Ударостойкие защитные пленочные покрытия на основе AlN в электронной технике
For the formation of AlN protective coatings resistant to impact loads, magnetron and diode sputtering methods, as well as ion beam sputtering, are suitable. Depending on the process conditions, different contents of X-ray amorphous and crystalline phases are obtained in the volume of nanostructured...
Збережено в:
| Дата: | 2005 |
|---|---|
| Автори: | , , , |
| Формат: | Стаття |
| Мова: | Українська |
| Опубліковано: |
PE "Politekhperiodika", Book and Journal Publishers
2005
|
| Теми: | |
| Онлайн доступ: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2005.5.35 |
| Теги: |
Додати тег
Немає тегів, Будьте першим, хто поставить тег для цього запису!
|
| Назва журналу: | Technology and design in electronic equipment |
Репозитарії
Technology and design in electronic equipment| Резюме: | For the formation of AlN protective coatings resistant to impact loads, magnetron and diode sputtering methods, as well as ion beam sputtering, are suitable. Depending on the process conditions, different contents of X-ray amorphous and crystalline phases are obtained in the volume of nanostructured coatings, along with their fibrous structure. Multilayer protective coatings were produced by sequential deposition of amorphous and crystalline AlN layers with an internal fibrous structure on the surfaces of devices. |
|---|