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Application of arc plasma for a deposition of superconducting films

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Bibliographic Details
Published in:	Вопросы атомной науки и техники
Date:	2002
Main Authors:	Langner, J., Russo, R., Catani, L., Tazzari, S., Cirillo, M., Czaus, K., Merlo, V., Tazzioli, F., Proch, D., Koval, N.N., Lopatin, I.V.
Format:	Article
Language:	English
Published:	Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2002
Subjects:	Low temperature plasma and plasma technologies
Online Access:	https://nasplib.isofts.kiev.ua/handle/123456789/80324
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Journal Title:	Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:	Application of arc plasma for a deposition of superconducting films / J. Langner, R. Russo, L. Catani, S. Tazzari, M. Cirillo, K. Czaus, V. Merlo, F. Tazzioli, D. Proch, N.N. Koval, I.V. Lopatin // Вопросы атомной науки и техники. — 2002. — № 4. — С. 161-164. — Бібліогр.: 4 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine

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