Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures

• Veröffentlicht in: Вопросы атомной науки и техники
• Datum: 2006
• Hauptverfasser: Manuilenko, O.V., Minaeva, K.M., Golota, V.I.
• Format: Artikel
• Sprache: Englisch
• Veröffentlicht: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2006
• Schlagworte: Low temperature plasma and plasma technologies
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/82350
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures / O.V. Manuilenko, K.M. Minaeva, V.I. Golota // Вопросы атомной науки и техники. — 2006. — № 6. — С. 228-230. — Бібліогр.: 7 назв. — англ.

Single and dual frequency capacitively coupled plasma (CCP) sources operating in pure Ar, O₂ and Ar/O₂ mixtures
 are investigated by means of particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations. The different possibilities
 to control ion energy distribution functions (IEDFs) and ion angular distribution functions (IADFs) on electrodes are
 found. It is shown that the driven voltage and frequency in single frequency capacitive discharges are control the IEDFs
 on the electrodes. It is demonstrated that the low frequency voltage in dual frequency CCP sources controls the IEDFs
 and IADFs. It is shown that the IEDFs on electrodes can be controlled by Ar/O₂ ratio.