Компенсация систематических погрешностей тонкопленочных элементов через элементы фотошаблона
Several methods are considered for compensating for systematic errors in the design parameters of thin-film resistors that determine the yield of functional microassemblies. A method of compensation is proposed by modifying the dimensions of photomask elements according to specific algorithms, which...
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| Datum: | 2004 |
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| 1. Verfasser: | |
| Format: | Artikel |
| Sprache: | Ukrainisch |
| Veröffentlicht: |
PE "Politekhperiodika", Book and Journal Publishers
2004
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| Schlagworte: | |
| Online Zugang: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2004.4.09 |
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| Назва журналу: | Technology and design in electronic equipment |