Плівки CdS на поруватих підкладках Si, одержані методом хімічного поверхневого осадження

The purpose of this work is to develop a technology for the production of CdS films by chemical surface deposition on porous substrates of nanocrystalline silicon. The possibility of using the heterostructure CdS/porous-Si/p-Si as photovoltaic solar energy converters is considered.The formation of l...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Datum:2018
Hauptverfasser: Dyadenchuk, A. F., Kidalov, V. V.
Format: Artikel
Sprache:Ukrainian
Veröffentlicht: Chuiko Institute of Surface Chemistry National Academy of Sciences of Ukraine 2018
Schlagworte:
Online Zugang:https://www.cpts.com.ua/index.php/cpts/article/view/453
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:Chemistry, Physics and Technology of Surface

Institution

Chemistry, Physics and Technology of Surface