Расчет частотной зависимости диэлектрических характеристик тонких пленок системы HfO₂—Nd₂O₃

• Date: 2003
• Main Authors: Kazakov, A. I., Andriyanov, A. V., Mironov, V. S., Polyarush, O. V.
• Format: Article
• Language: Ukrainian
• Published: PE "Politekhperiodika", Book and Journal Publishers 2003
• Subjects: тонкие пленки; HfO₂—Nd₂O₃; диэлектрические характеристики; электронно‑лучевое напыление; оптимизация параметров
• Online Access: https://www.tkea.com.ua/index.php/journal/article/view/TKEA2003.1.52
• Journal Title: Technology and design in electronic equipment

A calculation methodology is proposed for films of the multicomponent HfO₂—Nd₂O₃ system obtained by electron‑beam evaporation in vacuum, with non‑uniform distribution of components across thickness. The calculated data show good correlation with experimental results, enabling the production of films...