Experimental research of ICP reactor for plasma-chemical etching

• Published in: Вопросы атомной науки и техники
• Date: 2006
• Main Authors: Dudin, S.V., Zykov, A.V., Dahov, A.N., Farenik, V.I.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2006
• Subjects: Low temperature plasma and plasma technologies
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/82289
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Experimental research of ICP reactor for plasma-chemical etching / S.V. Dudin, A.V.Zykov, A.N.Dahov, V.I. Farenik // Вопросы атомной науки и техники. — 2006. — № 6. — С. 189-191. — Бібліогр.: 3 назв. — англ.

The results of systematic experimental researches of plasma-chemical etching reactor in the inductive mode are presented
 in this paper. Measurements of the integral discharge parameters (inductor voltage, gas pressure, input power)
 have been carried out as well as probe measureme...