Experimental research of ICP reactor for plasma-chemical etching
The results of systematic experimental researches of plasma-chemical etching reactor in the inductive mode are presented
 in this paper. Measurements of the integral discharge parameters (inductor voltage, gas pressure, input power)
 have been carried out as well as probe measureme...
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| Veröffentlicht in: | Вопросы атомной науки и техники |
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| Datum: | 2006 |
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| Sprache: | Englisch |
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2006
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Experimental research of ICP reactor for plasma-chemical etching / S.V. Dudin, A.V.Zykov, A.N.Dahov, V.I. Farenik // Вопросы атомной науки и техники. — 2006. — № 6. — С. 189-191. — Бібліогр.: 3 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862578031067922432 |
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| author | Dudin, S.V. Zykov, A.V. Dahov, A.N. Farenik, V.I. |
| author_facet | Dudin, S.V. Zykov, A.V. Dahov, A.N. Farenik, V.I. |
| citation_txt | Experimental research of ICP reactor for plasma-chemical etching / S.V. Dudin, A.V.Zykov, A.N.Dahov, V.I. Farenik // Вопросы атомной науки и техники. — 2006. — № 6. — С. 189-191. — Бібліогр.: 3 назв. — англ. |
| collection | DSpace DC |
| container_title | Вопросы атомной науки и техники |
| description | The results of systematic experimental researches of plasma-chemical etching reactor in the inductive mode are presented
in this paper. Measurements of the integral discharge parameters (inductor voltage, gas pressure, input power)
have been carried out as well as probe measurements of spatial distribution of local plasma parameters (plasma density,
temperature and electron energy distribution function) and radial profiles of ion current to processed surface. The
measured dependences differ essentially for atomic (Ar) and molecular (O₂,N₂,CF₄) gases. As the range of working
pressure covers diffusive and collisionless modes of charged particles movement, radial distribution of ion current density
and its absolute value change significantly. Comparison of the obtained results with the calculations executed using
“Global” spatially averaged model and 2D-fluid model is carried out.
|
| first_indexed | 2025-11-26T17:30:42Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-82289 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-11-26T17:30:42Z |
| publishDate | 2006 |
| publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| record_format | dspace |
| spelling | Dudin, S.V. Zykov, A.V. Dahov, A.N. Farenik, V.I. 2015-05-27T14:37:17Z 2015-05-27T14:37:17Z 2006 Experimental research of ICP reactor for plasma-chemical etching / S.V. Dudin, A.V.Zykov, A.N.Dahov, V.I. Farenik // Вопросы атомной науки и техники. — 2006. — № 6. — С. 189-191. — Бібліогр.: 3 назв. — англ. 1562-6016 PACS: 52.77.Bn https://nasplib.isofts.kiev.ua/handle/123456789/82289 The results of systematic experimental researches of plasma-chemical etching reactor in the inductive mode are presented
 in this paper. Measurements of the integral discharge parameters (inductor voltage, gas pressure, input power)
 have been carried out as well as probe measurements of spatial distribution of local plasma parameters (plasma density,
 temperature and electron energy distribution function) and radial profiles of ion current to processed surface. The
 measured dependences differ essentially for atomic (Ar) and molecular (O₂,N₂,CF₄) gases. As the range of working
 pressure covers diffusive and collisionless modes of charged particles movement, radial distribution of ion current density
 and its absolute value change significantly. Comparison of the obtained results with the calculations executed using
 “Global” spatially averaged model and 2D-fluid model is carried out. This work was supported by Ministry of Industrial
 Policy of Ukraine, Project 92373/60. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Low temperature plasma and plasma technologies Experimental research of ICP reactor for plasma-chemical etching Article published earlier |
| spellingShingle | Experimental research of ICP reactor for plasma-chemical etching Dudin, S.V. Zykov, A.V. Dahov, A.N. Farenik, V.I. Low temperature plasma and plasma technologies |
| title | Experimental research of ICP reactor for plasma-chemical etching |
| title_full | Experimental research of ICP reactor for plasma-chemical etching |
| title_fullStr | Experimental research of ICP reactor for plasma-chemical etching |
| title_full_unstemmed | Experimental research of ICP reactor for plasma-chemical etching |
| title_short | Experimental research of ICP reactor for plasma-chemical etching |
| title_sort | experimental research of icp reactor for plasma-chemical etching |
| topic | Low temperature plasma and plasma technologies |
| topic_facet | Low temperature plasma and plasma technologies |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/82289 |
| work_keys_str_mv | AT dudinsv experimentalresearchoficpreactorforplasmachemicaletching AT zykovav experimentalresearchoficpreactorforplasmachemicaletching AT dahovan experimentalresearchoficpreactorforplasmachemicaletching AT farenikvi experimentalresearchoficpreactorforplasmachemicaletching |