Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing

The experimental data on Raman scattering (RS) and optical absorption in structures with thin silicon layers on various substrates, as well as in multilayer quartz/Si/SiO₂, SiC/Si/SiO₂ and glass/Si₃N₄/Si/SiO₂ structures, are summarized. It is shown that laser annealing on the above structures lea...

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Datum:2014
1. Verfasser: Okhrimenko, O.B.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2014
Schriftenreihe:Semiconductor Physics Quantum Electronics & Optoelectronics
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing / O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 2. — С. 200-204. — Бібліогр.: 13 назв. — англ.

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spelling oai:nasplib.isofts.kiev.ua:123456789-1183732025-02-23T17:24:57Z Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing Okhrimenko, O.B. The experimental data on Raman scattering (RS) and optical absorption in structures with thin silicon layers on various substrates, as well as in multilayer quartz/Si/SiO₂, SiC/Si/SiO₂ and glass/Si₃N₄/Si/SiO₂ structures, are summarized. It is shown that laser annealing on the above structures leads to changes in spectra of RS and optical transmission that can be explained within the critical action model. The value of critical action of laser radiation is determined for the structures studied. The author is indebted to Dr. Sci. Prof. V.P. Kladko and Dr. Sci. V.V. Strelchuk for their interest in this work and valuable discussions. 2014 Article Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing / O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 2. — С. 200-204. — Бібліогр.: 13 назв. — англ. 1560-8034 PACS 71.20.Nr, 78.40.Fy https://nasplib.isofts.kiev.ua/handle/123456789/118373 en Semiconductor Physics Quantum Electronics & Optoelectronics application/pdf Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description The experimental data on Raman scattering (RS) and optical absorption in structures with thin silicon layers on various substrates, as well as in multilayer quartz/Si/SiO₂, SiC/Si/SiO₂ and glass/Si₃N₄/Si/SiO₂ structures, are summarized. It is shown that laser annealing on the above structures leads to changes in spectra of RS and optical transmission that can be explained within the critical action model. The value of critical action of laser radiation is determined for the structures studied.
format Article
author Okhrimenko, O.B.
spellingShingle Okhrimenko, O.B.
Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Okhrimenko, O.B.
author_sort Okhrimenko, O.B.
title Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
title_short Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
title_full Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
title_fullStr Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
title_full_unstemmed Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
title_sort variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2014
citation_txt Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing / O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 2. — С. 200-204. — Бібліогр.: 13 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
work_keys_str_mv AT okhrimenkoob variationofopticalparametersofmultilayerstructureswiththinsiliconlayersatlaserannealing
first_indexed 2025-07-22T04:16:35Z
last_indexed 2025-07-22T04:16:35Z
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