Deposition of the stoichiometric coatings by reactive magnetron sputtering
The investigations of the reactive magnetron depositing of the stoichiometric coatings “metal-metalloid” were done. The dependences between sputtering parameters of a target and processes of plasmochemical formation on the surface of sample “metal-metalloid” and formations of coatings of the app...
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| Veröffentlicht in: | Физическая инженерия поверхности |
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| Datum: | 2012 |
| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
Науковий фізико-технологічний центр МОН та НАН України
2012
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/98970 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Deposition of the stoichiometric coatings by reactive magnetron sputtering / A. Sagalovych, S. Dudnik, V. Sagalovych // Физическая инженерия поверхности. — 2012. — Т. 10, № 3. — С. 263–272. — Бібліогр.: 23 назв. — англ. |
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