Investigation of thin films deposition into porous material
Although the direct contact of the treated material with the plasma is assumed by the plasma community as a
 necessary condition of successful plasma treatment, several references mention penetration of active species into the
 porous material. Hydrophylity enhancement has been obser...
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| Veröffentlicht in: | Вопросы атомной науки и техники |
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| Datum: | 2006 |
| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | Englisch |
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2006
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/82307 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Investigation of thin films deposition into porous material / L. Sedláková, A. Kolouch, J. Hladík, P. Spatenka // Вопросы атомной науки и техники. — 2006. — № 6. — С. 207-209. — Бібліогр.: 6 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862707661154287616 |
|---|---|
| author | Sedláková, L. Kolouch, A. Hladík, J. Spatenka, P. |
| author_facet | Sedláková, L. Kolouch, A. Hladík, J. Spatenka, P. |
| citation_txt | Investigation of thin films deposition into porous material / L. Sedláková, A. Kolouch, J. Hladík, P. Spatenka // Вопросы атомной науки и техники. — 2006. — № 6. — С. 207-209. — Бібліогр.: 6 назв. — англ. |
| collection | DSpace DC |
| container_title | Вопросы атомной науки и техники |
| description | Although the direct contact of the treated material with the plasma is assumed by the plasma community as a
necessary condition of successful plasma treatment, several references mention penetration of active species into the
porous material. Hydrophylity enhancement has been observed even inside porous material. The aim of this study is
experimental investigation of plasma. This work is aimed to experimental investigation of thin layers deposition on
porous substrates.
The porous substrate was simulated with a specimen made from two glass wafers, on the margins of which two
difference strips of varying thickness were placed. These strips define the thickness of the slot in the middle. After the
deposition the substrate was decomposed and the film deposited inner walls of the glass wafers was investigated. Layers
were deposited by method PECVD used RF plasma from gas C2H2. The film thickness was measured in dependence on
the distance from the margin into the centre of the slab by optical profilometer. Penetration dept was tested in
dependence on deposition conditions and geometric configuration of the substrate. Depending on deposition conditions,
the film deposition was observed even on the whole substrate.
|
| first_indexed | 2025-12-07T17:06:03Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-82307 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-12-07T17:06:03Z |
| publishDate | 2006 |
| publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| record_format | dspace |
| spelling | Sedláková, L. Kolouch, A. Hladík, J. Spatenka, P. 2015-05-27T15:27:07Z 2015-05-27T15:27:07Z 2006 Investigation of thin films deposition into porous material / L. Sedláková, A. Kolouch, J. Hladík, P. Spatenka // Вопросы атомной науки и техники. — 2006. — № 6. — С. 207-209. — Бібліогр.: 6 назв. — англ. 1562-6016 PACS: 52.77.Dq, 68.00.00 https://nasplib.isofts.kiev.ua/handle/123456789/82307 Although the direct contact of the treated material with the plasma is assumed by the plasma community as a
 necessary condition of successful plasma treatment, several references mention penetration of active species into the
 porous material. Hydrophylity enhancement has been observed even inside porous material. The aim of this study is
 experimental investigation of plasma. This work is aimed to experimental investigation of thin layers deposition on
 porous substrates.
 The porous substrate was simulated with a specimen made from two glass wafers, on the margins of which two
 difference strips of varying thickness were placed. These strips define the thickness of the slot in the middle. After the
 deposition the substrate was decomposed and the film deposited inner walls of the glass wafers was investigated. Layers
 were deposited by method PECVD used RF plasma from gas C2H2. The film thickness was measured in dependence on
 the distance from the margin into the centre of the slab by optical profilometer. Penetration dept was tested in
 dependence on deposition conditions and geometric configuration of the substrate. Depending on deposition conditions,
 the film deposition was observed even on the whole substrate. This project was supported by the GACR, project No.
 202/05/2242 and Centrum, project No. 1M0577 en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Low temperature plasma and plasma technologies Investigation of thin films deposition into porous material Article published earlier |
| spellingShingle | Investigation of thin films deposition into porous material Sedláková, L. Kolouch, A. Hladík, J. Spatenka, P. Low temperature plasma and plasma technologies |
| title | Investigation of thin films deposition into porous material |
| title_full | Investigation of thin films deposition into porous material |
| title_fullStr | Investigation of thin films deposition into porous material |
| title_full_unstemmed | Investigation of thin films deposition into porous material |
| title_short | Investigation of thin films deposition into porous material |
| title_sort | investigation of thin films deposition into porous material |
| topic | Low temperature plasma and plasma technologies |
| topic_facet | Low temperature plasma and plasma technologies |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/82307 |
| work_keys_str_mv | AT sedlakoval investigationofthinfilmsdepositionintoporousmaterial AT koloucha investigationofthinfilmsdepositionintoporousmaterial AT hladikj investigationofthinfilmsdepositionintoporousmaterial AT spatenkap investigationofthinfilmsdepositionintoporousmaterial |