The effect of nitrogen pressure during vacuum-arc TiN coatings deposition on the erosoin resistance in plasma of magnetron type discharges
The erosion process was investigated of TiN coatings which were made with the vacuum-arc sputtering of Ti at the different nitrogen pressures (10⁻⁴…5•10⁻³ Torr). The erosion rates were measured by the weighting on analytical balance before and after treatment by plasmas of magnetron type, axial symm...
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2014
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| Cite this: | The effect of nitrogen pressure during vacuum-arc TiN coatings deposition on the erosoin resistance in plasma of magnetron type discharges / G.P. Glazunov, A.A. Andreev, O.V. Sobol’, M.N. Bondarenko, A.L. Konotopskiy, V.A. Stolbovoy // Вопросы атомной науки и техники. — 2014. — № 6. — С. 76-79. — Бібліогр.: 10 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1860182572174147584 |
|---|---|
| author | Glazunov, G.P. Andreev, A.A. Sobol, O.V. Bondarenko, M.N. Konotopskiy, A.L. Stolbovoy, V.A. |
| author_facet | Glazunov, G.P. Andreev, A.A. Sobol, O.V. Bondarenko, M.N. Konotopskiy, A.L. Stolbovoy, V.A. |
| citation_txt | The effect of nitrogen pressure during vacuum-arc TiN coatings deposition on the erosoin resistance in plasma of magnetron type discharges / G.P. Glazunov, A.A. Andreev, O.V. Sobol’, M.N. Bondarenko, A.L. Konotopskiy, V.A. Stolbovoy // Вопросы атомной науки и техники. — 2014. — № 6. — С. 76-79. — Бібліогр.: 10 назв. — англ. |
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| container_title | Вопросы атомной науки и техники |
| description | The erosion process was investigated of TiN coatings which were made with the vacuum-arc sputtering of Ti at the different nitrogen pressures (10⁻⁴…5•10⁻³ Torr). The erosion rates were measured by the weighting on analytical balance before and after treatment by plasmas of magnetron type, axial symmetrical discharges in nitrogen atmosphere, at the temperatures of 500…1100ºС. It was shown that an erosion rate of TiN coatings deposited at low pressures (~10⁻⁴ Torr) is essentially (up to 1.5 times) lower than that for coatings produced at the more high pressures (5•10⁻³ Torr). For samples produced in the regime with high voltage pulses supply on substrate the erosion is lower than for coatings deposited in the regime without pulses supply. Taking into account the results of X-ray diffraction measurements, the physical mechanisms are suggested to explain such character of erosion behavior.
Исследован процесс эрозии TiN-покрытий, полученных вакуумно-дуговым распылением титана при различных давлениях азота (10⁻⁴…5•10⁻³ Торр). Скорости эрозии измерялись методом взвешивания на аналитических весах до и после плазменной обработки в атмосфере азота при температурах 500…1100ºС. Обнаружено, что скорость эрозии TiN-покрытий, осажденных при низких давлениях (~1•10⁻⁴ Торр), существенно (до полутора раз) ниже, чем для покрытий, нанесенных при более высоких давлениях азота (5•10⁻³ Торр). Для образцов, полученных в режиме с подачей импульсов на подложку, эрозия в среднем несколько ниже, чем у покрытий, осажденных в безимпульсном режиме. С учетом результатов исследований покрытий методом рентгеновской дифракции предложены и обсуждаются возможные физические механизмы для объяснения такого характера поведения эрозии.
Досліджено процес ерозії TiN-покриттів, отриманих вакуумно-дуговим розпилюванням титану при різному тиску азоту (10⁻⁴…5•10⁻³ Торр). Швидкості ерозії вимірювалися методом зважування на аналітичних вагах до і після плазмової обробки в атмосфері азоту при температурах 500…1100ºС Виявлено, що швидкість ерозії TiN-покриттів, осаджених при нижчому тиску (~1•10⁻⁴ Торр), істотно нижче, ніж для покриттів, нанесених при вищому тиску азоту (5•10⁻³ Торр). Для зразків, отриманих у режимі з подачею імпульсів на підкладку, ерозія в середньому декілька нижча, ніж у покриттів, осаджених у безімпульсному режимі. З урахуванням результатів досліджень покриттів методом рентгенівської дифракції запропоновані і обговорюються можливі фізичні механізми для пояснення такого характеру поведінки ерозії.
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ISSN 1562-6016. ВАНТ. 2014. №6(94)
76 PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY. 2014, №6. Series: Plasma Physics (20), p. 76-79.
THE EFFECT OF NITROGEN PRESSURE DURING VACUUM-ARC TiN
COATINGS DEPOSITION ON THE EROSOIN RESISTANCE IN PLASMA
OF MAGNETRON TYPE DISCHARGES
G.P. Glazunov, A.A. Andreev, O.V. Sobol’
1
, M.N. Bondarenko,
A.L. Konotopskiy, V.A. Stolbovoy
Institute of Plasma Physics NSC “Kharkov Institute of Physics and Technology”,
Kharkov, Ukraine;
1
National Technical University “Kharkiv Politechnical Institute”, Kharkiv, Ukraine
E mail: glazunov@ipp.kharkov.ua
The erosion process was investigated of TiN coatings which were made with the vacuum-arc sputtering of Ti at
the different nitrogen pressures (10
-4
…5·10
-3
Torr). The erosion rates were measured by the weighting on analytical
balance before and after treatment by plasmas of magnetron type, axial symmetrical discharges in nitrogen
atmosphere, at the temperatures of 500…1100ºС. It was shown that an erosion rate of TiN coatings deposited at
low pressures (~10
-4
Torr) is essentially (up to 1.5 times) lower than that for coatings produced at the more high
pressures (5·10
-3
Torr). For samples produced in the regime with high voltage pulses supply on substrate the erosion
is lower than for coatings deposited in the regime without pulses supply. Taking into account the results of X-ray
diffraction measurements, the physical mechanisms are suggested to explain such character of erosion behavior.
PACS: 52.40.Hf
INTRODUCTION
It was shown yearly [1-2] that nitrogen pressure
during TiN coating deposition can strongly impact on
film characteristics: micro-hardness (H), phase
composition, concentration of nitrogen (C), etc. It is
accepted as incorrect, to use e.g., TiN coatings
produced at low nitrogen pressure as wearproof, due to
their high brittleness[1-2]. But when one use TiN
coatings in plasma devices, such criterions as erosion
resistivity and thermocyclic resistivity are most
important. It was shown in the work [3] that absolute
value of erosion rates of TiN coatings deposited at low
pressure can be essentially lower than that for samples
produced at more high pressures. This result was
explained by the difference in nitrogen concentration
(C) in coatings produced at different pressures. But
these data had preliminary character and was obtained
only for two pressures (2·10
-3
and 5·10
-3
Torr). So in this
work more systematic investigations were carried out of
an erosion behavior of TiN coatings deposited at
different nitrogen pressures, including very low (10
-4
Torr).
1. EXPERIMENTAL AND RESULTS
The experiments were carried out at the DCM-1
device (bench for diagnostic of materials under plasmas
irradiation) under operating conditions of magnetron-
type cylindrical-symmetry discharge [4]. The scheme of
the experiment is clear in Fig. 1. The typical discharge
parameters were as follows: magnetic field in the region
of discharge ~ 0.05 T, working gas pressure 0.2 Pa,
discharge voltage 0.55 kV, the discharge current varied
within 60 to 180 mA (at the same time sample
temperature was changed from 500 to 1100ºC). The
Langmuir probe was used to measure the plasma
column edge characteristics such as electron
temperature Te, electron density ne, plasma potential ,
which determine according to method described in [5].
Fig. 1. Experiment scheme
The typical edge plasma characteristics of
magnetron-type discharges in nitrogen atmosphere
were: Te ~ 10…20 eV, ne ~ 10
9
cm
-3
, ~ -100 V. The
samples presented 200×10×0.3 mm straps from stainless
steel 12Kh18N10T, on both sides of which 10…15 μm
thick titanium nitride coatings were deposited by two
different technologies: i) with feeding HV negative
potential pulses to the substrate [6], and ii) without
feeding the mentioned pulses (traditional technology
[7]). TiN coatings were produced in “Bulat-6” device
with two Ti vacuum-arc evaporators placed along
horizontal axis of chamber, on its butt ends. It was
prepared two series of samples. The first batch of
samples was produced in the typical regime without
supply of high-voltage (HV) pulses on substrate. In this
case the current of arc discharge was 95 and 110 A,
substrate potential was -230 V, nitrogen pressure in the
chamber was changed from 1·10
-4
to 5·10
-3
Torr,
deposition time was 3 hours. Coating thickness was
calculated from overweight after deposition, and its
absolute average values were 12.1 m. The second
serious of samples was produced under the same arc
parameters and deposition time, but with feeding HV
mailto:glazunov@ipp.kharkov.ua
ISSN 1562-6016. ВАНТ. 2014. №6(94) 77
negative potential pulses to the substrate (-2000 V).
Pulse duration was 10 ms, pulse-repetition frequency
was 7 kHz. TiN coating average thickness in this case
was 10.5 m. It was prepared four batches of samples at
the nitrogen pressures of 5·10
-4
, 10
-3
, 5·10
-3
Torr with
feeding HV negative potential pulses to the substrate
and four batches without supply of HV pulses. Color of
samples made at the low pressures (~10
-4
Torr) was
straw, made at pressures 5х10
-4
…10
-3
Torr – golden-
yellow and made at pressure 5х10
-3
Torr – red-gold
color.
The influence of nitrogen pressure during TiN
coatings deposition on sputtering coefficient in plasma
of magnetron type discharges in nitrogen is presented in
Figs 2, 3. Axis of abscises in Fig. 2 is nitrogen pressure
in “Bulat-6” device. Ordinate axis is sputtering
coefficient multiplied on 10. In this figure the micro-
hardness (H) literature data (blue circles) [1] and
nitrogen concentration (C) in TiN (black circles) are
shown, too. In the last case only character of nitrogen
concentration behavior are presented but not its absolute
value.
0
0,5
1
1,5
2
2,5
3
3,5
4
4,5
5
1,E-05 1,E-04 1,E-03 1,E-02 1,E-01
Nitrogen pressure, Torr
S
p
u
tt
e
ri
n
g
c
o
e
ff
ic
ie
n
t
/1
0
a
t/
io
n
M
ic
ro
h
a
rd
n
e
s
s
,
х
1
0
G
P
a
64mA
120 mA
160 mA
H [1]
C [1]
Fig. 2. Sputtering coefficient in plasma of magnetron
type discharges in nitrogen vs nitrogen pressure during
TiN coatings deposition (red curves)
Note, according to data of electron microscopy it was
not essential difference in microstructure of the samples
produced by different methods. But thickness of
coatings made with the same time of deposition (3
hours) was essentially lower in the regime with supply
of HV pulses: average value was 10.5 m instead of
13.5 m for regime without HV pulses supply. Here,
for the case with HV pulses good agreement is observed
between values of coating thickness determined from
the data of electron microscopy and weight-loss
method. TiN coatings produced without HV pulses have
average thickness 12.1 m, instead of 13.5 m obtained
from the electron microscopy data. So such films have
about 10 % porosity. At the same time for the films
deposited in regime with HV pulses on substrate the
density is about theoretical one because the density
value obtained from optical measurements is equal to
value measured by weight loss method. Note, this
conclusion is unrelated to coatings produced at the
5·10
-3
Torr pressure, when thickness and density of
coatings produced by different methods are practically
equal.
0,15
0,2
0,25
0,3
0,35
0,4
0,45
0,05 0,1 0,15 0,2
S
p
u
tt
e
ri
n
g
c
o
e
ff
ic
ie
n
t,
a
to
m
/i
o
n
Discharge current, A
a
P= 1Е-4 Torr
P= 5Е-4 Torr
P= 1Е-3 Torr
P= 5Е-3 Torr
0,15
0,2
0,25
0,3
0,35
0,4
0,45
0,05 0,1 0,15 0,2
S
p
u
tt
e
ri
n
g
c
o
e
ff
ic
ie
n
t,
a
t/
io
n
Discharge current, A
b
P=1E-4 Torr
P=5E-4 Torr
P=1E-3 Torr
P=5E-3 Torr
Fig. 3. Sputtering yield dependence on the discharge
current value under impact of magnetron type
discharges in nitrogen: (a) coatings were deposited at
the various nitrogen pressure in regime without HV
pulses on substrate;( b) the same, but with HV pulses
supply
2. DISCUSSION
It is obvious from Figs. 2, 3 that low level of erosion
is observed for TiN coatings deposited at low
(~1·10
-4
Torr) pressures and not large values of
discharge currents. The maximal magnitudes of erosion
yield were observed for coatings produced at nitrogen
pressure of 5·10
-3
Torr and high values of discharge
current. Here the difference in erosion rate values
decreases with discharge current value increase for both
methods deposition. It is followed from Fig. 2 that
78 ISSN 1562-6016. ВАНТ. 2014. №6(94)
erosion yield is minimal for samples with maximal
micro-hardness (H). With nitrogen pressure increasing
micro-hardness decreases and nitrogen concentration(C)
in the samples increases. Here the erosion increases.
Specially this effect is expressed at the rather low
sample temperature (low currents). At 64 mA current
(about 500ºC) the difference in erosion rate is about
sesqui-time. In the ~10
-3
Torr nitrogen pressure range
erosion weakly changes as micro-hardness and nitrogen
concentration (C) in the samples weakly depends on the
pressure. Then erosion increases independently on the
character of behavior of micro-hardness and nitrogen
concentration (C). Note, that at the such different
pressures as 10
-4
Torr and 10
-3
Torr concentration of
trapped nitrogen atoms practically is the same, and
erosion yield differs in sesqui-time. So the reason of
erosion decreasing is not nitrogen concentration in TiN
coating, but different structure, crystal grain dimension
and macro-, micro-deformations of the samples
deposited at different nitrogen pressures.
The analysis of TiN coating structure state by the
X-ray diffraction method had shown that the TiN cubic
phase with NaCl type crystal grating determines the
phase state. With nitrogen pressure increase the
transition is observed from random-orientation state to
textured state with the main crystal grain orientation
along the axis [111] ( the specters 1 and 4 in Fig. 4). For
HV pulse regime the width of peaks is less, that says
about more high perfection of texture. The analysis of
substructure characteristics (crystal grain dimension,
micro-deformation), carried out from the change of peak
widths, had shown that crystal grain dimension
increases from 50 to 59 nm and from 35 to 71 nm ,
accordingly, for regimes with HV pulses and without
pulses. Micro-deformation in the grain decreased with
nitrogen pressure increase from 0.45 to 0.29% and from
0.39 to 028%, accordingly, for pulsed and non-pulsed
regimes. Macro-deformation state of tension,
determined by “a-sin
2
ψ”- method [9, 10] increased with
nitrogen pressure increase from -1,3 to -1,9 % in the
case of HV pulsed regime and from -0,9 to -1,85 % in
non-pulsed regime.
By the data of X-ray diffraction method
investigations, with nitrogen pressure increase the
transition is observed from random-orientation state to
textured state with the main crystal grain orientation
along the axis [111]. It could be reason for coating
hardness and density changes. What about micro-
hardness (H) of the samples produced in the work, this
parameter for samples deposited in HV pulse regime is
higher on 30% than for samples made in regime without
HV pulses supply. Possible, it is caused by high density
of such coatings.
Note, that examined TiN coatings produced at low
nitrogen pressure has not only low level of sputtering in
plasmas, but are resisted to thermal cycling. In special
experiments it was shown the resistibility to thermal
cycling for such coatings is not worse than for coatings
deposited at more high pressures. After more than 10
thermal cycles (heating to 1000
0
C and next cooling to
room temperature) it was not found any damages –
micro cracks, shelling, etc.
30 40 50 60 70 80
0
1000
2000
3000
4000
5000
6000
7000
8000
9000
(222)
(311)(220)
(200)
I,
a
.u
.
586 (p=10
-4
)
585 (p= 5*10
-4
)
587 (p=10
-3
)
588 (p=5*10
-3
)
1
23
4
a)
(111)
Degree
30 40 50 60 70 80
0
1000
2000
3000
4000
5000
6000
7000
8000
9000
(222)
(311)(220)
(200)
(111)
4
32 1
I,
a
.
u
.
592 (p=1,2*10
-4
)
591 (p= 5*10
-4
)
590 (p=10
-3
)
589 (p= 5*10
-3
)
б)
Degree
Fig. 4. Diffraction specters of TiN coatings produced in
non-pulsed (a) and HV pulsed regimes (b) in
dependence on nitrogen pressure: 1 – 10
-4
Torr;
2 – 5·10
-4
Torr; 3 – 10
-3
Torr; 4 – 5·10
-3
Torr
CONCLUSIONS
The erosion rate of TiN films deposited at low
nitrogen pressures (~1·10
-4
Torr) essentially (up to 1.5
times) lower, than that for the coatings deposited at
more high pressures (5·10
-3
Torr). Taking into account
the results of X-ray diffraction measurements such
erosion behavior can be caused by different texture and
levels of micro and macro-deformations of TiN coatings
deposited at the different nitrogen pressures. For
samples produced in the regime with supply of HV
pulses the erosion is lower than that for coatings
deposited in the regime without HV pulses on substrate.
It could be caused by more complete texture and high
(up to theoretical one) density of TiN films deposited in
regime with HV pulses. Resistibility to thermal cycling
for examined coatings is not worse than for coatings
deposited at more high pressures. So, from the point of
view of TiN coatings use in plasma devices, the
nitrogen pressure range during coatings deposition in
the “Bulat” type devices could be determined as
~10
-4
Торр.
ISSN 1562-6016. ВАНТ. 2014. №6(94) 79
REFERENCES
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Erosion of vacuum-arc TiN coatings and stainless steel
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Article received 21.10.2014
ВЛИЯНИЕ ДАВЛЕНИЯ АЗОТА ПРИ ОСАЖДЕНИИ ВАКУУМНО-ДУГОВЫХ ПОКРЫТИЙ TiN
НА ИХ ЭРОЗИЙНУЮ СТОЙКОСТЬ В ПЛАЗМЕ РАЗРЯДОВ ТИПА МАГНЕТРОНА
Г.П. Глазунов, А.А. Андреев, О.В. Соболь, М.Н. Бондаренко, А.Л. Конотопский, В.А. Столбовой
Исследован процесс эрозии TiN-покрытий, полученных вакуумно-дуговым распылением титана при
различных давлениях азота (10
-4
…5·10
-3
Торр). Скорости эрозии измерялись методом взвешивания на
аналитических весах до и после плазменной обработки в атмосфере азота при температурах 500…1100ºС.
Обнаружено, что скорость эрозии TiN-покрытий, осажденных при низких давлениях (~1·10
-4
Торр),
существенно (до полутора раз) ниже, чем для покрытий, нанесенных при более высоких давлениях азота
(5·10
-3
Торр). Для образцов, полученных в режиме с подачей импульсов на подложку, эрозия в среднем
несколько ниже, чем у покрытий, осажденных в безимпульсном режиме. С учетом результатов
исследований покрытий методом рентгеновской дифракции предложены и обсуждаются возможные
физические механизмы для объяснения такого характера поведения эрозии.
ВПЛИВ ТИСКУ АЗОТУ ПРИ ОСАДЖЕННІ ВАКУУМНО-ДУГОВИХ ПОКРИТТІВ TiN
НА ЇХ ЕРОЗІЙНУ СТІЙКІСТЬ У ПЛАЗМІ РОЗРЯДІВ МАГНЕТРОННОГО ТИПУ
Г.П. Глазунов, А.А. Андрєєв, О.В. Соболь, М.Н. Бондаренко, А.Л. Конотопський, В.А. Столбовий
Досліджено процес ерозії TiN-покриттів, отриманих вакуумно-дуговим розпилюванням титану при
різному тиску азоту (10
-4
…5·10
-3
Торр). Швидкості ерозії вимірювалися методом зважування на аналітичних
вагах до і після плазмової обробки в атмосфері азоту при температурах 500…1100ºС Виявлено, що
швидкість ерозії TiN-покриттів, осаджених при нижчому тиску (~1·10
-4
Торр), істотно нижче, ніж для
покриттів, нанесених при вищому тиску азоту (5·10
-3
Торр). Для зразків, отриманих у режимі з подачею
імпульсів на підкладку, ерозія в середньому декілька нижча, ніж у покриттів, осаджених у безімпульсному
режимі. З урахуванням результатів досліджень покриттів методом рентгенівської дифракції запропоновані і
обговорюються можливі фізичні механізми для пояснення такого характеру поведінки ерозії.
|
| id | nasplib_isofts_kiev_ua-123456789-81201 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-12-07T18:02:37Z |
| publishDate | 2014 |
| publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| record_format | dspace |
| spelling | Glazunov, G.P. Andreev, A.A. Sobol, O.V. Bondarenko, M.N. Konotopskiy, A.L. Stolbovoy, V.A. 2015-05-13T15:37:29Z 2015-05-13T15:37:29Z 2014 The effect of nitrogen pressure during vacuum-arc TiN coatings deposition on the erosoin resistance in plasma of magnetron type discharges / G.P. Glazunov, A.A. Andreev, O.V. Sobol’, M.N. Bondarenko, A.L. Konotopskiy, V.A. Stolbovoy // Вопросы атомной науки и техники. — 2014. — № 6. — С. 76-79. — Бібліогр.: 10 назв. — англ. 1562-6016 PACS: 52.40.Hf https://nasplib.isofts.kiev.ua/handle/123456789/81201 The erosion process was investigated of TiN coatings which were made with the vacuum-arc sputtering of Ti at the different nitrogen pressures (10⁻⁴…5•10⁻³ Torr). The erosion rates were measured by the weighting on analytical balance before and after treatment by plasmas of magnetron type, axial symmetrical discharges in nitrogen atmosphere, at the temperatures of 500…1100ºС. It was shown that an erosion rate of TiN coatings deposited at low pressures (~10⁻⁴ Torr) is essentially (up to 1.5 times) lower than that for coatings produced at the more high pressures (5•10⁻³ Torr). For samples produced in the regime with high voltage pulses supply on substrate the erosion is lower than for coatings deposited in the regime without pulses supply. Taking into account the results of X-ray diffraction measurements, the physical mechanisms are suggested to explain such character of erosion behavior. Исследован процесс эрозии TiN-покрытий, полученных вакуумно-дуговым распылением титана при различных давлениях азота (10⁻⁴…5•10⁻³ Торр). Скорости эрозии измерялись методом взвешивания на аналитических весах до и после плазменной обработки в атмосфере азота при температурах 500…1100ºС. Обнаружено, что скорость эрозии TiN-покрытий, осажденных при низких давлениях (~1•10⁻⁴ Торр), существенно (до полутора раз) ниже, чем для покрытий, нанесенных при более высоких давлениях азота (5•10⁻³ Торр). Для образцов, полученных в режиме с подачей импульсов на подложку, эрозия в среднем несколько ниже, чем у покрытий, осажденных в безимпульсном режиме. С учетом результатов исследований покрытий методом рентгеновской дифракции предложены и обсуждаются возможные физические механизмы для объяснения такого характера поведения эрозии. Досліджено процес ерозії TiN-покриттів, отриманих вакуумно-дуговим розпилюванням титану при різному тиску азоту (10⁻⁴…5•10⁻³ Торр). Швидкості ерозії вимірювалися методом зважування на аналітичних вагах до і після плазмової обробки в атмосфері азоту при температурах 500…1100ºС Виявлено, що швидкість ерозії TiN-покриттів, осаджених при нижчому тиску (~1•10⁻⁴ Торр), істотно нижче, ніж для покриттів, нанесених при вищому тиску азоту (5•10⁻³ Торр). Для зразків, отриманих у режимі з подачею імпульсів на підкладку, ерозія в середньому декілька нижча, ніж у покриттів, осаджених у безімпульсному режимі. З урахуванням результатів досліджень покриттів методом рентгенівської дифракції запропоновані і обговорюються можливі фізичні механізми для пояснення такого характеру поведінки ерозії. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Динамика плазмы и взаимодействие плазма-стенка The effect of nitrogen pressure during vacuum-arc TiN coatings deposition on the erosoin resistance in plasma of magnetron type discharges Влияние давления азота при осаждении вакуумно-дуговых покрытий TiN на их эрозийную стойкость в плазме разрядов типа магнетрона Вплив тиску азоту при осадженні вакуумно-дугових покриттів TiN на їх ерозійну стійкість у плазмі розрядів магнетронного типу Article published earlier |
| spellingShingle | The effect of nitrogen pressure during vacuum-arc TiN coatings deposition on the erosoin resistance in plasma of magnetron type discharges Glazunov, G.P. Andreev, A.A. Sobol, O.V. Bondarenko, M.N. Konotopskiy, A.L. Stolbovoy, V.A. Динамика плазмы и взаимодействие плазма-стенка |
| title | The effect of nitrogen pressure during vacuum-arc TiN coatings deposition on the erosoin resistance in plasma of magnetron type discharges |
| title_alt | Влияние давления азота при осаждении вакуумно-дуговых покрытий TiN на их эрозийную стойкость в плазме разрядов типа магнетрона Вплив тиску азоту при осадженні вакуумно-дугових покриттів TiN на їх ерозійну стійкість у плазмі розрядів магнетронного типу |
| title_full | The effect of nitrogen pressure during vacuum-arc TiN coatings deposition on the erosoin resistance in plasma of magnetron type discharges |
| title_fullStr | The effect of nitrogen pressure during vacuum-arc TiN coatings deposition on the erosoin resistance in plasma of magnetron type discharges |
| title_full_unstemmed | The effect of nitrogen pressure during vacuum-arc TiN coatings deposition on the erosoin resistance in plasma of magnetron type discharges |
| title_short | The effect of nitrogen pressure during vacuum-arc TiN coatings deposition on the erosoin resistance in plasma of magnetron type discharges |
| title_sort | effect of nitrogen pressure during vacuum-arc tin coatings deposition on the erosoin resistance in plasma of magnetron type discharges |
| topic | Динамика плазмы и взаимодействие плазма-стенка |
| topic_facet | Динамика плазмы и взаимодействие плазма-стенка |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/81201 |
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