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Методы удаления полимерных загрязнений, вызванных плазмохимическим травлением

The formation of small-sized contact windows by plasma-chemical etching and the main factors of polymer residue formation after etching are considered. The composition of polymer residues and the mechanism of their removal by chemical methods using PRX solutions have been studied. An indirect evalua...

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Bibliographic Details
Date:2003
Main Authors: Ivanchikov, A. E., Kisel, A. M., Medvedeva, A. B., Plebanovich, V. I., Ponomar, V. N., Shikulo, V. E.
Format: Article
Language:Ukrainian
Published: PE "Politekhperiodika", Book and Journal Publishers 2003
Subjects:
плазмохимическое травление
удаление полимерных загрязнений
полимерные остатки
растворы PRX
термический метод удаления
операция «оплавление контактов»
разброс толщины диоксида кремния
Online Access:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2003.5.46
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Journal Title:Technology and design in electronic equipment

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Technology and design in electronic equipment
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Summary:The formation of small-sized contact windows by plasma-chemical etching and the main factors of polymer residue formation after etching are considered. The composition of polymer residues and the mechanism of their removal by chemical methods using PRX solutions have been studied. An indirect evaluation (based on the variation in silicon dioxide thickness) of the thermal method of polymer residue removal, implemented during the “contact reflow” operation, has been carried out.

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