Buchumschlag

Устройство управления импульсным режимом электролиза при создании контактных площадок

An electronic device for controlling electrolysis under pulsed voltage supply to an electrolytic cell has been developed. By varying the amplitude of voltage and current pulses, their duration, and duty cycle, it enables regulation of both the deposition rate and quality of individual metals, as wel...

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Bibliographische Detailangaben
Datum:2003
Hauptverfasser: Albota, L. A., Rarenko, I. M., Shvets, A. G., Albota, I. L.
Format: Artikel
Sprache:Ukrainisch
Veröffentlicht: PE "Politekhperiodika", Book and Journal Publishers 2003
Schlagworte:
импульсный электролиз
устройство управления
контактные площадки
осаждение металлов
никель
эвтектические сплавы
In—Sn
In—Bi
Online Zugang:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2003.1.34
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Назва журналу:Technology and design in electronic equipment
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Technology and design in electronic equipment
Beschreibung
Zusammenfassung:An electronic device for controlling electrolysis under pulsed voltage supply to an electrolytic cell has been developed. By varying the amplitude of voltage and current pulses, their duration, and duty cycle, it enables regulation of both the deposition rate and quality of individual metals, as well as the ratio of metallic components in the electrodeposited mixture, taking into account their electrode potentials. Studies were conducted on the deposition of nickel and eutectic alloys in the In—Sn and In—Bi systems.

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