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Usage of suspensions based on fumed silica for mechano-chemical polishing of single-crystalline silicon

This article describes a preparation technique of polishing suspensions based on pyrogenic silicon dioxide nanoparticles, determines their basic technical characteristics, and also the guidelines on their usage are given in the mechano-chemical polishing process of semiconductor wafers of single-cry...

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Datum:	2008
Hauptverfasser:	Gaishun, V. E., Kosenok, Y. A., Tyulenkova, O. I., Turov, V. V., Gun'ko, V. M.
Format:	Artikel
Sprache:	Russisch
Veröffentlicht:	Chuiko Institute of Surface Chemistry National Academy of Sciences of Ukraine 2008
Online Zugang:	https://surfacezbir.com.ua/index.php/surface/article/view/300
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Назва журналу:	Surface
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