Микрочиповые лазеры с пассивной модуляцией добротности на основе эпитаксиальных структур Nd:АИГ/Cr⁴⁺:АИГ
The features of developing microchip lasers with passive Q-switching are considered. The active medium of the laser is an epitaxial layer of the saturable absorber Cr⁴⁺:YAG grown by liquid-phase epitaxy on an Nd:YAG substrate. Laser mirrors were deposited by electron-beam evaporation. Pumping was c...
Збережено в:
| Дата: | 2005 |
|---|---|
| Автори: | , , , , |
| Формат: | Стаття |
| Мова: | Українська |
| Опубліковано: |
PE "Politekhperiodika", Book and Journal Publishers
2005
|
| Теми: | |
| Онлайн доступ: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2005.6.30 |
| Теги: |
Додати тег
Немає тегів, Будьте першим, хто поставить тег для цього запису!
|
| Назва журналу: | Technology and design in electronic equipment |
Репозитарії
Technology and design in electronic equipment| Резюме: | The features of developing microchip lasers with passive Q-switching are considered. The active medium of the laser is an epitaxial layer of the saturable absorber Cr⁴⁺:YAG grown by liquid-phase epitaxy on an Nd:YAG substrate. Laser mirrors were deposited by electron-beam evaporation. Pumping was carried out with a continuous-wave semiconductor laser (808 nm). The obtained laser parameters are: pulse duration of 1.3 ns, pulse repetition rate of 5.5 kHz, and peak pulse power of 1.2 kW.
|
|---|