Влияние режимов ионного легирования и фотонного отжига на параметры имплантированных слоев n-GaAs:Si
The paper presents the results of studies on the influence of ion implantation regimes and pulsed incoherent photon annealing on the parameters of Si-implanted n-GaAs layers grown on semi-insulating GaAs substrates. The obtained layers are characterized by the following parameters: thickness of 0.1–...
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| Datum: | 2005 |
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| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | Ukrainisch |
| Veröffentlicht: |
PE "Politekhperiodika", Book and Journal Publishers
2005
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| Schlagworte: | |
| Online Zugang: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2005.3.03 |
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| Назва журналу: | Technology and design in electronic equipment |