Розподіл світла як фактор впливу на перебіг пошарової фотополімеризації олігоефіракрилатних композицій, наповнених кремнеземом
The influence of the high disperse silicas on the layer-going photopolymerisation process of olygoesteracrylates is considered. It was found that filling with silica does not change the layer-going character of photohardening but decreases the rate of the process and extreme thickness of the hardene...
Збережено в:
| Дата: | 2003 |
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| Автор: | |
| Формат: | Стаття |
| Мова: | Українська |
| Опубліковано: |
Chuiko Institute of Surface Chemistry National Academy of Sciences of Ukraine
2003
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| Онлайн доступ: | https://surfacezbir.com.ua/index.php/surface/article/view/115 |
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| Назва журналу: | Surface |
| Завантажити файл: |  |
Репозитарії
Surface| Резюме: | The influence of the high disperse silicas on the layer-going photopolymerisation process of olygoesteracrylates is considered. It was found that filling with silica does not change the layer-going character of photohardening but decreases the rate of the process and extreme thickness of the hardened layer. The filling changes the form of the hardening region at polymerization of thick layers of composites what may be explained by especial light-distribution in the filled composition. The experiment-based model of specific light-distribution in the filled composition is proposed. |
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