Formation of thin film Cr-N composites under ion bombardment at low rates of chromium deposition

• Published in: Вопросы атомной науки и техники
• Date: 2006
• Main Authors: Guglya, A., Litvinenko, M., Marchenko, Y., Vasilenko, R.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2006
• Subjects: Физика радиационных и ионно-плазменных технологий
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/80293
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Formation of thin film Cr-N composites under ion bombardment at low rates of chromium deposition / A. Guglya, M. Litvinenko, Y. Marchenko, R. Vasilenko // Вопросы атомной науки и техники. — 2006. — № 4. — С. 200-203. — Бібліогр.: 9 назв. — англ.

One of peculiar features of the IBAD technology consists in that the damage level and concentration of implanted ions are distributed nonuniformly in the depth of deposited material. The calculations, we have done earlier [1], showed that the highest degree of nonequilibrium is realized in the first...