Increasing of mass transfer efficiency at magnetron deposition of metal coating
The results of technological tests of longitudinal planar magnetron sputtering system (MSS) with a magnetically isolated anode working in pulse-modes with additional pulse heavy-current high-voltage supply source are presented. It is shown that efficiency of mass transfer in the pulse mode overcoati...
Збережено в:
| Опубліковано в: : | Вопросы атомной науки и техники |
|---|---|
| Дата: | 2015 |
| Автори: | , , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2015
|
| Теми: | |
| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/82146 |
| Теги: |
Додати тег
Немає тегів, Будьте першим, хто поставить тег для цього запису!
|
| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Increasing of mass transfer efficiency at magnetron deposition of metal coating / A.G. Chunadra, K.N. Sereda, I.K. Tarasov, A.A. Bizyukov // Вопросы атомной науки и техники. — 2015. — № 1. — С. 181-183. — Бібліогр.: 4 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1859993314798862336 |
|---|---|
| author | Chunadra, A.G. Sereda, K.N. Tarasov, I.K. Bizyukov, A.A. |
| author_facet | Chunadra, A.G. Sereda, K.N. Tarasov, I.K. Bizyukov, A.A. |
| citation_txt | Increasing of mass transfer efficiency at magnetron deposition of metal coating / A.G. Chunadra, K.N. Sereda, I.K. Tarasov, A.A. Bizyukov // Вопросы атомной науки и техники. — 2015. — № 1. — С. 181-183. — Бібліогр.: 4 назв. — англ. |
| collection | DSpace DC |
| container_title | Вопросы атомной науки и техники |
| description | The results of technological tests of longitudinal planar magnetron sputtering system (MSS) with a magnetically isolated anode working in pulse-modes with additional pulse heavy-current high-voltage supply source are presented. It is shown that efficiency of mass transfer in the pulse mode overcoating increases by three orders of magnitude as compared to stationary mode of magnetron discharge. Hereat there is no droplet phase at the copper coating that is typical for an arc evaporation of a cathode.
Представлены результаты технологических испытаний продольной планарной магнетронной распылительной системы с магнитоизолированным анодом в импульсных режимах работы с дополнительным импульсным сильноточным высоковольтным источником питания. Показано, что эффективность массопереноса при импульсном нанесении покрытий возрастает на три порядка по сравнению со стационарным режимом горения магнетронного разряда. При этом в нанесенном медном покрытии капельной фазы, характерной для дугового испарения катода, не наблюдалось.
Представлено результати технологічних випробувань поздовжньої планарної магнетронної розпилювальної системи з магнітоізольованим анодом в імпульсних режимах роботи з додатковим імпульсним сильнострумовим високовольтним джерелом живлення. Показано, що ефективність масопереносу при імпульсному нанесенні покриттів зростає на три порядки в порівнянні зі стаціонарним режимом горіння магнетронного розряду. При цьому в нанесеному мідному покритті краплинної фази, характерної для дугового випаровування катода, не спостерігалося.
|
| first_indexed | 2025-12-07T16:33:09Z |
| format | Article |
| fulltext |
ISSN 1562-6016. ВАНТ. 2015. №1(95)
PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY. 2015, № 1. Series: Plasma Physics (21), p. 181-183. 181
INCREASING OF MASS TRANSFER EFFICIENCY AT MAGNETRON
DEPOSITION OF METAL COATING
A.G. Chunadra, K.N. Sereda, I.K. Tarasov, A.A. Bizyukov
V.N. Karazin Kharkiv National University, Kharkiv, Ukraine
E-mail:sekons@mail.ru
The results of technological tests of longitudinal planar magnetron sputtering system (MSS) with a magnetically
isolated anode working in pulse-modes with additional pulse heavy-current high-voltage supply source are
presented. It is shown that efficiency of mass transfer in the pulse mode overcoating increases by three orders of
magnitude as compared to stationary mode of magnetron discharge. Hereat there is no droplet phase at the copper
coating that is typical for an arc evaporation of a cathode.
PACS: 51.50.+v, 52.25.Jm
INTRODUCTION
The coating deposition technology using magnetron
sputtering systems (MSS) is widely used in the
manufacturing the microelectronic devices, displays,
obtaining the functional and decorative coatings of
different types of materials [1]. The productivity of the
deposition method using MSS is proportional to the
power input into the discharge. Taking into account the
feature of magnetron discharge to work as a voltage
stabilizer one can conclude that the deposition
productivity is proportional to the discharge current.
The technological task of deposition velocity increasing
requires the sufficient increase of discharge current. At
the same time when the discharge current in МSS
exceeds some critical value then the discharge transition
to arc mode happens. The discharge transition to arc
mode causes cathode spots of the second type formation
and generation of target material droplets which
sufficiently worsen the quality of coatings.
In this paper, results of technological tests of
longitudinal planar MSS with a magnetically isolated
anode working in pulse-modes with additional pulse
heavy-current high-voltage supply source are presented.
MSS design and its operating modes were reported in
[2, 3]. The corrugated magnetically isolated anode was
shown to provide the effective current aborting at
discharge disruption to the arc mode without magnetron
discharge quenching [3, 4]. The scheme of pulse supply
source (without a force limiting and current aborting)
works well in the technological area of magnetron
discharge.
1. EXPERIMENTAL EQUIPMENT
Experiments are carried out using the UVN-71 type
unit with installed planar MSS with copper sputtering
target with dimensions of (45×180) mm
2
. The arched
magnetic field above the target surface is produced with
permanent magnets located under the target. Working
pressure in the chamber is provided by the continuous
working gas (argon) supply in the range of pressures
(1…8) 10
3
Torr directly at the area of the discharge.
The pulse supply source of capacitive type with a
thyristor switchboard provides the supply of single-
pulse of voltage with amplitude of 1.5 kV in the
cathode-anode space.
The transformer of current (Rogovsky coil) is used
to measure the pulse current amplitude. The voltage on
the electrodes of MSS is registered with resistance
divider.
In the experiments, the copper coating is deposited
on standard subject glasses during 30 s of stationary
magnetron discharge with the following parameters:
Up = 350 V, Ip = 0.5 A at argon pressure of
P = (2…5) 10
3
Torr. The single-pulse of voltage with
magnitude of Upulse = 1,1 kV is supplied between the
cathode and anode of MSS at the background stationary
voltage of magnetron discharge. The limit current of the
discharge at the high-voltage pulse is regulated in the
range of Ipulse = 60…20 A by the limiting resistance in
the pulse supply source changed in the range of
0.5…2.0 to step of 0.5 . Hereat the duration of high-
voltage pulse changes in the range of tpulse = (5…50) ms.
2. RESULTS OF EXPERIMENTS AND
DISCUSSION
The measured characteristics of pulse discharge with
copper target in argon environmental show that
application of pulse supply provides stable work of co-
planar MSS during 5…50 ms. Hereat the current of
magnetron discharge of 60 A maintains the high
discharge voltage of 350…800 V.
The typical oscillograms of voltage (blue line) and
current (red line) orf pulse discharge are shown on
Fig. 1.
The shape and duration of oscillograms of discharge
voltage and current testify that the pulse discharge of
MSS has equipartition diffusive character of discharge
current, as it takes place in stationary mode. Aborting of
the voltage occurs after supplying the pulse voltage of
Upulse = 1.1 kV on the electrodes of MSS, that is typical
for an arc mode. However, the voltage falls only to
800 V, and then the capacitor of the pulse source
discharges on active resistance of the discharge cell
during 5…6 ms. Splashes of current typical for arc
mode transition are not observed on the oscillograms,
what also testifies the high-voltage character of pulse
heavy-current discharge. Brief voltage disruptions
182 ISSN 1562-6016. ВАНТ. 2015. №1(95)
Fig. 1. The typical oscillograms of voltage (blue line)
and current (red line) of pulse discharge
of about 100 V and current splashes and disruptions
which one can see on the oscillograms allow to
conclude that there are brief explosions of micro
roughness (sparkling) on the surface of the sputtering
target (cathode of MSS). However, formation of
cathode spots of the second type and transiting to the arc
mode with pinching of discharge current do not take
place.
Fig. 2. Photo of the sputtering target of МSS after the
cycle of technological tests (320 impulses)
On the Fig. 2 the photo of the sputtering target of
MSS is shown after the cycle of technological tests (320
impulses). Studying the target surface shows the
absence of both substance melting cavities and marks of
cathode spots of second type. At the same time, in the
area of target erosion there is a sharp display of material
structure (grittiness) not typical for stationary MSS.
This testifies the intensification of back sputtering.
Width of area of target erosion after the cycle of
technological tests in the pulse-mode also appears
approximately by 20% more than for the stationary
magnetron discharge.
Mass transfer efficiency is measured by the method
of weighing of subject glasses with the deposited
coating on analytical scales. The measuring shows that
semilucent copper coating with mass of
0.195 mg ( 1.5%) is deposited on the test sample set at
the distance of 50 mm from the center of the sputtering
target during 30 s of stationary magnetron discharge
with the following parameters: Up = 350 V; Ip = 0.5 A,
argon pressure P = (2…5) 10
3
Torr. During
determining the mass of the coating deposited on test
sample in the pulse-mode, one should take into account
that this part of mass is provided exactly by a stationary
discharge and the high-voltage single-pulse of voltage is
put on it’s background.
In the pulse-mode, overcoating is produced under
steady pressure and parameters of stationary discharge.
The peak value of pulse current is in the range of
Ipulse = 60…20 A. This current flows through the
limiting resistor of the pulse power supply unit. The
resistance can be changed in the range of 0.5…2.0
with a step of 0.5 . Registered duration of high-
voltage pulse varies in a range of tpulse = (5…50) ms.
0 10 20 30 40 50 60 70 80
0,0
0,1
0,2
0,3
0,4
0,5
0,6
0,7
m
C
u
,
m
g
I
imp
, A
Fig. 3. Dependence of the mass of the copper coating on
the maximal value of discharge current in a pulse
On the Fig. 3, the dependence of deposited copper
coating mass on the maximal value of the discharge
current per a pulse is shown. One can see that the mass
of the coating depends linearly on the value of discharge
current. The measuring shows that supplying the single-
pulse of high voltage increases mass of copper
transferred to the treatment sample from the sputtered
target of MSS by 2…6 times. The supplying produces
from 0.135 mg at 19.2 A of pulse current to 0.575 mg at
64 A of pulse current.
Taking into account that the duration of high voltage
pulse has a value about a few dozen of ms (on the
average 23 ms) and duration of stationary discharge is
30 ms, one can conclude that the main part of the
deposited substance is transported to the treatment
sample just during the pulse high-voltage heavy-current
discharge.
Dividing the transported mass by the duration of
stationary and pulse processes shows that the efficiency
of mass transport in the pulse mode is by three orders of
magnitude higher than in the stationary mode of
magnetron discharge.
ISSN 1562-6016. ВАНТ. 2015. №1(95) 183
The microscopic study of the obtained coatings
show increasing of coating thickness with the pulse
discharge current. The coatings are characterized by
good continuity and uniformity. Cavities and friability
of structure in the coatings which are typical for ones
with high-rate of deposition are not observed. Note that
the obtained coatings are characterized by good
adhesion and resistance to abrasion. Hereat the droplet
phase typical for arc evaporation is not observed in the
deposited copper coating.
CONCLUSIONS
Application of the high-voltage heavy-current pulse-
modes of MSS working in combination with corrugated
magnetic isolation of the anode allows increasing the
efficiency of the method of magnetron deposition by
several times. Hereat the velocity of mass transfer is
comparable to the at arc evaporation one, but, in our
case there is no droplet phase.
REFERENCES
1. B.S. Danilin. Low temperature plasma application
for thin films deposition. M.: “Energoatomizdat”, 1989
(in Russian).
2. A.A. Bizyukov, K.N. Sereda, V.V. Sleptsov,
I.K. Tarasov, A.G. Chunadra. Pulsed magnetron
sputtering system power supply without limitation and
forced interruption of the discharge current // Problems
of Atomic Science and Technology. Series “Plasma
Physics” (19). 2013, № 1 (83), p. 225-227.
3. A.A. Bizyukov, K.N. Sereda, V.V. Sleptsov,
I.K. Tarasov, A.G. Chunadra. High-current pulsed
operation modes of the planar mss with magnetically
insulated anode without transition to the arc discharge //
Problems of Atomic Science and Technology. Series
“Plasma Physics” (18). 2012, №6 (82), р. 190-192.
4. A.A. Bizyukov, K.N. Sereda, V.V. Sleptsov. Increase
of maximum current of magnetron discharge by means
of magnetic isolation of the sectionalized anode //
Applied Physics. 2008, № 6, p. 96-101.
Article received 03.12.2014
УВЕЛИЧЕНИЕ ЭФФЕКТИВНОСТИ МАССОПЕРЕНОСА ПРИ МАГНЕТРОННОМ ОСАЖДЕНИИ
МЕТАЛЛИЧЕСКИХ ПОКРЫТИЙ
А.Г. Чунадра, К.Н. Середа, И.К. Тарасов, A.A. Бизюков
Представлены результаты технологических испытаний продольной планарной магнетронной
распылительной системы с магнитоизолированным анодом в импульсных режимах работы с
дополнительным импульсным сильноточным высоковольтным источником питания. Показано, что
эффективность массопереноса при импульсном нанесении покрытий возрастает на три порядка по
сравнению со стационарным режимом горения магнетронного разряда. При этом в нанесенном медном
покрытии капельной фазы, характерной для дугового испарения катода, не наблюдалось.
ЗБІЛЬШЕННЯ ЕФЕКТИВНОСТІ МАСОПЕРЕНОСУ ПРИ МАГНЕТРОННОМУ ОСАДЖЕННІ
МЕТАЛЕВИХ ПОКРИТТІВ
А.Г. Чунадра, К.М. Середа, І.К. Тарасов, О.A. Бізюков
Представлено результати технологічних випробувань поздовжньої планарної магнетронної
розпилювальної системи з магнітоізольованим анодом в імпульсних режимах роботи з додатковим
імпульсним сильнострумовим високовольтним джерелом живлення. Показано, що ефективність
масопереносу при імпульсному нанесенні покриттів зростає на три порядки в порівнянні зі стаціонарним
режимом горіння магнетронного розряду. При цьому в нанесеному мідному покритті краплинної фази,
характерної для дугового випаровування катода, не спостерігалося.
|
| id | nasplib_isofts_kiev_ua-123456789-82146 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-12-07T16:33:09Z |
| publishDate | 2015 |
| publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| record_format | dspace |
| spelling | Chunadra, A.G. Sereda, K.N. Tarasov, I.K. Bizyukov, A.A. 2015-05-25T15:30:24Z 2015-05-25T15:30:24Z 2015 Increasing of mass transfer efficiency at magnetron deposition of metal coating / A.G. Chunadra, K.N. Sereda, I.K. Tarasov, A.A. Bizyukov // Вопросы атомной науки и техники. — 2015. — № 1. — С. 181-183. — Бібліогр.: 4 назв. — англ. 1562-6016 PPACS: 51.50.+v, 52.25.Jm https://nasplib.isofts.kiev.ua/handle/123456789/82146 The results of technological tests of longitudinal planar magnetron sputtering system (MSS) with a magnetically isolated anode working in pulse-modes with additional pulse heavy-current high-voltage supply source are presented. It is shown that efficiency of mass transfer in the pulse mode overcoating increases by three orders of magnitude as compared to stationary mode of magnetron discharge. Hereat there is no droplet phase at the copper coating that is typical for an arc evaporation of a cathode. Представлены результаты технологических испытаний продольной планарной магнетронной распылительной системы с магнитоизолированным анодом в импульсных режимах работы с дополнительным импульсным сильноточным высоковольтным источником питания. Показано, что эффективность массопереноса при импульсном нанесении покрытий возрастает на три порядка по сравнению со стационарным режимом горения магнетронного разряда. При этом в нанесенном медном покрытии капельной фазы, характерной для дугового испарения катода, не наблюдалось. Представлено результати технологічних випробувань поздовжньої планарної магнетронної розпилювальної системи з магнітоізольованим анодом в імпульсних режимах роботи з додатковим імпульсним сильнострумовим високовольтним джерелом живлення. Показано, що ефективність масопереносу при імпульсному нанесенні покриттів зростає на три порядки в порівнянні зі стаціонарним режимом горіння магнетронного розряду. При цьому в нанесеному мідному покритті краплинної фази, характерної для дугового випаровування катода, не спостерігалося. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Низкотемпературная плазма и плазменные технологии Increasing of mass transfer efficiency at magnetron deposition of metal coating Увеличение эффективности массопереноса при магнетронном осаждении металлических покрытий Збільшення ефективності масопереносу при магнетронному осадженні металевих покриттів Article published earlier |
| spellingShingle | Increasing of mass transfer efficiency at magnetron deposition of metal coating Chunadra, A.G. Sereda, K.N. Tarasov, I.K. Bizyukov, A.A. Низкотемпературная плазма и плазменные технологии |
| title | Increasing of mass transfer efficiency at magnetron deposition of metal coating |
| title_alt | Увеличение эффективности массопереноса при магнетронном осаждении металлических покрытий Збільшення ефективності масопереносу при магнетронному осадженні металевих покриттів |
| title_full | Increasing of mass transfer efficiency at magnetron deposition of metal coating |
| title_fullStr | Increasing of mass transfer efficiency at magnetron deposition of metal coating |
| title_full_unstemmed | Increasing of mass transfer efficiency at magnetron deposition of metal coating |
| title_short | Increasing of mass transfer efficiency at magnetron deposition of metal coating |
| title_sort | increasing of mass transfer efficiency at magnetron deposition of metal coating |
| topic | Низкотемпературная плазма и плазменные технологии |
| topic_facet | Низкотемпературная плазма и плазменные технологии |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/82146 |
| work_keys_str_mv | AT chunadraag increasingofmasstransferefficiencyatmagnetrondepositionofmetalcoating AT seredakn increasingofmasstransferefficiencyatmagnetrondepositionofmetalcoating AT tarasovik increasingofmasstransferefficiencyatmagnetrondepositionofmetalcoating AT bizyukovaa increasingofmasstransferefficiencyatmagnetrondepositionofmetalcoating AT chunadraag uveličenieéffektivnostimassoperenosaprimagnetronnomosaždeniimetalličeskihpokrytii AT seredakn uveličenieéffektivnostimassoperenosaprimagnetronnomosaždeniimetalličeskihpokrytii AT tarasovik uveličenieéffektivnostimassoperenosaprimagnetronnomosaždeniimetalličeskihpokrytii AT bizyukovaa uveličenieéffektivnostimassoperenosaprimagnetronnomosaždeniimetalličeskihpokrytii AT chunadraag zbílʹšennâefektivnostímasoperenosuprimagnetronnomuosadžennímetalevihpokrittív AT seredakn zbílʹšennâefektivnostímasoperenosuprimagnetronnomuosadžennímetalevihpokrittív AT tarasovik zbílʹšennâefektivnostímasoperenosuprimagnetronnomuosadžennímetalevihpokrittív AT bizyukovaa zbílʹšennâefektivnostímasoperenosuprimagnetronnomuosadžennímetalevihpokrittív |