Features of electron beam evaporation under surface electron beam formation
In this paper, the features of the dense plasma generation under the thermal substance evaporation by an electron beam, formed directly at the crucible surface, have been investigated. Peculiarities of the research are the following: the initial plasma is used as the electron emitter and the electro...
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| Опубліковано в: : | Вопросы атомной науки и техники |
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| Дата: | 2014 |
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2014
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Features of electron beam evaporation under surface electron beam formation / I.N. Mysiura, I.A. Girka, N.A. Azarenkov, Ie.V. Borgun, Ya.O. Hrechko, A.V. Hryhorenko, V.D. Dimitrova, D.L. Ryabchikov, I.N. Sereda, A.F. Tseluyko // Вопросы атомной науки и техники. — 2014. — № 6. — С. 149-152. — Бібліогр.: 3 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1859803175951794176 |
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| author | Mysiura, I.N. Girka, I.A. Azarenkov, N.A. Borgun, Ie.V. Hrechko, Ya.O. Hryhorenko, A.V. Dimitrova, V.D. Ryabchikov, D.L. Sereda, I.N. Tseluyko, A.F. |
| author_facet | Mysiura, I.N. Girka, I.A. Azarenkov, N.A. Borgun, Ie.V. Hrechko, Ya.O. Hryhorenko, A.V. Dimitrova, V.D. Ryabchikov, D.L. Sereda, I.N. Tseluyko, A.F. |
| citation_txt | Features of electron beam evaporation under surface electron beam formation / I.N. Mysiura, I.A. Girka, N.A. Azarenkov, Ie.V. Borgun, Ya.O. Hrechko, A.V. Hryhorenko, V.D. Dimitrova, D.L. Ryabchikov, I.N. Sereda, A.F. Tseluyko // Вопросы атомной науки и техники. — 2014. — № 6. — С. 149-152. — Бібліогр.: 3 назв. — англ. |
| collection | DSpace DC |
| container_title | Вопросы атомной науки и техники |
| description | In this paper, the features of the dense plasma generation under the thermal substance evaporation by an electron beam, formed directly at the crucible surface, have been investigated. Peculiarities of the research are the following: the initial plasma is used as the electron emitter and the electron acceleration occurs in the layer between the initial and thermionic plasma. It has been shown that in the case of the thermionic plasma formation, the crucible current can be several times higher than the discharge current of the primary plasma source due to the redistribution of voltge drop (100…200 V) from the crucible to the wall.
Исследуются особенности генерации плотной плазмы при термическом испарении вещества электронным пучком, который формируется непосредственно у поверхности тигля. Особенность исследований состоит в том, что эмиттером электронов пучка служит первичная плазма, а ускорение происходит в слое объемного заряда между первичной и термоионной плазмой. Показано, что ток на тигель при образовании термоионной плазмы может в несколько раз превышать разрядный ток источника первичной плазмы, что связано с перераспределением части напряжения (100…200 В) между тиглем и стенкой.
Досліджуються особливості генерації щільної плазми при термічному випаровуванні речовини електронним пучком, який формується безпосередньо біля поверхні тигля. Особливість досліджень полягає в тому, що емітером електронів пучка є первинна плазма, а прискорення відбувається в шарі об'ємного заряду між первинною та термоіонною плазмою. Показано, що струм на тигель при утворенні термоіонної плазми може в декілька разів перевищувати розрядний струм джерела первинної плазми, що пов'язано з перерозподілом частини напруги (100…200 В) між тиглем та стінкою.
|
| first_indexed | 2025-12-07T15:14:25Z |
| format | Article |
| fulltext |
ISSN 1562-6016. ВАНТ. 2014. №6(94)
PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY. 2014, №6. Series: Plasma Physics (20), p. 149-152. 149
FEATURES OF ELECTRON BEAM EVAPORATION UNDER
SURFACE ELECTRON BEAM FORMATION
I.N. Mysiura
1
, I.A. Girka
1
, N.A. Azarenkov
1
, Ie.V. Borgun
1
, Ya.O. Hrechko
1
,
A.V. Hryhorenko
1
, V.D. Dimitrova
2
, D.L. Ryabchikov
1
, I.N. Sereda
1
, A.F. Tseluyko
1
1
V.N. Karazin Kharkiv National University, Kharkiv, Ukraine;
2
St. Clement Ohridski Sofia University, Bulgaria
E-mail: ievgeniia.borgun@mail.ru
In this paper, the features of the dense plasma generation under the thermal substance evaporation by an electron
beam, formed directly at the crucible surface, have been investigated. Peculiarities of the research are the following:
the initial plasma is used as the electron emitter and the electron acceleration occurs in the layer between the initial
and thermionic plasma. It has been shown that in the case of the thermionic plasma formation, the crucible current
can be several times higher than the discharge current of the primary plasma source due to the redistribution of
voltge drop (100…200 V) from the crucible to the wall.
PACS: 52.59.Bi, 52.59.Fn
INTRODUCTION
The electron-beam evaporation is widely used in
various forms of vacuum-plasma processes [1]. In the
classic version the electron beam generated by the elec-
tron gun is delivered to the evaporated material by elec-
tromagnetic lenses. Such high-power systems require
the high voltage (~ 20 kV) due to the peculiarities of the
beam transportation [2]. Because of the risk of electrical
breakdown the high voltage often becomes the barrier
for widespread use of this method. The high current (to
provide the necessary capacity) electron source should
be located directly at the vaporized substance. However,
due to the penetration of the vaporized material steam
into the gun the ionization in the accelerating gap in-
creases and insulators are intensively covered by the
conductive material that can lead to the breakdown of
the gun. This makes it impossible to realize an electron-
beam evaporation using classical techniques. However,
the classical electron gun can be replaced by the plasma
type source. Then the electrons are emitted by initial
plasma, and the electron acceleration occurs in the
space-charge layer near the vaporized material surface
[3]. The advantage of this approach as compared with
conventional electron beam evaporation is that the sam-
ple is heated uniformly on all sides. And the system
appears to be insensitive to the pressure rising during
the material evaporation since the voltage is less than
1 kV. If the electron beam power in the surface layer is
high enough then the intense ionization of the material
vapor and the dense thermionic plasma generation occur
that can lead to appearance of high-energy ions. For the
practical application of this technology it is important to
know the ways of regulating the energy and power of
the electron beam, as well as the parameters of thermi-
onic plasma, which is the purpose of the present work.
1. EXPERIMENTAL SETUP
Experiments on the production and study of intense
thermionic flows were carried out using the plasma
source based on a discharge with a filament cathode
(Fig. 1). Such a method of producing the plasma pro-
vides at low pressures (~ 10
-4
Torr) rather dense
(~ 10
11
cm
-3
) plasma at relatively low energy consump-
tion. Coiled tungsten cathode of direct heating (2) with
the diameter of 2 cm was placed in a water-cooled end
of the discharge tube (1) made of stainless steel with the
diameter of 4 cm and length of 27 cm. The discharge
tube served as the anode and was grounded, and the
negative voltage (Vcat = 0…300 V) was applied to the
filament cathode. In the source volume the longitudinal
magnetic field with the bell-shaped distribution was
induced with the field strength maximum up to 600 Oe.
The magnitude and configuration of the magnetic field
were selected in the way to generate divergent flow of
the primordial plasma in the vacuum chamber. The
thermionic plasma (4) was formed around the tungsten
crucible (3) from the evaporating substance. The sub-
stance and the substrate holder for the processed objects
were located in the vacuum chamber. The voltage + Vt
positive relative to the grounded chamber was applied
on the crucible with the help of additional power supply.
The crucible with the substance played the role of the
second anode with the voltage that was for hundreds of
Volts higher than that of the discharge tube of the plas-
ma source (first anode). In comparative experiments
thermionic plasma was simulated by spherical electrode
of 5 cm in diameter to match the characteristic dimen-
sions of thermionic plasma. This electrode was placed
instead of the crucible. To investigate the dynamics of
the floating voltage of the plasma a flat probe (7) with
the working surface of 1 cm
2
was used. The probe was
set in the chamber out of the plasma source column. To
prevent the deposition of the insulator the probe side
was protected by the screen. Usually, for the primary
plasma formation the argon was used, that was injected
into the area of the filament cathode. The typical operating
pressure in the vacuum chamber was (1…5)·10
-4
Torr.
2. RESULTS AND DISCUSSIONS
Considering the processes of the dense thermionic
plasma generation and formation of the intense electron
and ion beams, the specific features of this system
should be taken into account. It is the generation of the
additional ion beam during processing of dielectric
150 ISSN 1562-6016. ВАНТ. 2014. №6(94)
materials. Surface of a dielectric object placed in the pri
mary plasma column is charged negatively in relation to
the plasma voltaage φwall by the initial electron beam
that comes out of the plasma source together with the
plasma (see Fig. 1). Negative surface charge begins to
attract the plasma ions which produce an additional ion
beam to the surface. In the surface layer the ions are
accelerated to the energy Wi = qi·wall. Magnitude of the
voltage wall is determined by the balance of the current
densities of the initial electron beam jbe0 and plasma
ions jpi. For large jbe0 and small jpi the voltage wall is of
the same order of magnitude as the voltage of the plas-
ma source. With increasing of jpi the ions effectively
discharge the surface, and the voltage wall decreases to
the value – 25 V.
Obviously, the surface is not charged during the pro-
cessing the grounded conductive object, and the ion
beam is absent further. However, if the sample holder is
electrically isolated, the negative charge that was
brought by an electron beam does not drain, so the sur-
face of the object becomes charged to a voltage negative
in relation to the plasma. The additional ion beam takes
place in this case as well. In the first case the electrons
pass the gap once, and in the second case they oscillate
between the filament cathode and the object. Therefore,
in the first case usually there is the arc discharge with
filament cathode, while in the second case the reflective
discharge is more efficient. In the case of the reflective
discharge at the pressure of 3·10
-4
Torr in the vacuum
chamber, the plasma source produces the divergent ini-
tial plasma flow with a current density of
(1…3)·10
11
cm
-3
and the electron temperature of
Te ≈ 2 eV near the input hole.
The mode of plasma gun was realized when the cru-
cible with an evaporated substance was connected to the
voltage positive in relation to the grounded chamber. In
this case, the space charge layer with the potential drop
φt1 was formed at the crucible surface. In this layer the
primary plasma electrons were accelerated and the elec-
tron flow was formed. This flow heated the crucible.
(The qualitative picture of the voltage distribution in the
case of galvanically isolated object is shown in Fig. 1.)
With crucible heating the evaporated substance atom
flux appeared. A part of this flux was ionized due to the
electron impact. The bipolar current appeared when
these ions have been accelerated by the electric field of
the layer.
Thermionic plasma was formed between the layer of
the space charges and the crucible surface, as soon as
the rate of ion generation at the surface has reached such
a value that the number of produced particles exceeded
the number of particles which have leaved through the
layer. At the front of the thermionic plasma the original
layer of the negative space charge φt1 was converted to
the double electric layer (DL) φt2. Due to the gas-kinetic
pressure the thermionic plasma expanded. DL moved
away from the crucible, and this was accompanied by
increase of the current through the layer due to the in-
crease of its surface. Such expansion took place until the
violations of existence conditions of DL. With the dis-
appearance of the electron beam the layer disappeared.
This leaded to stop of the crucible heating and the ther-
mionic plasma forming. After the collapse of the dense
thermoionic plasma near the crucible the layer of charge
with a voltage drop φt1 was formed again and the whole
process repeated.
Initially it was assumed that the necessary condition
for the existence of the layer near the crucible surface
was that the current on the crucible had to be less than
current of plasma source. When this condition breaks
down the layer should disappear. However, it was ob-
served in experiments, that the current on the crucible
during the formation of thermionic plasma can be sever-
al times (3-6 times) greater than the discharge current of
the plasma source. And this was quite unexpected, since
at the initial analysis it seemed that an imbalance of
currents took place: electron current removed from the
plasma to crucible was by several times larger than the
electron current delivered to the plasma by the filament
cathode. This is clearly noticeable from given
oscillograms of the system parameters (see Fig. 2). One
can see that at the discharge current of the plasma
source (the filament cathode current) of Id = 1 A
(Ud = 100 V) the maximum crucible current It has
reached 4 A. (The voltage on the crucible was of
Vt = 224 V.)
Study of the dynamics of the voltage distribution in
the vacuum chamber made it possible to resolve this
paradox. It has been found that when It > Id was applied
to the crucible then the voltage Vt was split between the
Fig. 1. The scheme of thermo-ionic plasma creation.
1 – discharge tube; 2 – filament cathode; 3 – crucible with metal; 4 – thermionic plasma; 5 – potential distribution by
the crucible; 6 – vacuum chamber; 7 – flat probe
wall
(z)
Vcat
2
5
3
1
t1
t2
z
+Vt
3
4
7
6
ISSN 1562-6016. ВАНТ. 2014. №6(94) 151
layer near the crucible φt2 and layer near the chamber
wall φbulk (see Fig. 2). If the current on the crucible was
less than the current of the plasma source, then all posi-
tive voltage applied to the crucible was concentrated in
the layer near the crucible, and the voltage φbulk had a
small negative value of the order of ~Te / e. When the
current on the crucible reached the value of Id, then
plasma voltage was equal to the wall potential. When It
exceeded Id at the wall then positive voltage drop has
appeared, and it increased with the growth of It. Thus,
the excess current of the crucible Ied = It - Id was caused
by the ion current to the chamber wall. And that ion
current was several times higher than current of the
plasma source.
Value of this ion current was mainly determined by
the efficiency of ion generation by plasma source. With
the high generation efficiency (when one electron on
average produces several ions) the positive potential
drop near the wall φbulk was relatively small and almost
all the voltage applied to the crucible was concentrated
in a layer near the crucible. Thus, in the case shown see
in Fig. 2 when It = 3 A (It / Id = 3) the potential drop
near the wall φbulk was about of ~ 25 V, which was 25 %
of the applied voltage. But when It = 4 A (It / Id = 4) the
voltage drop near the wall increased to 120 V that was
54 % of the applied voltage. This indicated that to en-
sure the crucible excess current there were not enough
ions generated by the plasma source. In that case the
system had to be reconstructed to compensate the ab-
sence of ions due to excitation of additional discharge
(non-self-glow discharge) between the chamber wall
and the crucible. The chamber wall began to play the
role of the cathode with the cathode voltage drop suffi-
cient to increase the ion generation. In other words, to
maintain the excess current in the absence of ions the
system transmitted part of the input energy for heating
the crucible to increase the ion generation.
White dots in Fig. 3 demonstrate the dependence of
φbulk / Vt on It / Id. It is seen that this dependence is al-
most linear one. When It / Id< 1 then the voltage φbulk
takes negative values. This is explained by the greater
electron mobility as compared to that of ions. The DL in
this case was not formed. At the point of It / Id = 1 the
classical conditions of charged particle transport violate
and the DL appears on the front of thermionic plasma.
The additional source of ion generation occurs with the
appearance of thermionic plasma. Thus, there are three
typical methods for ions generating in respect of It / Id
value. When It / Id < 1 then ions are generated by the
plasma source. When It / Id > 1 then ions generation is
caused by formation of thermionic plasma. These ions
are accelerated from the crucible to the chamber wall by
DL. When It / Id >> 1 then the third mechanism switches
on, that is the ions are generated throughout the cham-
ber by means of the non-self glow discharge.
With the purpose to clearly highlight the third mech-
anism of ion generation the comparative experiments
were carried out in which the second generation mecha-
nism was excluded (thermionic plasma was absent). To
provide this, spherical electrode was placed instead of
the crucible. The voltage positive in relation to the
grounded chamber was applied to the electrode as in the
previous case. The shape and size of the electrode corre-
sponded to the shape and size of thermionic plasma,
which were determined using photography. The other
parameters corresponded to the parameters of the origi-
nal experiment.
Oscillograms of the system parameters in the com-
parative experiment are shown in Fig. 4. Main differ-
ence is in significantly higher near-wall potential drop
-0.005 0.000 0.005
0
50
100
150
200
250
t1
bulk
V
cyl
I
cyl
I
d
0
1
3
4
2
I, AU, V
t, sec
5
Fig. 4. Oscillograms of the voltage Vcyl and cur-
rent Icyl of cylinder, the plasma voltage φbulk, the
voltage drop in the cylinder φt1 and current of
plasma source Id
-0.005 0.000 0.005
0
50
100
150
200
250
t, sec
5
0
t2
bulk
V
t
I
d
2
1
3
U, V I, A
4
I
t
Fig. 2. Oscillograms of the voltage Vt and
current It of the crucible, the plasma voltage
φbulk, the voltage drop in of the crucible φt2 and
the current of plasma source Id
0 1 2 3 4
0.0
0.5
1.0
thermoionic
plasma
b
u
lk
/V
t
I
t
/I
d
cylindr
Fig. 3. The dynamics of redistribution of the voltage
between the layers near the crucible φt and the wall
φbulk depending on the ratio of current to the
crucible to the discharge current It / Id
152 ISSN 1562-6016. ВАНТ. 2014. №6(94)
φbulk. In this case, the voltage drop in the layer near the
surface of the spherical electrode is in the form of a me-
ander with amplitude ~ 45 V. Relative change φbulk / Vt
versus the ratio It / Id is shown see in Fig. 3 by the black
dots. One can see that in the absence of thermionic
plasma (the second mechanism of ion generation) sys-
tem is forced to over-react due the lack of ions by exci-
tation of the non-self glow discharge at an earlier stage.
The probe (7 in see Fig. 1) was installed to determine in
what proportions the voltage is split between the layers
in the vacuum chamber. The signals from the probe with
the current and voltage at the crucible and the discharge
current source of initial plasma were transmitted to 4-th
ray oscilloscope. The typical fragments of oscillograms
obtained in this manner are shown see in Fig. 2. The
bell-shape oscillograms are stipulated by absence of the
filter capacitor in the power supply of the crucible.
Power supply gave out pulsating direct voltage with no
smoothing. This was done deliberately in the event of
breakdown to eliminate the appearance of high pulse
currents due to the filter capacitor discharging.
In comparative experiments (see Fig. 4) exact match
of the current and voltage on the cylinder and crucible
could not be reached because of the size mismatch of
thermionic plasma and modeling electrode. Therefore
the close in value of Vcyl and Icyl were taken. Curves
φbulk were taken from the probe, and corresponded to the
plasma voltage in the chamber. Assuming that the volt-
age applied to the crucible Vt is redistributed only be-
tween DL on the front of the anode plasma φt2 and the
grounded chamber wall, the DL voltage was defined as
φt2 = Vt - φbulk. Thus, the curve φt2 see in Fig. 2 is the
result of subtracting the space voltage from that applied
to the crucible (or cylinder). Similar arguments were
used to obtain the curve φt1 see in Fig. 4.
Thus, the magnitude of the wall voltage was main-
tained in a way to provide the generation of a sufficient
number of charged particles for the formation of the
electron current on the crucible.
CONCLUSIONS
Thus, due to self-consistency of the system, the for-
mation of the electron beam and the generation of ther-
mionic plasma strongly affect on each other. As soon as
the current in the crucible exceeds the current of initial
plasma source the potential drop near the surface of the
chamber, that can reach half of the voltage applied to
the crucible, appears. This is due to the necessity to
cause an additional generation of charged particles in
the chamber. The wall of the vacuum chamber begins to
play the role of cathode of non-self glow discharge. The
anode is the crucible. This allows using of relatively low
power initial plasma source (Id = 1…3 A, Vd = 50 V) to
form the electron beam on the crucible with the current
of 4…12 A and energy up to 400 eV. On the other hand,
the formation of the voltage drop at the wall leads to
transition of the part of power to the chamber wall. En-
ergy of the electron beam in this case becomes less than
voltage applied to the crucible, which should be consid-
ered during the technological processes.
REFERENCES
1. D.V. Zinov’ev, A.F. Tseluyko, N.N. Yunakov. Ther-
mo-ionic layer deposition in reflective arc discharge //
Journal of Kharkiv National University. Physical Series
“Nuclei, particles, fields”. 1998, № 421, p. 56-61.
2. D.V. Zinov’ev, A.F. Tseluyko, N.N. Yunakov. Dou-
ble layer stabilization on the edge of gas-discharge and
thermo-ionic plasma // Air-space Technique and Tech-
nology (57). 2008, № 10, p. 20-27.
3. I.V. Borgun, D.V. Zinov’ev, D.L. Ryabchikov,
A.F. Tseluyko, I.N. Sereda. Dynamical accelerating
structures of thermoionic plasma // Problems of Atomic
Sci. and Tech. Series “Plasma Electronics and New
Acceleration Methods” (86). 2013, № 4, p. 61-63.
Article received 24.10.2014
ОСОБЕННОСТИ ЭЛЕКТРОННО-ЛУЧЕВОГО ИСПАРЕНИЯ В УСЛОВИЯХ
ПРИПОВЕРХНОСТНОГО ФОРМИРОВАНИЯ ЭЛЕКТРОННОГО ПУЧКА
И.Н. Мисюра, И.А. Гирка, Н.А. Азаренков, Е.В. Боргун, Я.О. Гречко, А.В. Григоренко, В.Д. Димитрова,
Д.Л. Рябчиков, И.Н. Середа, А.Ф. Целуйко
Исследуются особенности генерации плотной плазмы при термическом испарении вещества электрон-
ным пучком, который формируется непосредственно у поверхности тигля. Особенность исследований со-
стоит в том, что эмиттером электронов пучка служит первичная плазма, а ускорение происходит в слое объ-
емного заряда между первичной и термоионной плазмой. Показано, что ток на тигель при образовании тер-
моионной плазмы может в несколько раз превышать разрядный ток источника первичной плазмы, что свя-
зано с перераспределением части напряжения (100…200 В) между тиглем и стенкой.
ОСОБЛИВОСТІ ЕЛЕКТРОННО-ПРОМЕНЕВОГО ВИПАРОВУВАННЯ ЗА УМОВ
ПРИПОВЕРХНЕВОГО ФОРМУВАННЯ ЕЛЕКТРОННОГО ПУЧКА
І.М. Місюра, І.О. Гірка, М.О. Азарєнков, Є.В. Боргун, Я.О. Гречко, О.В. Григоренко, В.Д. Дімитрова,
Д.Л. Рябчиков, І.М. Середа, О.Ф. Целуйко
Досліджуються особливості генерації щільної плазми при термічному випаровуванні речовини електрон-
ним пучком, який формується безпосередньо біля поверхні тигля. Особливість досліджень полягає в тому,
що емітером електронів пучка є первинна плазма, а прискорення відбувається в шарі об'ємного заряду між
первинною та термоіонною плазмою. Показано, що струм на тигель при утворенні термоіонної плазми може
в декілька разів перевищувати розрядний струм джерела первинної плазми, що пов'язано з перерозподілом
частини напруги (100…200 В) між тиглем та стінкою.
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| id | nasplib_isofts_kiev_ua-123456789-81949 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-12-07T15:14:25Z |
| publishDate | 2014 |
| publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| record_format | dspace |
| spelling | Mysiura, I.N. Girka, I.A. Azarenkov, N.A. Borgun, Ie.V. Hrechko, Ya.O. Hryhorenko, A.V. Dimitrova, V.D. Ryabchikov, D.L. Sereda, I.N. Tseluyko, A.F. 2015-05-22T18:09:40Z 2015-05-22T18:09:40Z 2014 Features of electron beam evaporation under surface electron beam formation / I.N. Mysiura, I.A. Girka, N.A. Azarenkov, Ie.V. Borgun, Ya.O. Hrechko, A.V. Hryhorenko, V.D. Dimitrova, D.L. Ryabchikov, I.N. Sereda, A.F. Tseluyko // Вопросы атомной науки и техники. — 2014. — № 6. — С. 149-152. — Бібліогр.: 3 назв. — англ. 1562-6016 PACS: 52.59.Bi, 52.59.Fn https://nasplib.isofts.kiev.ua/handle/123456789/81949 In this paper, the features of the dense plasma generation under the thermal substance evaporation by an electron beam, formed directly at the crucible surface, have been investigated. Peculiarities of the research are the following: the initial plasma is used as the electron emitter and the electron acceleration occurs in the layer between the initial and thermionic plasma. It has been shown that in the case of the thermionic plasma formation, the crucible current can be several times higher than the discharge current of the primary plasma source due to the redistribution of voltge drop (100…200 V) from the crucible to the wall. Исследуются особенности генерации плотной плазмы при термическом испарении вещества электронным пучком, который формируется непосредственно у поверхности тигля. Особенность исследований состоит в том, что эмиттером электронов пучка служит первичная плазма, а ускорение происходит в слое объемного заряда между первичной и термоионной плазмой. Показано, что ток на тигель при образовании термоионной плазмы может в несколько раз превышать разрядный ток источника первичной плазмы, что связано с перераспределением части напряжения (100…200 В) между тиглем и стенкой. Досліджуються особливості генерації щільної плазми при термічному випаровуванні речовини електронним пучком, який формується безпосередньо біля поверхні тигля. Особливість досліджень полягає в тому, що емітером електронів пучка є первинна плазма, а прискорення відбувається в шарі об'ємного заряду між первинною та термоіонною плазмою. Показано, що струм на тигель при утворенні термоіонної плазми може в декілька разів перевищувати розрядний струм джерела первинної плазми, що пов'язано з перерозподілом частини напруги (100…200 В) між тиглем та стінкою. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Низкотемпературная плазма и плазменные технологии Features of electron beam evaporation under surface electron beam formation Особенности электронно-лучевого испарения в условиях приповерхностного формирования электронного пучка Особливості електронно-променевого випаровування за умов приповерхневого формування електронного пучка Article published earlier |
| spellingShingle | Features of electron beam evaporation under surface electron beam formation Mysiura, I.N. Girka, I.A. Azarenkov, N.A. Borgun, Ie.V. Hrechko, Ya.O. Hryhorenko, A.V. Dimitrova, V.D. Ryabchikov, D.L. Sereda, I.N. Tseluyko, A.F. Низкотемпературная плазма и плазменные технологии |
| title | Features of electron beam evaporation under surface electron beam formation |
| title_alt | Особенности электронно-лучевого испарения в условиях приповерхностного формирования электронного пучка Особливості електронно-променевого випаровування за умов приповерхневого формування електронного пучка |
| title_full | Features of electron beam evaporation under surface electron beam formation |
| title_fullStr | Features of electron beam evaporation under surface electron beam formation |
| title_full_unstemmed | Features of electron beam evaporation under surface electron beam formation |
| title_short | Features of electron beam evaporation under surface electron beam formation |
| title_sort | features of electron beam evaporation under surface electron beam formation |
| topic | Низкотемпературная плазма и плазменные технологии |
| topic_facet | Низкотемпературная плазма и плазменные технологии |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/81949 |
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