ВПЛИВ ДИСПЕРСНОЇ СИСТЕМИ НА ПОКАЗНИКИ ПОЛІРУВАННЯ СКЛА, СИТАЛІВ ТА ОПТИЧНИХ І НАПІВПРОВІДНИКОВИХ КРИСТАЛІВ
The aim of this study is to study the laws of the influence of the properties of a disperse system on the polishing indices of optical glass, sitals, optical and semiconductor crystals. Based on the cluster model of removal of the processed material during polishing, it is shown that the polishing p...
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| Date: | 2020 |
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| Main Authors: | , , , , , , |
| Format: | Article |
| Language: | Ukrainian |
| Published: |
Институт сверхтвердых материалов им. В. Н. Бакуля Национальной академии наук Украины
2020
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| Subjects: | |
| Online Access: | http://altis-ism.org.ua/index.php/ALTIS/article/view/177 |
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| Journal Title: | Tooling materials science |
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Tooling materials science| Summary: | The aim of this study is to study the laws of the influence of the properties of a disperse system on the polishing indices of optical glass, sitals, optical and semiconductor crystals. Based on the cluster model of removal of the processed material during polishing, it is shown that the polishing performance and the height roughness parameters of the treated surface depend on the concentration of sludge particles formed during polishing, which depends on the average value of the interaction potential of the grains of the polishing powder with the treated surface. Taking into account the distribution function of sludge particles over their surface areas and the contact area of the polishing powder grain with the treated surface makes it possible to determine the interaction potential of the polishing powder grains with the treated surface depending on the Lifshitz constant, which depends on the electrical and optical characteristics of the processed material and the dispersed polishing system, and also the thickness of the gap between the elementary sections of the contact surfaces of the workpiece and lapping, which depends on the rheological properties of the polishing slurry and processing conditions. As a result of studies, it was found that the properties of the dispersed polishing system significantly affect the removal rate of the processed material when polishing optical glass, sitals, optical and semiconductor crystals, as well as the surface roughness. It is advisable to use the results of the study when developing the processes of nanopolishing non-metallic materials, as well as in subsequent studies of the laws of chemical-mechanical polishing of ultra-smooth surfaces. The practical significance and value of the results obtained lies in the general approach to the intermolecular interaction of condensed matters |
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