Electron sources for plasma electronics and different technological application

• Veröffentlicht in: Вопросы атомной науки и техники
• Datum: 2002
• Hauptverfasser: Antipov, V.S., Bez’yazyshny, I.A., Berezhnaya, I.V., Kornilov, E.A.
• Format: Artikel
• Sprache: English
• Veröffentlicht: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2002
• Schlagworte: Plasma electronics
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/80310
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Electron sources for plasma electronics and different technological application / V.S. Antipov, I.A. Bez’yazyshny, I.V. Berezhnaya, E.A. Kornilov // Вопросы атомной науки и техники. — 2002. — № 4. — С. 155-157. — Бібліогр.: 4 назв. — англ.

There are the following advantages of applying electron guns with plasma cathodes in devices exciting microwave radiation: stability of their parameters, high density of current, relative insensitivity to ion bombardment and the possibility of operating over a wide range of pressure values of a plasma-generating gas [1-5]. The given work aims at constructing the guns with the parameters necessary for the excitation of microwaves of high amplitudes in the slow-wave structures: the beam energy is 20-30 kV, the current is up to 5 A, and the pulse duration is 0,11÷1 ms. The principal problem arising during construction of heavy-current electron sources with plasma emitters consists in the following: it is necessary to provide such conditions of the gas volume, under which the discharge firing would be stable and the emissive plasma generation be effective, whereas a gas breakdown in the accelerating gap must be eliminated.