Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures
Single and dual frequency capacitively coupled plasma (CCP) sources operating in pure Ar, O₂ and Ar/O₂ mixtures
 are investigated by means of particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations. The different possibilities
 to control ion energy distribution functions (IE...
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| Veröffentlicht in: | Вопросы атомной науки и техники |
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| Datum: | 2006 |
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| Format: | Artikel |
| Sprache: | Englisch |
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2006
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/82350 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures / O.V. Manuilenko, K.M. Minaeva, V.I. Golota // Вопросы атомной науки и техники. — 2006. — № 6. — С. 228-230. — Бібліогр.: 7 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862534144041418752 |
|---|---|
| author | Manuilenko, O.V. Minaeva, K.M. Golota, V.I. |
| author_facet | Manuilenko, O.V. Minaeva, K.M. Golota, V.I. |
| citation_txt | Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures / O.V. Manuilenko, K.M. Minaeva, V.I. Golota // Вопросы атомной науки и техники. — 2006. — № 6. — С. 228-230. — Бібліогр.: 7 назв. — англ. |
| collection | DSpace DC |
| container_title | Вопросы атомной науки и техники |
| description | Single and dual frequency capacitively coupled plasma (CCP) sources operating in pure Ar, O₂ and Ar/O₂ mixtures
are investigated by means of particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations. The different possibilities
to control ion energy distribution functions (IEDFs) and ion angular distribution functions (IADFs) on electrodes are
found. It is shown that the driven voltage and frequency in single frequency capacitive discharges are control the IEDFs
on the electrodes. It is demonstrated that the low frequency voltage in dual frequency CCP sources controls the IEDFs
and IADFs. It is shown that the IEDFs on electrodes can be controlled by Ar/O₂ ratio.
|
| first_indexed | 2025-11-24T08:23:50Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-82350 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-11-24T08:23:50Z |
| publishDate | 2006 |
| publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| record_format | dspace |
| spelling | Manuilenko, O.V. Minaeva, K.M. Golota, V.I. 2015-05-28T18:51:41Z 2015-05-28T18:51:41Z 2006 Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures / O.V. Manuilenko, K.M. Minaeva, V.I. Golota // Вопросы атомной науки и техники. — 2006. — № 6. — С. 228-230. — Бібліогр.: 7 назв. — англ. 1562-6016 PACS: 52.50.Dg, 52.80.Pi, 52.65.Rr, 52.65.Pp, 52.40.Kh, 52.77.Bn https://nasplib.isofts.kiev.ua/handle/123456789/82350 Single and dual frequency capacitively coupled plasma (CCP) sources operating in pure Ar, O₂ and Ar/O₂ mixtures
 are investigated by means of particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations. The different possibilities
 to control ion energy distribution functions (IEDFs) and ion angular distribution functions (IADFs) on electrodes are
 found. It is shown that the driven voltage and frequency in single frequency capacitive discharges are control the IEDFs
 on the electrodes. It is demonstrated that the low frequency voltage in dual frequency CCP sources controls the IEDFs
 and IADFs. It is shown that the IEDFs on electrodes can be controlled by Ar/O₂ ratio. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Low temperature plasma and plasma technologies Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures Article published earlier |
| spellingShingle | Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures Manuilenko, O.V. Minaeva, K.M. Golota, V.I. Low temperature plasma and plasma technologies |
| title | Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures |
| title_full | Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures |
| title_fullStr | Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures |
| title_full_unstemmed | Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures |
| title_short | Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures |
| title_sort | ion energy and ion angular distributions in rf capacitively coupled plasma sources: pure argon and argon-oxygen mixtures |
| topic | Low temperature plasma and plasma technologies |
| topic_facet | Low temperature plasma and plasma technologies |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/82350 |
| work_keys_str_mv | AT manuilenkoov ionenergyandionangulardistributionsinrfcapacitivelycoupledplasmasourcespureargonandargonoxygenmixtures AT minaevakm ionenergyandionangulardistributionsinrfcapacitivelycoupledplasmasourcespureargonandargonoxygenmixtures AT golotavi ionenergyandionangulardistributionsinrfcapacitivelycoupledplasmasourcespureargonandargonoxygenmixtures |