Адсорбційні комплекси Cr(acac)3 на поверхні пірогенного SiO2 в процесі парофазного модифікування
The modifying mechanism fumed SiO2 particles of 12 nm size with Cr(acac)3 vapour at 463 K in argon flow has been studied. Adsorption of Cr(acac)3 on SiO2 surface has been found out to occur due to hydrogen bonding of oxygen atoms of acetylacetonate ligands of Сr(acac)3 with hydrogen atoms of hydroxy...
Збережено в:
| Дата: | 2013 |
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| Автори: | , , |
| Формат: | Стаття |
| Мова: | Українська |
| Опубліковано: |
Chuiko Institute of Surface Chemistry National Academy of Sciences of Ukraine
2013
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| Онлайн доступ: | https://www.cpts.com.ua/index.php/cpts/article/view/229 |
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| Назва журналу: | Chemistry, Physics and Technology of Surface |
Репозитарії
Chemistry, Physics and Technology of Surface| Резюме: | The modifying mechanism fumed SiO2 particles of 12 nm size with Cr(acac)3 vapour at 463 K in argon flow has been studied. Adsorption of Cr(acac)3 on SiO2 surface has been found out to occur due to hydrogen bonding of oxygen atoms of acetylacetonate ligands of Сr(acac)3 with hydrogen atoms of hydroxyl groups of SiO2 surface that preceded ligand substitution above 500 K and SiО–Cr bond formation. Hydrogen bonding has been proved with 2–8 nm high-wavelength shift of ???, d?? and d?d transition bands in UV-vis spectrum and 4 cm-1 low-wavenumber shift of ?s (C- C- O) vibration band in IR spectrum of Cr(acac)3 resulted from its adsorption at SiO2surface. |
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