Development of arc suppression technique for reactive magnetron sputtering

• Published in: Физическая инженерия поверхности
• Date: 2005
• Main Authors: Dudin, S.V., Farenik, V.I., Dahov, A.N., Walkowicz, J.
• Format: Article
• Language: English
• Published: Науковий фізико-технологічний центр МОН та НАН України 2005
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/98765
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Development of arc suppression technique for reactive magnetron sputtering / S.V. Dudin, V.I. Farenik, A.N.Dahov, J. Walkowicz // Физическая инженерия поверхности. — 2005. — Т. 3, № 3-4. — С. 211–215. — Бібліогр.: 6 назв. — англ.

The technique of arc suppression on the target surface of magnetron sputtering system during reactive deposition of Al₂O₃ coatings has been developed. Damping of arcs is achieved by transient polarity change of the magnetron voltage by means of a simple circuit consisting of a capacitor and an...