Double magnetron cluster set-up for synthesis of micro and nano structure coatings
In the present paper, the results studying the technological regimes of reactive magnetron sputtering in cluster set-up with two planar magnetrons, plasma source and medium energy ion source are presented. Magnetron current-voltage characteristics as well as dependencies of the magnetron current, vo...
Збережено в:
| Опубліковано в: : | Вопросы атомной науки и техники |
|---|---|
| Дата: | 2015 |
| Автори: | , , , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2015
|
| Теми: | |
| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/82244 |
| Теги: |
Додати тег
Немає тегів, Будьте першим, хто поставить тег для цього запису!
|
| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Double magnetron cluster set-up for synthesis of micro and nano structure coatings / S. Yakovin, A. Zykov, S. Dudin, M. Sergiec, V. Farenik // Вопросы атомной науки и техники. — 2015. — № 1. — С. 187-189. — Бібліогр.: 6 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1860115852661096448 |
|---|---|
| author | Yakovin, S. Zykov, A. Dudin, S. Sergiec, M. Farenik, V. |
| author_facet | Yakovin, S. Zykov, A. Dudin, S. Sergiec, M. Farenik, V. |
| citation_txt | Double magnetron cluster set-up for synthesis of micro and nano structure coatings / S. Yakovin, A. Zykov, S. Dudin, M. Sergiec, V. Farenik // Вопросы атомной науки и техники. — 2015. — № 1. — С. 187-189. — Бібліогр.: 6 назв. — англ. |
| collection | DSpace DC |
| container_title | Вопросы атомной науки и техники |
| description | In the present paper, the results studying the technological regimes of reactive magnetron sputtering in cluster set-up with two planar magnetrons, plasma source and medium energy ion source are presented. Magnetron current-voltage characteristics as well as dependencies of the magnetron current, voltage and the total pressure in the chamber on the reactive gas flow are presented with emphasis on the features of the joint work of the two magnetrons with targets of different materials using different reactive gases. The technological “window” is determined on the basis of the measured characteristics.
Представлены результаты исследования технологических режимов реактивного магнетронного напыления в кластерной установке с двумя плоскими магнетронами и источником плазмы. Представлены ВАХ магнетронов, а также зависимости тока и напряжения магнетрона и давления в камере от потока реактивного газа с акцентом на особенностях совместной работы двух магнетронов с мишенями из различных материалов. На основании измеренных характеристик определено оптимальное "технологическое окно".
Представлені результати дослідження технологічних режимів реактивного магнетронного напилювання в кластерній установці з двома плоскими магнетронами і джерелом плазми. Представлено ВАХ магнетронів, а також залежності струму і напруги магнетрона та тиску в камері від потоку реактивного газу з акцентом на особливостях спільної роботи двох магнетронів з мішенями з різних матеріалів. На базі виміряних характеристик визначено оптимальне "технологічне вікно".
|
| first_indexed | 2025-12-07T17:36:25Z |
| format | Article |
| fulltext |
ISSN 1562-6016. ВАНТ. 2015. №1(95)
PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY. 2015, № 1. Series: Plasma Physics (21), p. 187-189. 187
DOUBLE MAGNETRON CLUSTER SET-UP FOR SYNTHESIS OF
MICRO AND NANO STRUCTURE COATINGS
S. Yakovin
1
, A. Zykov
1
, S. Dudin
1
, M. Sergiec
1
, V. Farenik
2
1
V.N. Karazin Kharkiv National Universty, Kharkiv, Ukraine;
2
Scientific Center of Physical Technologies, Kharkiv, Ukraine
In the present paper, the results studying the technological regimes of reactive magnetron sputtering in cluster
set-up with two planar magnetrons, plasma source and medium energy ion source are presented. Magnetron current-
voltage characteristics as well as dependencies of the magnetron current, voltage and the total pressure in the cham-
ber on the reactive gas flow are presented with emphasis on the features of the joint work of the two magnetrons
with targets of different materials using different reactive gases. The technological “window” is determined on the
basis of the measured characteristics.
PACS: 52.77.-j, 81.15.-z
INTRODUCTION
In previous study [1], the results of elaboration and
investigation of cluster technological setup for synthesis
of complex compound composites were demonstrated.
The presented set-up consists of complimentary DC-
magnetron system, RF-inductive plasma source and ion
source. The set-up system allows to form the fluxes of
metal atoms, chemically active particles, and ions inde-
pendently from each other, as well as to synthesize the
thin films of complex compound composites, including
nano composites.
The results of studying the different module compo-
nents were published previously: the research of the
low-pressure DC magnetron [2]; the research of arcing
processes at the magnetron target in the oxygen atmos-
phere [3]; the research of the target passivation [4]; the
research of the RF inductive plasma source [5].
On the base of this module we designed the experi-
mental multifunctional cluster ion-plasma system with
parameters corresponding to the demands of industrial
operation. The main purpose of this system is synthesis
and processing of complex-composite (including nano-
composite) coatings and structures based on TiAlNx,
TiAlOx, Al2O3, ZrAlOx and their combinations. Peculi-
arities of the system operation with reactive gas filling
were reported in [6] where the results of measuring the
current-voltage characteristics of magnetron discharge
with various target materials in argon mixtures with
oxygen and nitrogen were presented.
The experiments showed that the magnetron dis-
charge in reactive atmosphere can glow in two modes
with hysteretic transition between them. However, these
results were insufficient for understanding the double-
magnetron system operation in the reactive gas. The
present paper describes the results of studying the sim-
ultaneous operation of two magnetrons with emphasis
on mutual influence of the magnetron discharges on
each other. Basing on the obtained results the deposition
technology of ZrAlOx coatings is developed.
1. EXPERIMENTAL SETUP
The cluster set-up is schematically shown in the
Fig. 1. The system consists of two low-pressure magne-
trons 2, 7 located at different sides of the chamber, the
RF inductive source of plasma and activated particles of
reactive gas 3 located inside the chamber. The relative
location of these components is chosen to provide the
possibility of the simultaneous action on the processed
surface of the flows of metal atoms, activated particles
of reactive gas and ions of rare or reactive gas.
to vacuum
pump
О2
Ar
О2
2 3
1
5
4
1
1
1
11
6
6
1
4
4
10 cm
7
6
1
8
9
6
1
10
54
1
a
0 2 4 6 8 10 12 14
0
100
200
300
400
500
600
700
1
2
3
4
U
,
V
I, A
b
Fig. 1. Scheme of the cluster set-up for complex compo-
site compounds synthesis. 1, 6 – DC magnetron power
supply; 2, 7 – magnetron; 3 – RF ICP source; 4 – RF
generator; 5 – RF matchbox; 8, 11 – shutter; 9 – pulsed
power supply for samples polarization; 10 – samples
rotation system
188 ISSN 1562-6016. ВАНТ. 2015. №1(95)
A planar magnetron with permanent magnets is used in
the system (Fig. 2). The magnetron power supply allows
to bias the magnetron target at up to 1 kV negative po-
tential at the discharge current up to 20 A, maximum
power of the supply is 6 kW. The magnetron targets of
170 mm diameter are made of aluminum, zirconium or
titanium. Distance from the target to the processed sam-
ples is variable within the limits 100…500 mm in the
case of pure magnetron deposition, and is fixed in ap-
proximately 300 mm for the case of simultaneous oper-
ation of the magnetron and the ion source.
Fig. 2. CVC of two magnetron discharges with Zr (lines
1, 2) and Al (lines 3, 4) targets. a – working gas is pure
argon; b – mixture of argon and oxygen. Lines 1 and 3
correspond to single-magnetron operation; lines 2 and 4
show influence of second magnetron. Base argon pres-
sure P = 1.5 × 10
3
Torr
2. EXPERIMENTAL RESULTS
The oxide Al2O3 and ZrO2 coating is deposited in
high vacuum pumping system with the base pressure
about 10
5
mBar. There is the problem of target oxida-
tion during deposition process. Under the excessive ox-
ygen flow conditions the process shifts to the target pas-
sivation regime. The sputtering process should be made
in the regimes far from the target passivation both for
aluminum and for zirconium target materials for oxide
coatings deposition with highly stoichiometric composi-
tion. Such deposition conditions allow also to avoid
micro-arcs and micro-drops formation increasing the
corrosion resistance.
The problem of micro-arcs and micro-drops for-
mation becomes actual during simultaneous operation of
two magnetrons. Fig. 2 presents the current-voltage
characteristic (CVC) of the magnetrons with targets of
aluminum and zirconium in pure argon (see Fig. 2,a)
and in mixture of argon with oxygen (see Fig. 2,b).
As can be seen from Fig. 2,a, the CVCs for magne-
trons with Al and Zr targets are significantly different
for pure argon, while the influence of each magnetron to
other is not observed.
In Fig. 2,b the CVCs for the Al and Zr targets are
shown for the mixture of argon and oxygen. As can be
seen from the figure, all the CVCs are S-shaped, and
consist of the transition region and two saturation re-
gions: the higher one for pure argon, and the lower one
appearing in the target passivation mode at sufficiently
high flow of oxygen. There is a region with a negative
slope for medium flow values of oxygen. One can also
see that a hysteresis is observed in the transition region.
The width of the hysteretic loop increases at the reactive
gas flow increase. The S-shaped curve can be passed
completely for small gas flow values, but above a cer-
tain threshold value the slope of the S-curve becomes
greater than the slope of the load curve of our power
supply and abrupt transition happens from the pas-
sivation regime to the "metallic" mode. With further
reactive gas flow increase, the exit current from the pas-
sivation appears too high, so the power of the power
supply is insufficient.
When two magnetron operate (see lines 3, 4 in the
Fig. 2,b) then the significant influence of one magnetron
on the other is observed. The hysteresis of CVC of each
magnetron shifts to lower values of the discharge cur-
rent.
The Fig. 3 demonstrates the hysteretic of magnetron
voltage versus the oxygen flow rate. Fig. 3,a shows that
the passivation of the two magnetron targets does not
occur simultaneously. When one magnetron enters the
passivation mode then the voltage on the second magne-
tron decreases stepwise, that is caused by sharp increase
of oxygen partial pressure in the chamber. Further in-
crease of the oxygen flow induces the second magnetron
transition to the passivation mode. Exit from the pas-
sivation mode occurs in reverse order.
If one chooses the power of the magnetron discharge
so that the transition to the passivation mode of both
magnetrons occur for similar flow of reactive gas, then
the picture is somewhat different one. When the first
magnetron reaches the critical oxygen flow, then it
switches to the passivation mode thus releasing some
additional amount of oxygen, that is sufficient for the
second magnetron jump to passivation mode. Thus, both
magnetrons switch into the passivation mode (and vice
versa) simultaneously. One can also observe from the
Fig. 3,b the shift of the hysteresis region to higher val-
ues of oxygen flow rate when two magnetrons operate
simultaneously.
The obtained results allow choosing the “process win-
dow” for the synthesis of oxide coatings of Al, Zr and
their combinations. The experiment shows that success-
ful synthesis of stoichiometric oxide film is possible
only within a narrow “window” on the oxygen flow rate
axis. At lower rates only non-stoichiometric non-
trasparent film can be obtained while the oxygen flow
rate increase above the “window” causes arcing at the
magnetron target leading to contamination of the grown
film by metallic droplets. Adjusting the position of the
plasma source in relation to the magnetrons one can
achieve the situation when the “process window” is
shifted above the hysteresis by the voltage axis so that
the coating process takes place in the “metallic mode”
far away from the area of passivation and microarcs.
For Al and Zr targets, the oxide coating should be
deposited in the "metallic mode", i.e. when the target is
far from passivation. This is necessary to avoid
microarcs and, as a consequence, the droplets. These
conditions are satisfied at the upper part of the lines
higher than the hysteresis.
ISSN 1562-6016. ВАНТ. 2015. №1(95) 189
0 10 20 30 40
0
100
200
300
400
500
600
1
2
U
,
V
q, sccm
a
0 10 20 30 40
0
100
200
300
400
500
600
1
2
U
,
V
q, sccm
b
Fig. 3. Dependencies of magnetron discharge voltage on
the oxygen flow rate: a – Zr (line 1) and Al (line 2) tar-
gets; b – single (line 2) and double (line 1) magnetron
operation with Al target. Argon pressure
P = 1×10
3
Torr
The obtained results allow us to choose the "process
window" for the synthesis of oxide coatings of Al, Zr
and their combinations.
CONCLUSIONS
Thus, the experimental research of the current-
voltage characteristics of the double-magnetron dis-
charge in noble (Ar) and reactive (O) gases for different
target materials (Al, Zr) and their interdependence is
reported in the present paper. It is shown that in pure Ar
any mutual influence of two magnetrons is absent. On
the contrary, the interference between two magnetrons
causes the hysteretic region shift in CVC towards lower
currents in the case of oxygen usage as a reactive gas.
The similar shift in the magnetron discharge voltage
dependence on the oxygen flow rate is observed towards
higher values of the flow rate. Basing on the research
results it is found that it is most expedient to deposit the
oxide coatings at the top branch of the CVC, i.e. in "me-
tallic mode".
REFERENCES
1. S. Yakovin, S. Dudin, A. Zykov, V. Farenik, Integral
cluster set-up for complex compound composites
syntesis // Problems of Atomic Science and Technology.
Series “Plasma Physics”. 2011, № 1, p. 152-154.
2. A.V. Zykov, S.D. Yakovin, S.V. Dudin. Synthesis of
dielectric compounds by DC magnetron // Physical Sur-
face Engineering. 2009, v. 7, № 3, p. 195-203.
3. S.V Dudin, V.I. Farenik, A.N. Dahov. Development of
arc suppression technique for reactive magnetron sputter-
ing // Physical Surface Engineering. 2005, v. 3, № 3-4.
4. Jan Walkowicz, Aleksandr Zykov, Stanislav Dudin,
Stanislav Yakovin, Rafael Brudnias. ICP enhanced reac-
tive magnetron sputtering system for syntesis of alumi-
na coating // Tribologia. 2006, № 6, p. 163-174 (in
Russian).
5. M. Yu, I. Denysenko, S. Dudin, A. Zykov,
N. Azarenkov. Ion flux uniformity in inductively cou-
pled plasma sources // Phys. Plasmas. 2002, v. 9, № 11.
6. S. Yakovin, S. Dudin, A. Zykov, A. Shyshkov,
V. Farenik. Technological approbation of integral
cluster set-up for complex compound composites
synthesis // Problems of Atomic Science and Tech-
nology. Series “Plasma Physics”. 2012, №6, p. 220-
222.
Article received 06.12.2014
КЛАСТЕРНАЯ УСТАНОВКА С ДВУМЯ МАГНЕТРОНАМИ ДЛЯ СИНТЕЗА МИКРО-
И НАНОСТРУКТУРНЫХ ПОКРЫТИЙ
С. Яковин, А. Зыков, С. Дудин, М. Сергиец, В. Фареник
Представлены результаты исследования технологических режимов реактивного магнетронного напыле-
ния в кластерной установке с двумя плоскими магнетронами и источником плазмы. Представлены ВАХ
магнетронов, а также зависимости тока и напряжения магнетрона и давления в камере от потока реактивно-
го газа с акцентом на особенностях совместной работы двух магнетронов с мишенями из различных мате-
риалов. На основании измеренных характеристик определено оптимальное "технологическое окно".
КЛАСТЕРНА УСТАНОВКА З ДВОМА МАГНЕТРОНАМИ ДЛЯ СИНТЕЗУ МІКРО-
ТА НАНОСТРУКТУРНИХ ПОКРИТТІВ
С. Яковін, О. Зиков, С. Дудін, М. Сергіець, В. Фаренік
Представлені результати дослідження технологічних режимів реактивного магнетронного напилювання
в кластерній установці з двома плоскими магнетронами і джерелом плазми. Представлено ВАХ магнетронів,
а також залежності струму і напруги магнетрона та тиску в камері від потоку реактивного газу з акцентом на
особливостях спільної роботи двох магнетронів з мішенями з різних матеріалів. На базі виміряних характе-
ристик визначено оптимальне "технологічне вікно".
|
| id | nasplib_isofts_kiev_ua-123456789-82244 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-12-07T17:36:25Z |
| publishDate | 2015 |
| publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| record_format | dspace |
| spelling | Yakovin, S. Zykov, A. Dudin, S. Sergiec, M. Farenik, V. 2015-05-27T08:38:44Z 2015-05-27T08:38:44Z 2015 Double magnetron cluster set-up for synthesis of micro and nano structure coatings / S. Yakovin, A. Zykov, S. Dudin, M. Sergiec, V. Farenik // Вопросы атомной науки и техники. — 2015. — № 1. — С. 187-189. — Бібліогр.: 6 назв. — англ. 1562-6016 PACS: 52.77.-j, 81.15.-z https://nasplib.isofts.kiev.ua/handle/123456789/82244 In the present paper, the results studying the technological regimes of reactive magnetron sputtering in cluster set-up with two planar magnetrons, plasma source and medium energy ion source are presented. Magnetron current-voltage characteristics as well as dependencies of the magnetron current, voltage and the total pressure in the chamber on the reactive gas flow are presented with emphasis on the features of the joint work of the two magnetrons with targets of different materials using different reactive gases. The technological “window” is determined on the basis of the measured characteristics. Представлены результаты исследования технологических режимов реактивного магнетронного напыления в кластерной установке с двумя плоскими магнетронами и источником плазмы. Представлены ВАХ магнетронов, а также зависимости тока и напряжения магнетрона и давления в камере от потока реактивного газа с акцентом на особенностях совместной работы двух магнетронов с мишенями из различных материалов. На основании измеренных характеристик определено оптимальное "технологическое окно". Представлені результати дослідження технологічних режимів реактивного магнетронного напилювання в кластерній установці з двома плоскими магнетронами і джерелом плазми. Представлено ВАХ магнетронів, а також залежності струму і напруги магнетрона та тиску в камері від потоку реактивного газу з акцентом на особливостях спільної роботи двох магнетронів з мішенями з різних матеріалів. На базі виміряних характеристик визначено оптимальне "технологічне вікно". en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Низкотемпературная плазма и плазменные технологии Double magnetron cluster set-up for synthesis of micro and nano structure coatings Кластерная установка с двумя магнетронами для синтеза микро- и наноструктурных покрытий Кластерна установка з двома магнетронами для синтезу мікро- та наноструктурних покриттів Article published earlier |
| spellingShingle | Double magnetron cluster set-up for synthesis of micro and nano structure coatings Yakovin, S. Zykov, A. Dudin, S. Sergiec, M. Farenik, V. Низкотемпературная плазма и плазменные технологии |
| title | Double magnetron cluster set-up for synthesis of micro and nano structure coatings |
| title_alt | Кластерная установка с двумя магнетронами для синтеза микро- и наноструктурных покрытий Кластерна установка з двома магнетронами для синтезу мікро- та наноструктурних покриттів |
| title_full | Double magnetron cluster set-up for synthesis of micro and nano structure coatings |
| title_fullStr | Double magnetron cluster set-up for synthesis of micro and nano structure coatings |
| title_full_unstemmed | Double magnetron cluster set-up for synthesis of micro and nano structure coatings |
| title_short | Double magnetron cluster set-up for synthesis of micro and nano structure coatings |
| title_sort | double magnetron cluster set-up for synthesis of micro and nano structure coatings |
| topic | Низкотемпературная плазма и плазменные технологии |
| topic_facet | Низкотемпературная плазма и плазменные технологии |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/82244 |
| work_keys_str_mv | AT yakovins doublemagnetronclustersetupforsynthesisofmicroandnanostructurecoatings AT zykova doublemagnetronclustersetupforsynthesisofmicroandnanostructurecoatings AT dudins doublemagnetronclustersetupforsynthesisofmicroandnanostructurecoatings AT sergiecm doublemagnetronclustersetupforsynthesisofmicroandnanostructurecoatings AT farenikv doublemagnetronclustersetupforsynthesisofmicroandnanostructurecoatings AT yakovins klasternaâustanovkasdvumâmagnetronamidlâsintezamikroinanostrukturnyhpokrytii AT zykova klasternaâustanovkasdvumâmagnetronamidlâsintezamikroinanostrukturnyhpokrytii AT dudins klasternaâustanovkasdvumâmagnetronamidlâsintezamikroinanostrukturnyhpokrytii AT sergiecm klasternaâustanovkasdvumâmagnetronamidlâsintezamikroinanostrukturnyhpokrytii AT farenikv klasternaâustanovkasdvumâmagnetronamidlâsintezamikroinanostrukturnyhpokrytii AT yakovins klasternaustanovkazdvomamagnetronamidlâsintezumíkrotananostrukturnihpokrittív AT zykova klasternaustanovkazdvomamagnetronamidlâsintezumíkrotananostrukturnihpokrittív AT dudins klasternaustanovkazdvomamagnetronamidlâsintezumíkrotananostrukturnihpokrittív AT sergiecm klasternaustanovkazdvomamagnetronamidlâsintezumíkrotananostrukturnihpokrittív AT farenikv klasternaustanovkazdvomamagnetronamidlâsintezumíkrotananostrukturnihpokrittív |