Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures

• Published in: Вопросы атомной науки и техники
• Date: 2006
• Main Authors: Manuilenko, O.V., Minaeva, K.M., Golota, V.I.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2006
• Subjects: Low temperature plasma and plasma technologies
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/82350
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures / O.V. Manuilenko, K.M. Minaeva, V.I. Golota // Вопросы атомной науки и техники. — 2006. — № 6. — С. 228-230. — Бібліогр.: 7 назв. — англ.

Single and dual frequency capacitively coupled plasma (CCP) sources operating in pure Ar, O₂ and Ar/O₂ mixtures are investigated by means of particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations. The different possibilities to control ion energy distribution functions (IEDFs) and ion ang...