Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures
Single and dual frequency capacitively coupled plasma (CCP) sources operating in pure Ar, O₂ and Ar/O₂ mixtures are investigated by means of particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations. The different possibilities to control ion energy distribution functions (IEDFs) and ion ang...
Збережено в:
| Опубліковано в: : | Вопросы атомной науки и техники |
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| Дата: | 2006 |
| Автори: | , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2006
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| Теми: | |
| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/82350 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures / O.V. Manuilenko, K.M. Minaeva, V.I. Golota // Вопросы атомной науки и техники. — 2006. — № 6. — С. 228-230. — Бібліогр.: 7 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | Single and dual frequency capacitively coupled plasma (CCP) sources operating in pure Ar, O₂ and Ar/O₂ mixtures
are investigated by means of particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations. The different possibilities
to control ion energy distribution functions (IEDFs) and ion angular distribution functions (IADFs) on electrodes are
found. It is shown that the driven voltage and frequency in single frequency capacitive discharges are control the IEDFs
on the electrodes. It is demonstrated that the low frequency voltage in dual frequency CCP sources controls the IEDFs
and IADFs. It is shown that the IEDFs on electrodes can be controlled by Ar/O₂ ratio.
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| ISSN: | 1562-6016 |