Ion energy and angular distributions in RF capacitively coupled plasma sources
The possibilities to control ion energy distribution functions (IEDFs) and ion angle distribution functions (IADFs) on electrodes in single- and dualfrequency capacitively coupled plasma (CCP) sources are investigated by means of particle-in-cell/Monte Carlo (PIC/MCC) simulations. It is shown that...
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| Published in: | Вопросы атомной науки и техники |
|---|---|
| Date: | 2006 |
| Main Authors: | , |
| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2006
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| Subjects: | |
| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/81155 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Ion energy and angular distributions in RF capacitively coupled plasma sources / O.V. Manuilenko, K.M. Minaeva // Вопросы атомной науки и техники. — 2006. — № 5. — С. 116-121. — Бібліогр.: 16 назв. — англ. |