Теоретичне вивчення лазерного відпалу нестехіометричних плівок SiOx
The mathematical modeling of temperature distribution in SiOx film was carried out. The use of laser annealing in SiOx films is shown to be advisable and multi-pulse annealing being more effective than single-pulse one. The maximum temperature after the laser pulse in the center of the laser beam do...
Збережено в:
| Дата: | 2014 |
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| Автор: | |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
Chuiko Institute of Surface Chemistry National Academy of Sciences of Ukraine
2014
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| Теми: | |
| Онлайн доступ: | https://www.cpts.com.ua/index.php/cpts/article/view/307 |
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| Назва журналу: | Chemistry, Physics and Technology of Surface |
Репозитарії
Chemistry, Physics and Technology of Surface| Резюме: | The mathematical modeling of temperature distribution in SiOx film was carried out. The use of laser annealing in SiOx films is shown to be advisable and multi-pulse annealing being more effective than single-pulse one. The maximum temperature after the laser pulse in the center of the laser beam does not depend on the distance between the laser beams at simultaneous annealing with several laser beams. |
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