Application of arc plasma for a deposition of superconducting films

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Published in:Вопросы атомной науки и техники
Date:2002
Main Authors: Langner, J., Russo, R., Catani, L., Tazzari, S., Cirillo, M., Czaus, K., Merlo, V., Tazzioli, F., Proch, D., Koval, N.N., Lopatin, I.V.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2002
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Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/80324
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Application of arc plasma for a deposition of superconducting films / J. Langner, R. Russo, L. Catani, S. Tazzari, M. Cirillo, K. Czaus, V. Merlo, F. Tazzioli, D. Proch, N.N. Koval, I.V. Lopatin // Вопросы атомной науки и техники. — 2002. — № 4. — С. 161-164. — Бібліогр.: 4 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Langner, J.
Russo, R.
Catani, L.
Tazzari, S.
Cirillo, M.
Czaus, K.
Merlo, V.
Tazzioli, F.
Proch, D.
Koval, N.N.
Lopatin, I.V.
author_facet Langner, J.
Russo, R.
Catani, L.
Tazzari, S.
Cirillo, M.
Czaus, K.
Merlo, V.
Tazzioli, F.
Proch, D.
Koval, N.N.
Lopatin, I.V.
citation_txt Application of arc plasma for a deposition of superconducting films / J. Langner, R. Russo, L. Catani, S. Tazzari, M. Cirillo, K. Czaus, V. Merlo, F. Tazzioli, D. Proch, N.N. Koval, I.V. Lopatin // Вопросы атомной науки и техники. — 2002. — № 4. — С. 161-164. — Бібліогр.: 4 назв. — англ.
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publishDate 2002
publisher Національний науковий центр «Харківський фізико-технічний інститут» НАН України
record_format dspace
spelling Langner, J.
Russo, R.
Catani, L.
Tazzari, S.
Cirillo, M.
Czaus, K.
Merlo, V.
Tazzioli, F.
Proch, D.
Koval, N.N.
Lopatin, I.V.
2015-04-14T18:29:15Z
2015-04-14T18:29:15Z
2002
Application of arc plasma for a deposition of superconducting films / J. Langner, R. Russo, L. Catani, S. Tazzari, M. Cirillo, K. Czaus, V. Merlo, F. Tazzioli, D. Proch, N.N. Koval, I.V. Lopatin // Вопросы атомной науки и техники. — 2002. — № 4. — С. 161-164. — Бібліогр.: 4 назв. — англ.
1562-6016
PACS: 52.77.-j
https://nasplib.isofts.kiev.ua/handle/123456789/80324
This work was supported mainly by Italian INFN grant ARCO and DESY.
 The authors are grateful to Dr. S.Calatroni and Dr. C.Benvenuti of CERN for constant support of cathodes and samples substrates. We would like to thank Prof. M.Sadowski for help in the arrangement of the new laboratory in Swierk and very useful disscusion. We are indebted to the group of Prof. Vaglio (University of Naples) for help and support forinductive measurements). We are also very indebted to R.Sorchetti and G.Fuga from INFN, LNF Frascati and A.Trembicki as well as ing.R. Mirowski from IPJ Swierk for the constant help during the design, construction and commissioning of our apparatus.
en
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
Вопросы атомной науки и техники
Low temperature plasma and plasma technologies
Application of arc plasma for a deposition of superconducting films
Article
published earlier
spellingShingle Application of arc plasma for a deposition of superconducting films
Langner, J.
Russo, R.
Catani, L.
Tazzari, S.
Cirillo, M.
Czaus, K.
Merlo, V.
Tazzioli, F.
Proch, D.
Koval, N.N.
Lopatin, I.V.
Low temperature plasma and plasma technologies
title Application of arc plasma for a deposition of superconducting films
title_full Application of arc plasma for a deposition of superconducting films
title_fullStr Application of arc plasma for a deposition of superconducting films
title_full_unstemmed Application of arc plasma for a deposition of superconducting films
title_short Application of arc plasma for a deposition of superconducting films
title_sort application of arc plasma for a deposition of superconducting films
topic Low temperature plasma and plasma technologies
topic_facet Low temperature plasma and plasma technologies
url https://nasplib.isofts.kiev.ua/handle/123456789/80324
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