Formation of thin film Cr-N composites under ion bombardment at low rates of chromium deposition
One of peculiar features of the IBAD technology consists in that the damage level and concentration of implanted ions are distributed nonuniformly in the depth of deposited material. The calculations, we have done earlier [1], showed that the highest degree of nonequilibrium is realized in the f...
Збережено в:
| Дата: | 2006 |
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| Автори: | , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2006
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| Назва видання: | Вопросы атомной науки и техники |
| Теми: | |
| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/80341 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Formation of thin film Cr-N composites under ion bombardment at low rates of chromium deposition / A. Guglya, M. Litvinenko, Y. Marchenko, R. Vasilenko // Вопросы атомной науки и техники. — 2006. — № 4. — С. 200-203. — Бібліогр.: 9 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | One of peculiar features of the IBAD technology consists in that the damage level and concentration of implanted ions are
distributed nonuniformly in the depth of deposited material. The calculations, we have done earlier [1], showed that the highest
degree of nonequilibrium is realized in the first 50 nm of a coating. However, just in this thickness the nucleation and formation
of the material structure is observed. The peculiarities of chromium coating formation without assisted irradiation and under
bombarding with nitrogen ions having the energy of 30 keV were studied. The rates of chromium deposition were low, 0,05…0,1
nm/s. During the experiment the vacuum was maintained at a level of 4·10⁻³ Pa and was determined, in main, by the content of nitrogen
molecules arriving from the discharging chamber of the ion source. The thickness within the range from 3 to 10 nm was
investigated. The results have shown that at the earliest stages of the film growth solely chromium nitride CrN is formed. Sizes
of visible nuclei are in the range from 1 to 4 nm, and their density is 1…3·10¹²cm⁻²
. As the film thickness increases, the nuclei are
growing, then their coalescence occurs and a uniform coating is formed. Chromium deposition without irradiation, but at the
same nitrogen pressure, resulted in formation of chromium hcp structure with the following crystallographic parameters: a = 0,315 nm; c = 0,492 nm. The grain size was 3…4 nm. After reaching the coating continuity, the hcp structure was transformed
into the bcc structure with the parameter a = 0,261 nm. |
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