The silica and silicon luminescence induced by fast hydrogen ions

The results of silica and silicon luminescence induced by hydrogen ions bombardment with energy 0.2 ÷ 0,45 MeV and 0.8 ÷ 2.4 MeV were presented in this paper. It was obtained that the ionluminescence spectra of SiO₂ were changed under hydrogen ions bombardment essentially. The relation between light...

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Veröffentlicht in:Вопросы атомной науки и техники
Datum:2000
Hauptverfasser: Kalantaryan, O.V., Kononenko, S.I., Muratov, V.I.
Format: Artikel
Sprache:English
Veröffentlicht: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2000
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Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/81676
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Zitieren:The silica and silicon luminescence induced by fast hydrogen ions / O.V. Kalantaryan, S.I. Kononenko, V.I. Muratov // Вопросы атомной науки и техники. — 2000. — № 1. — С. 189-192. — Бібліогр.: 22 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-81676
record_format dspace
spelling Kalantaryan, O.V.
Kononenko, S.I.
Muratov, V.I.
2015-05-19T08:46:51Z
2015-05-19T08:46:51Z
2000
The silica and silicon luminescence induced by fast hydrogen ions / O.V. Kalantaryan, S.I. Kononenko, V.I. Muratov // Вопросы атомной науки и техники. — 2000. — № 1. — С. 189-192. — Бібліогр.: 22 назв. — англ.
1562-6016
https://nasplib.isofts.kiev.ua/handle/123456789/81676
533.9
The results of silica and silicon luminescence induced by hydrogen ions bombardment with energy 0.2 ÷ 0,45 MeV and 0.8 ÷ 2.4 MeV were presented in this paper. It was obtained that the ionluminescence spectra of SiO₂ were changed under hydrogen ions bombardment essentially. The relation between light intensity and implantation dose was determined. The silicon spectra were measured in the near ultraviolet and visible regions of wavelength. The spectra consist of three wide bands. The band with maximum at 326 - 328 nm was not observed earlier. The mechanisms of generation of these bands are discussed. The possibilities to discover oxide layer formed by the natural way on a silicon surface are shown. The novel method for control of proton dose in quartz was proposed.
The autors are grateful to the Member of National Academy of Science of Ukraine V.Storighko for help.
en
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
Вопросы атомной науки и техники
Нерелятивистская плазменная элeктрoника
The silica and silicon luminescence induced by fast hydrogen ions
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title The silica and silicon luminescence induced by fast hydrogen ions
spellingShingle The silica and silicon luminescence induced by fast hydrogen ions
Kalantaryan, O.V.
Kononenko, S.I.
Muratov, V.I.
Нерелятивистская плазменная элeктрoника
title_short The silica and silicon luminescence induced by fast hydrogen ions
title_full The silica and silicon luminescence induced by fast hydrogen ions
title_fullStr The silica and silicon luminescence induced by fast hydrogen ions
title_full_unstemmed The silica and silicon luminescence induced by fast hydrogen ions
title_sort silica and silicon luminescence induced by fast hydrogen ions
author Kalantaryan, O.V.
Kononenko, S.I.
Muratov, V.I.
author_facet Kalantaryan, O.V.
Kononenko, S.I.
Muratov, V.I.
topic Нерелятивистская плазменная элeктрoника
topic_facet Нерелятивистская плазменная элeктрoника
publishDate 2000
language English
container_title Вопросы атомной науки и техники
publisher Національний науковий центр «Харківський фізико-технічний інститут» НАН України
format Article
description The results of silica and silicon luminescence induced by hydrogen ions bombardment with energy 0.2 ÷ 0,45 MeV and 0.8 ÷ 2.4 MeV were presented in this paper. It was obtained that the ionluminescence spectra of SiO₂ were changed under hydrogen ions bombardment essentially. The relation between light intensity and implantation dose was determined. The silicon spectra were measured in the near ultraviolet and visible regions of wavelength. The spectra consist of three wide bands. The band with maximum at 326 - 328 nm was not observed earlier. The mechanisms of generation of these bands are discussed. The possibilities to discover oxide layer formed by the natural way on a silicon surface are shown. The novel method for control of proton dose in quartz was proposed.
issn 1562-6016
url https://nasplib.isofts.kiev.ua/handle/123456789/81676
citation_txt The silica and silicon luminescence induced by fast hydrogen ions / O.V. Kalantaryan, S.I. Kononenko, V.I. Muratov // Вопросы атомной науки и техники. — 2000. — № 1. — С. 189-192. — Бібліогр.: 22 назв. — англ.
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AT kalantaryanov silicaandsiliconluminescenceinducedbyfasthydrogenions
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first_indexed 2025-11-30T14:34:30Z
last_indexed 2025-11-30T14:34:30Z
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