Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures
Single and dual frequency capacitively coupled plasma (CCP) sources operating in pure Ar, O₂ and Ar/O₂ mixtures are investigated by means of particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations. The different possibilities to control ion energy distribution functions (IEDFs) and ion ang...
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| Опубліковано в: : | Вопросы атомной науки и техники |
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| Дата: | 2006 |
| Автори: | , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2006
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| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/82350 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures / O.V. Manuilenko, K.M. Minaeva, V.I. Golota // Вопросы атомной науки и техники. — 2006. — № 6. — С. 228-230. — Бібліогр.: 7 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| id |
nasplib_isofts_kiev_ua-123456789-82350 |
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Manuilenko, O.V. Minaeva, K.M. Golota, V.I. 2015-05-28T18:51:41Z 2015-05-28T18:51:41Z 2006 Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures / O.V. Manuilenko, K.M. Minaeva, V.I. Golota // Вопросы атомной науки и техники. — 2006. — № 6. — С. 228-230. — Бібліогр.: 7 назв. — англ. 1562-6016 PACS: 52.50.Dg, 52.80.Pi, 52.65.Rr, 52.65.Pp, 52.40.Kh, 52.77.Bn https://nasplib.isofts.kiev.ua/handle/123456789/82350 Single and dual frequency capacitively coupled plasma (CCP) sources operating in pure Ar, O₂ and Ar/O₂ mixtures are investigated by means of particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations. The different possibilities to control ion energy distribution functions (IEDFs) and ion angular distribution functions (IADFs) on electrodes are found. It is shown that the driven voltage and frequency in single frequency capacitive discharges are control the IEDFs on the electrodes. It is demonstrated that the low frequency voltage in dual frequency CCP sources controls the IEDFs and IADFs. It is shown that the IEDFs on electrodes can be controlled by Ar/O₂ ratio. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Low temperature plasma and plasma technologies Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures Article published earlier |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| title |
Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures |
| spellingShingle |
Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures Manuilenko, O.V. Minaeva, K.M. Golota, V.I. Low temperature plasma and plasma technologies |
| title_short |
Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures |
| title_full |
Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures |
| title_fullStr |
Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures |
| title_full_unstemmed |
Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures |
| title_sort |
ion energy and ion angular distributions in rf capacitively coupled plasma sources: pure argon and argon-oxygen mixtures |
| author |
Manuilenko, O.V. Minaeva, K.M. Golota, V.I. |
| author_facet |
Manuilenko, O.V. Minaeva, K.M. Golota, V.I. |
| topic |
Low temperature plasma and plasma technologies |
| topic_facet |
Low temperature plasma and plasma technologies |
| publishDate |
2006 |
| language |
English |
| container_title |
Вопросы атомной науки и техники |
| publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| format |
Article |
| description |
Single and dual frequency capacitively coupled plasma (CCP) sources operating in pure Ar, O₂ and Ar/O₂ mixtures
are investigated by means of particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations. The different possibilities
to control ion energy distribution functions (IEDFs) and ion angular distribution functions (IADFs) on electrodes are
found. It is shown that the driven voltage and frequency in single frequency capacitive discharges are control the IEDFs
on the electrodes. It is demonstrated that the low frequency voltage in dual frequency CCP sources controls the IEDFs
and IADFs. It is shown that the IEDFs on electrodes can be controlled by Ar/O₂ ratio.
|
| issn |
1562-6016 |
| url |
https://nasplib.isofts.kiev.ua/handle/123456789/82350 |
| fulltext |
|
| citation_txt |
Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures / O.V. Manuilenko, K.M. Minaeva, V.I. Golota // Вопросы атомной науки и техники. — 2006. — № 6. — С. 228-230. — Бібліогр.: 7 назв. — англ. |
| work_keys_str_mv |
AT manuilenkoov ionenergyandionangulardistributionsinrfcapacitivelycoupledplasmasourcespureargonandargonoxygenmixtures AT minaevakm ionenergyandionangulardistributionsinrfcapacitivelycoupledplasmasourcespureargonandargonoxygenmixtures AT golotavi ionenergyandionangulardistributionsinrfcapacitivelycoupledplasmasourcespureargonandargonoxygenmixtures |
| first_indexed |
2025-11-24T08:23:50Z |
| last_indexed |
2025-11-24T08:23:50Z |
| _version_ |
1850844305805017088 |