute of Physics and Technology”,
Kharkov, Ukraine
The design and performance of high productive cathodic vacuum arc plasma source with rectilinear “magnetic
island” filter, which is suitable for industrial applications, are briefly described. The device is characterized by
achievable output ion current up to 4 A at an arc current of 100 A, Ti coating deposition rate at a distance of
150 mm from the outlet is 20 micron/hour within the circle of 180 mm diameter. In terms of productivity and quality
of plasma purification from particulates the developed plasma source is superior to world analogues by 1.5...2 times.
PACS: 52.50.Dg; 81.15.-z
INTRODUCTION
The vacuum-arc method of coating deposition has
received wide industrial application in almost all
branches of engineering for the hardening of cutting
tools and machine parts. The main drawback of the
method is the generating droplet phase of the cathode
spot of a vacuum arc. This leads to deterioration of the
deposited coatings. A radical solution to this problem is
the use of filtering systems to clean the plasma flows of
droplets and particulates. However, existing filtering
systems inefficient, which hampers their use in
industrial applications.
Currently, in the NSC KIPT the high-performance
source of cathodic vacuum arc plasma with rectilinear
filter, which includes so called “magnetic island”,
developed and manufactured, the design suitable for
industrial applications.
The magnetic island (MI) filters originate from 80-th
of 20 century, when the first design was patented by
KIPT inventors [1]. Plasma generated on the cathode
surface propagates along the straight tube with
longitudinal magnetic field like in a straight filter, but
there is a shield with the magnetic structure on the axis
and there is no line-of-sight between the cathode and
substrate. The MI magnetic field directed opposite to
that created by external coils. The resulting lines
configuration allows plasma stream round the MI and
pass the plasma-guide with minimal losses whereas the
macroparticles trapped by the shield and walls.
In the first design there was electromagnetic coil
placed inside the MI. Later the constant magnet was
applied in the MI in addition to the magnetic coil for
creating the same configuration of the magnetic force
lines [2]. Another arrangement realized in [3] where a
shield plate of non-magnetic stainless steel placed
between the cathode and the substrate, and the magnetic
field focused using a permanent magnet, positioned
behind the substrate, that produced a field of around
300mT on the substrate. In this apparatus the deposition
of TiN was studied.
Comparison of the toroidal filter and MI one in
Al2O3 coating deposition was done in [4]. The
deposition rates achieved applying the toroidal filter
were a factor of 5 higher (approx. 2 nm·s−1) than the
deposition rates with the MI, but the surface area
available for homogeneous deposition was much
smaller with the toroidal filter (approx. 30 mm in
diameter). Initial tests for the deposition of Al2O3
without particle filter showed that the droplet coverage
of the coated surface is close to 100 %. Applying the
toroidal filter and the shield/magnetic island filter,
strong reductions of the droplet coverage of the coated
surfaces were obtained.
The MI filters are the objects of interest to present
day. The authors of [5] compared the efficiency of MI
filters working with DC and pulse vacuum-arc sources.
Applying the magnetic island filter it can be seen (with
500x magnification of Ti coatings) that practically no
macroparticles were visible for both arcs (pulse and
DC). For DC arc 125 A the measured deposition rate at
distance 5,5 cm behind MI was of r = 4.5 nm/s at
Bext = 6 mT and BMI = 36 mT (r =19 nm/s without MI).
Here Bext and BMI are the values of the magnetic field
created by the external coils and MI structure
respectively. The ‘system efficiency’ of the plasma
source with the magnetic island filter was not evaluated.
None design described before in the literature was
industrially suitable because of low deposition rate
or/and small deposition area. The goal of the present
publication is brief description of the design and
performance of cathodic vacuum arc plasma source with
rectilinear filter, which is suitable for industrial
applications.
EXPERIMENTAL DEVICE DESCRIPTION
Vacuum-arc plasma is created and transported to the
substrate in a plasma-optical system with the rectilinear
filter shown in Fig. 1 [6].
This system includes a cathode 1, an anode 2, and a
plasma guide with electromagnetic coils encircling the
aforementioned elements. The plasma guide includes
two parts: the inlet part. 4 and the outlet part 5; these
parts are electrically insulated from each other and from
the anode. The system further includes an arc power
supply source 15 and macroparticle reflectors 3. The
system also includes an electromagnetic deflection coil
12 placed inside an electroconductive tube case 11
(magnetic island) coaxially placed inside the anode,
electrically connected thereto, and screened on the
cathode side.
In a plasma-optical system a transporting magnetic
field has a constant time component which is created by
two electromagnetic coils 9 and 10. Besides the
transported plasma flow is exposed to additional
magnetic fields, whose intensities are varied
98 ISSN 1562-6016. ВАНТ. 2014. №1(89)
proportional to electric currents running through the
follows structural elements (anode 2, magnetic island 11
and output section 5 of plasma guide) of the plasma-
optical system. This is a subject of IP [6]. The additional
magnetic fields inside the anode are created with an
electromagnetic coil 16 encircling the anode and an
electromagnetic deflection coil 12 coaxially placed
inside the anode. A positive terminal of the arc power
supply source is electrically connected to the anode
through an electromagnetic coil 16 encircling it and
connected to the case of the MI through a coil 12. Arc
electric current flows through the coils. When the
plasma flow approaches the surface of some structural
element, the intensity of corresponding additional
magnetic field is increased proportional to an intensity
of the electric current running through this element.
Fig. 1. Scheme of the vacuum-arc system. The arrows
on the magnetic field lines indicate the direction of the
magnetic field
The main parameters of the design are follows. The
diameter of the cylindrical cathode is 60 mm. The inner
diameter of the output flange is 180 mm. The overall
length of the device is 800 mm. Arc current up to
150 A. Arc voltage drop is in the range of 30…40 V
(Ti-cathode) or 40…70 V (graphite cathode). Power
consume of the electromagnetic coils is less than
1.5 kW. Achievable output ion current is 4 A when an
arc current is of 100 A. It is necessary to use argon for
stable arc operation with graphite cathode. The physical
configuration of the vacuum arc source with the MI
filter is shown in Fig. 2.
TRANSPORTING AND FILTERING
PROPERTIES OF THE FILTER
The magnetic field distribution in the plasma guide
channel strongly influences the transport properties of
the plasma-optical system. Instantaneous distribution of
the magnetic field lines is shown in Fig. 1. The direction
of the magnetic field created by outer coils is opposite
to that of the MI coil and magnetic field lines distort.
Therefore the charged components of the plasma started
on the cathode surface flows along the curved magnetic
field lines and pass around the case of the magnetic
island, whereas the macroparticles go along straight
lines and stop on the surfaces of the MI case and
reflectors placed on the inner sides of the anode and
plasma guide. The additional magnetic fields, created by
the fraction of the arc current flow through the
electromagnetic coil 16 encircling the anode and an
electromagnetic deflection coil 12 coaxially placed
inside the anode, adjust the radial position of the plasma
stream and promote the increase in output ion current.
Fig. 2. Plasma coating setup with the vacuum arc
source and MI filter
The “system efficiency” ε of the plasma source with
the MI filter was evaluated using the ratio of the ion
current Ii collected by a circular plate collector of 8 cm
in radius, placed at the output of the filter, to the arc
discharge current Iarc, i.e. ε = Ii/Iarc. Its value amounts to
4%, that is 1.5…2 times greater than superior world
analogues. Output ion current Ii is determined by the arc
current Iarc and magnetic system properties. The plot Ii
versus Iarc is shown in Fig. 3. The output ion current
nearly linearly grows with the arc one.
0
1
2
3
4
5
6
50 60 70 80 90 100
O
ut
pu
t
io
n
cu
rr
en
t,
A
Arc current, A
Fig. 3. Output ion current Ii versus the arc current Iarc
(Ti-cathode)
Proper directions of currents in the magnetic coils
are crucial for the system operation. Wrong
commutation can cause the damage of the design. To
obtain the maximum output ion current Ii value, the
magnetic system should be optimized. A constant time
component of the transporting magnetic field is created
by two electromagnetic coils: 9 and 10. Coil 9 (“cathode
coil”) sets also the regime of operation of vacuum arc
evaporator. The dependence of the Ii on I9 (the current
in coil 9) is shown in Fig. 4.
Quality of plasma filtration was verified by
examining the surface of Ti-coating deposited on
polished monocrystal Si during 30 min. The Si
specimens were placed at a distance of 150 mm from
the output flange of the filter. In Figs. 5a, 5b the
appearance of the region (marked with the scratch) of
the surface of uncoated and Ti coated specimen
disposed at 50 mm from the axis is shown. The small
number of the introduced defects confirms the good
filtering properties of the developed device.
ISSN 1562-6016. ВАНТ. 2014. №1(89) 99
0
1
2
3
4
0 1 2 3 4 5 6
Ii
o
n
, A
I9,A
Fig. 4. Dependence of the output ion current on the
current in the “cathode coil”. Iarc = 100 A
Fig. 5a. The appearance of the initial surface
of Si sample with the scratched mark on it
Fig. 5b. The appearance of the same region of the
surface coated with Ti (30 min deposition duration)
EXAMPLES OF SOURCE USE FOR
DEPOSITION THE FUNCTIONAL
COATINGS
The hard nitride and DLC coatings were deposited
on the setup described in [7]. Arc supply source with the
open circuit voltage of 150 V was used for stable arc
operation with the graphite cathode. Focusing of the
plasma flow in the vacuum chamber with the additional
magnetic coil placed behind the substrate ensured a high
deposition rate of Ti-coatings of 20 μm/h at the arc
current of 100 A, uniform over the area of ~ 18 cm in
diameter. For DLC coatings the rate is of 4 μm/h at the
arc current of 70 A over the same diameter (Fig. 6).
DLC thickness distribution
0
1
2
3
4
5
0 55 110 165 220
X coordinate, mm
Th
ic
kn
es
s
h,
m
ic
ro
n
Fig. 6. Distribution of DLC film’s thickness h(x).
X coordinate of axis is 110 mm
The mechanical properties of the nitride TiN, TiAlN,
TiAlYN coatings, manufactured by PIII&D method
using new high-performance source of cathodic vacuum
arc plasma with MI filter, are listed in the Table.
Mechanical properties of the nitride PIII&D coatings
Coating
composition TiN (Ti0.5Al0.5)N Ti0.5-xAl0.5YxN
(x≤0.01)
Thickness, μm 7…10 5…6 5…7
Hardness, GPa
32…36 30…35 30…35
Residual stress,
GPa 4…5 3…4 3…4
The erosion rate under the action of cavitation in
distilled water at room temperature was studied on the
facility with an ultrasonic vibrator. Cavitation durability
of the produced coatings illustrates Fig. 7.
Incorporation of small amount of yttrium in PIII&D
(Ti, Al)N coatings led to increase in their wear
resistance. Nanostructured hard (Ti, Al)N+1 at.%Y
coatings with high oxidation resistance showed the best
characteristics during cavitation tests [8]. The average
rate of the cavitation and abrasion wear of
(Ti, Al)N + 1 at.%Y coatings is 3 to 5 times less than
that of the (Ti, Al)N coating and is 10 times less than
that of the TiN coating deposited under the same
conditions.
Fig. 7. Kinetic curves of cavitation wear of the stainless
steel specimens with the nitride coatings of various
compositions [8]
, h
M
as
s l
os
s
100 ISSN 1562-6016. ВАНТ. 2014. №1(89)
CONCLUSIONS
New high-performance source of cathodic vacuum
arc plasma with “magnetic island” rectilinear filter has
been developed and manufactured in the NSC KIPT, the
design suitable for industrial applications. Features of
the manufactured source:
– achievable output ion current up to 4 A when an
arc current of 100 A;
– the diameter of the applied coating with the
thickness deviation ± 5% – 180 mm;
– Ti coating deposition rate at a distance of 150 mm
from the outlet – 20 micron/hour.
In terms of productivity and degree of plasma
purification from particulates the developed plasma
source is superior to world analogues by 1.5...2 times.
The source can be used successfully for the deposition
of high-quality functional coatings on various
substrates.
REFERENCES
1. U.S. Pat. N 4,452,686. Arc plasma generator and
a plasma arc apparatus for treating the surfaces of
work-pieces, incorporating the same arc plasma
generator / I.I. Aksenov, V.A. Belous, V.M. Khoro-
shikh, V.G. Padalka. 1984.
2. A. Kleiman, A. Marquez, and R.L. Boxman.
Performance of a magnetic island macroparticle filter in
a titanium vacuum arc // Plasma Sources Sci. Technol.
2008, v. 17, p. 015008.
3. H. Takikawa, M. Nagayama, R. Miyano, and
T. Sakakibara. Enhancement of shielded cathodic arc
deposition // Surf. Coat. Technol. 2003, v. 169-170,
p. 49-52
4. H. Bolt, F. Koch, J.L. Rodet, D. Karpov, and
S. Menzel. Al2O3 coatings deposited by filtered vacuum
arc – characterization of high temperature properties //
Surf. Coat. Technol. 1999, v. 116-119, p. 956-62.
5. A. Duran, M. Fazio, A. Kleiman, et al. Study of
the efficiency of magnetic island macroparticle filters
for different vacuum arc configurations // Journal of
Physics: Conference Series. 2012, v. 370, p. 012016.
6. PCT patent application, WO 2012/064311 A1,
18.05.2012. Method and device for transporting vacuum
arc plasma / V.V. Vasyliev, V.E. Strelnytskij.
7. V.A. Belous, V.V. Vasyliev, V.S. Goltvyanytsya,
et al. Structure and properties of Ti-Al-Y-N coatings
deposited from filtered vacuum-arc plasma // Surface &
Coatings Technology. 2011, v. 206, p. 1720-1726.
8. V. Belous, V. Vasyliev, A. Luchaninov, et al.
Cavitation and abrasion resistance of Ti-Al-Y-N
coatings prepared by the PIII&D technique from filtered
vacuum-arc plasma // Surface & Coatings Technology.
2013, v. 223, p. 68-74.
Статья поступила в редакцию 23.10.2013 г.
ВЫСОКОПРОИЗВОДИТЕЛЬНЫЙ ВАКУУМНО-ДУГОВОЙ ИСТОЧНИК ПЛАЗМЫ
С ПРЯМОЛИНЕЙНЫМ ФИЛЬТРОМ
В.В. Васильев, А.А. Лучанинов, В.Е. Стрельницкий
Приведено краткое описание конструкции и характеристик высокопроизводительного, пригодного для
промышленного применения, вакуумно-дугового источника плазмы с прямолинейным фильтром типа
«магнитный остров». Достижимый выходной ионный ток источника – 4 А при токе дуги 100 А. Скорость
осаждения Ti-покрытия на расстоянии 150 мм…20 мкм/ч в пределах круга диаметром 180 мм. По
производительности и качеству очистки от макрочастиц разработанное устройство превосходит мировые
аналоги в 1,5…2 раза.
ВИСОКОПРОДУКТИВНЕ ВАКУУМНО-ДУГОВЕ ДЖЕРЕЛО ПЛАЗМИ
З ПРЯМОЛІНІЙНИМ ФІЛЬТРОМ
В.В. Васильєв, О.А. Лучанінов, В.Є. Стрельницький
Наведено скорочений опис конструкції та характеристики високопродуктивного, придатного для
промислового застосування, вакуумно-дугового джерела плазми з прямолінійним фільтром типу «магнітний
острів». Досяжний вихідний іонний струм джерела – 4 А при струмі дуги 100 А. Швидкість осадження
Ti-покриття на відстані 150 мм…20 мкм/год у межах кола з діаметром 180 мм. За продуктивністю та якістю
очищення від макрочасток розроблений пристрій перевершує світові аналоги в 1,5…2 рази.
|
| id | nasplib_isofts_kiev_ua-123456789-79933 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-12-07T18:32:19Z |
| publishDate | 2013-10-23 |
| publisher | National Science Centеr “Kharkov Institute of Physics and Technology”, Kharkov, Ukraine |
| record_format | dspace |
| spelling | Vasylyev, V.V. Luchaninov, A.A. Strel’nitskij, V.E. 2015-04-09T08:09:35Z 2015-04-09T08:09:35Z 2013-10-23 High-productive source of the cathodic vacuum-arc plasma with the rectilinear filter / V.V. Vasylyev, A.A. Luchaninov, V.E. Strel’nitskij // Вопросы атомной науки и техники. — 2014. — № 1. — С. 97-100. — Бібліогр.: 8 назв. — англ. 1562-6016 PACS: 52.50.Dg; 81.15.-z https://nasplib.isofts.kiev.ua/handle/123456789/79933 The design and performance of high productive cathodic vacuum arc plasma source with rectilinear “magnetic
 island” filter, which is suitable for industrial applications, are briefly described. The device is characterized by
 achievable output ion current up to 4 A at an arc current of 100 A, Ti coating deposition rate at a distance of
 150 mm from the outlet is 20 micron/hour within the circle of 180 mm diameter. In terms of productivity and quality
 of plasma purification from particulates the developed plasma source is superior to world analogues by 1.5...2 times. Приведено краткое описание конструкции и характеристик высокопроизводительного, пригодного для
 промышленного применения, вакуумно-дугового источника плазмы с прямолинейным фильтром типа
 «магнитный остров». Достижимый выходной ионный ток источника – 4 А при токе дуги 100 А. Скорость
 осаждения Ti-покрытия на расстоянии 150 мм…20 мкм/ч в пределах круга диаметром 180 мм. По
 производительности и качеству очистки от макрочастиц разработанное устройство превосходит мировые
 аналоги в 1,5…2 раза. Наведено скорочений опис конструкції та характеристики високопродуктивного, придатного для
 промислового застосування, вакуумно-дугового джерела плазми з прямолінійним фільтром типу «магнітний
 острів». Досяжний вихідний іонний струм джерела – 4 А при струмі дуги 100 А. Швидкість осадження
 Ti-покриття на відстані 150 мм…20 мкм/год у межах кола з діаметром 180 мм. За продуктивністю та якістю
 очищення від макрочасток розроблений пристрій перевершує світові аналоги в 1,5…2 рази. en National Science Centеr “Kharkov Institute of Physics and Technology”, Kharkov, Ukraine Вопросы атомной науки и техники Физика и технология конструкционных материалов High-productive source of the cathodic vacuum-arc plasma with the rectilinear filter Высокопроизводительный вакуумно-дуговой источник плазмы с прямолинейным фильтром Високопродуктивне вакуумно-дугове джерело плазми з прямолінійним фільтром Article published earlier |
| spellingShingle | High-productive source of the cathodic vacuum-arc plasma with the rectilinear filter Vasylyev, V.V. Luchaninov, A.A. Strel’nitskij, V.E. Физика и технология конструкционных материалов |
| title | High-productive source of the cathodic vacuum-arc plasma with the rectilinear filter |
| title_alt | Высокопроизводительный вакуумно-дуговой источник плазмы с прямолинейным фильтром Високопродуктивне вакуумно-дугове джерело плазми з прямолінійним фільтром |
| title_full | High-productive source of the cathodic vacuum-arc plasma with the rectilinear filter |
| title_fullStr | High-productive source of the cathodic vacuum-arc plasma with the rectilinear filter |
| title_full_unstemmed | High-productive source of the cathodic vacuum-arc plasma with the rectilinear filter |
| title_short | High-productive source of the cathodic vacuum-arc plasma with the rectilinear filter |
| title_sort | high-productive source of the cathodic vacuum-arc plasma with the rectilinear filter |
| topic | Физика и технология конструкционных материалов |
| topic_facet | Физика и технология конструкционных материалов |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/79933 |
| work_keys_str_mv | AT vasylyevvv highproductivesourceofthecathodicvacuumarcplasmawiththerectilinearfilter AT luchaninovaa highproductivesourceofthecathodicvacuumarcplasmawiththerectilinearfilter AT strelnitskijve highproductivesourceofthecathodicvacuumarcplasmawiththerectilinearfilter AT vasylyevvv vysokoproizvoditelʹnyivakuumnodugovoiistočnikplazmysprâmolineinymfilʹtrom AT luchaninovaa vysokoproizvoditelʹnyivakuumnodugovoiistočnikplazmysprâmolineinymfilʹtrom AT strelnitskijve vysokoproizvoditelʹnyivakuumnodugovoiistočnikplazmysprâmolineinymfilʹtrom AT vasylyevvv visokoproduktivnevakuumnodugovedžereloplazmizprâmolíníinimfílʹtrom AT luchaninovaa visokoproduktivnevakuumnodugovedžereloplazmizprâmolíníinimfílʹtrom AT strelnitskijve visokoproduktivnevakuumnodugovedžereloplazmizprâmolíníinimfílʹtrom |