Usage of suspensions based on fumed silica for mechano-chemical polishing of single-crystalline silicon

• Datum: 2008
• Hauptverfasser: Gaishun, V. E., Kosenok, Y. A., Tyulenkova, O. I., Turov, V. V., Gun'ko, V. M.
• Format: Artikel
• Sprache: Russisch
• Veröffentlicht: Chuiko Institute of Surface Chemistry National Academy of Sciences of Ukraine 2008
• Online Zugang: https://surfacezbir.com.ua/index.php/surface/article/view/300
• Назва журналу: Surface

This article describes a preparation technique of polishing suspensions based on pyrogenic silicon dioxide nanoparticles, determines their basic technical characteristics, and also the guidelines on their usage are given in the mechano-chemical polishing process of semiconductor wafers of single-cry...