Применение контролируемого анодного окисления для экспресс-контроля в технологии пленок и тонкопленочных структур
The fundamentals of the controlled anodic oxidation method ("anodic spectroscopy"), its application techniques, and the results of studies of multilayer thin-film structures are presented. Anodizing profiles of structures formed by electron-beam and magnetron deposition of Nb and A...
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| Date: | 2003 |
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| Main Authors: | , , |
| Format: | Article |
| Language: | Ukrainian |
| Published: |
PE "Politekhperiodika", Book and Journal Publishers
2003
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| Subjects: | |
| Online Access: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2003.5.42 |
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| Journal Title: | Technology and design in electronic equipment |
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Technology and design in electronic equipment| Summary: | The fundamentals of the controlled anodic oxidation method ("anodic spectroscopy"), its application techniques, and the results of studies of multilayer thin-film structures are presented. Anodizing profiles of structures formed by electron-beam and magnetron deposition of Nb and Al films, with barrier AlOx oxide formed by thermal oxidation and magnetron glow discharge, were obtained and analyzed. The method’s application for monitoring the formation of nanostructured anodic aluminum oxide films is demonstrated. The effectiveness of the method for rapid monitoring in thin-film technologies is shown. |
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